Akihisa Matsuda

Akihisa Matsuda's AcademicInfluence.com Rankings

Akihisa Matsuda

Physics

#6315

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#8244

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Physics

Akihisa Matsuda's Degrees

PhD Physics University of Tokyo
Masters Physics University of Tokyo
Bachelors Physics University of Tokyo

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Akihisa Matsuda's Published Works

Number of citations in a given year to any of this author's works

Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author

Published Works

Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma (1983) (487)
Growth mechanism of microcrystalline silicon obtained from reactive plasmas (1999) (283)
High rate growth of microcrystalline silicon at low temperatures (2000) (276)
Microcrystalline silicon.. Growth and device application (2004) (257)
Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon (1990) (212)
High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition (1998) (199)
Thin-Film Silicon –Growth Process and Solar Cell Application– (2004) (167)
Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon☆ (1982) (156)
Sticking and recombination of the SiH3 radical on hydrogenated amorphous silicon: The catalytic effect of diborane (1989) (155)
Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H Films (1980) (145)
Effects of Substrate Surface Morphology on Microcrystalline Silicon Solar Cells (2001) (144)
Guiding principle for preparing highly photosensitive Si-based amorphous alloys (1987) (131)
Real-time spectroscopic ellipsometry studies of the nucleation and grain growth processes in microcrystalline silicon thin films (2001) (129)
Spatial Distribution of SiH3 Radicals in RF Silane Plasma (1990) (127)
Preparation of highly photosensitive hydrogenated amorphous Si‐C alloys from a glow‐discharge plasma (1986) (125)
Glow-discharge amorphous silicon: Growth process and structure (1987) (115)
Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation technique (1986) (115)
High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma (2001) (108)
Guiding Principle in the Preparation of High-Photosensitive Hydrogenated Amorphous Si–Ge Alloys from Glow-Discharge Plasma (1986) (101)
Control of plasma chemistry for preparing highly stabilized amorphous silicon at high growth rate (2003) (97)
Effect of higher-silane formation on electron temperature in a silane glow-discharge plasma (2000) (88)
Passivation of oxygen-related donors in microcrystalline silicon by low temperature deposition (2001) (87)
Hydrogenated microcrystalline silicon germanium: A bottom cell material for amorphous silicon-based tandem solar cells (1996) (86)
Effects of embedded crystallites in amorphous silicon on light-induced defect creation (1999) (83)
One chip photovoltaic water electrolysis device (2003) (82)
Substrate dependence of initial growth of microcrystalline silicon in plasma‐enhanced chemical vapor deposition (1996) (82)
Amorphous silicon solar cells deposited at high growth rate (2002) (75)
PLASMA AND SURFACE REACTIONS FOR OBTAINING LOW DEFECT DENSITY AMORPHOUS SILICON AT HIGH GROWTH RATES (1998) (74)
Origin of the Improved Performance of High-Deposition-Rate Microcrystalline Silicon Solar Cells by High-Pressure Glow Discharge (2003) (72)
In situ characterization of the growing a-Si:H surface by IR spectroscopy (1991) (66)
Glow-Discharge Deposition of a-Si: H from Pure Si2H6 and Pure SiH4 (1983) (64)
Real time in situ observation of the film growth of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy (1990) (62)
High-rate microcrystalline silicon deposition for p–i–n junction solar cells (2006) (62)
Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon (1997) (60)
Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma (2004) (58)
Role of Surface and Growth-Zone Reactions in the Formation Process of µc-Si:H (1989) (58)
Plasma spectroscopy control and analysis of a-Si:H deposition (1980) (58)
Stress-Induced Nucleation of Microcrystalline Silicon from Amorphous Phase (2002) (55)
Role of Hydrogen Atoms in the Formation Process of Hydrogenated Microcrystalline Silicon (1990) (55)
Boron Doping of Hydrogenated Silicon Thin Films (1981) (54)
Depth profiling of silicon–hydrogen bonding modes in amorphous and microcrystalline Si:H thin films by real-time infrared spectroscopy and spectroscopic ellipsometry (2002) (51)
Microcrystalline silicon nucleation sites in the sub-surface of hydrogenated amorphous silicon (2002) (51)
A highly stabilized hydrogenated amorphous silicon film having very low hydrogen concentration and an improved Si bond network (2005) (50)
Real‐time detection of higher hydrides on the growing surface of hydrogenated amorphous silicon by infrared reflection absorption spectroscopy (1990) (50)
EXPERIMENTAL EVIDENCE OF PHOTOINDUCED EXPANSION IN HYDROGENATED AMORPHOUS SILICON USING BENDING DETECTED OPTICAL LEVER METHOD (1998) (49)
Direct evidence for extremely facile 1,2- and 1,3-group migrations in an FeSi2 system. (2004) (48)
SURFACE REACTIONS DURING THE A-SI : H GROWTH IN THE DIODE AND TRIODE GLOW-DISCHARGE REACTORS (1991) (48)
A Significant Reduction of Impurity Contents in Hydrogenated Microcrystalline Silicon Films for Increased Grain Size and Reduced Defect Density (1998) (47)
Microcrystalline silicon thin-film solar cells prepared at low temperature using PECVD (2002) (46)
SiH3 Radical Density in Pulsed Silane Plasma (1990) (46)
Preparation of highly photosensitive hydrogenated amorphous Si‐Ge alloys using a triode plasma reactor (1985) (45)
Wide-Rrange Control of Crystallite Size and Its Orientation in Glow-Discharge Deposited µc-Si:H (1983) (44)
High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma (2004) (44)
Importance of surface processes in defect formation in a-Si:H (1993) (44)
Combinatorial synthesis of trisaccharides via solution-phase one-pot glycosylation (2000) (43)
Deposition and extensive light soaking of highly pure hydrogenated amorphous silicon (1996) (42)
Interface-layer formation in microcrystalline Si:H growth on ZnO substrates studied by real-time spectroscopic ellipsometry and infrared spectroscopy (2003) (42)
Dark current transport mechanism of p‐i‐n hydrogenated amorphous silicon diodes (1985) (41)
Effect of Ion Bombardment on the Growth and Properties of Hydrogenated Amorphous Silicon-Germanium Alloys (1989) (41)
Industrial Plasma Technology: Applications from Environmental to Energy Technologies (2010) (41)
Novel aspects in thin film silicon solar cells-amorphous, microcrystalline and nanocrystalline silicon (2004) (40)
Low temperature growth of microcrystalline silicon and its application to solar cells (2001) (40)
Gas-phase diagnosis and high-rate growth of stable a-Si:H (1999) (39)
Guiding principles for obtaining stabilized amorphous silicon at larger growth rates (2000) (38)
Determination of the Optical Constants of Thin Films Using Photoacoustic Spectroscopy (1981) (38)
Amorphous silicon technology -- 1996 (1996) (37)
NEGATIVE CORRELATION ENERGY AND VALENCE ALTERNATION IN AMORPHOUS SELENIUM : AN IN SITU OPTICALLY INDUCED ESR STUDY (1998) (37)
Characterization of Hydrogenated Amorphous Silicon Films by a Pulsed Positron Beam (1991) (35)
Lifetime of dominant radicals for the deposition of a-Si:H from SiH4 and Si2H6 glow discharges (1983) (34)
Structural Study on Amorphous-Microcrystalline Mixed-Phase Si:H Films (1981) (33)
Ohmic Contact Properties of Magnesium Evaporated onto Undoped and P-doped a-Si: H (1983) (33)
Key Issue for the Fabrication of High-Efficiency Microcrystalline Silicon Thin-Film Solar Cells at Low Temperatures (2002) (33)
Gap-State Profiles of a-Si: H Deduced from Below-Gap Optical Absorption (1982) (32)
An approach to device grade amorphous and microcrystalline silicon thin films fabricated at higher deposition rates (2002) (32)
Detection of Neutral Species in Silane Plasma Using Coherent Anti-Stokes Raman Spectroscopy (1983) (32)
Morphological study of kinetic roughening on amorphous and microcrystalline silicon surface (1998) (32)
Highly stabilized hydrogenated amorphous silicon solar cells fabricated by triode-plasma CVD (2006) (31)
Electrical Properties of Pulsed Laser Crystallized Silicon Films (1999) (30)
Preparation of stable and photoconductive hydrogenated amorphous silicon from a Xe‐diluted silane plasma (1991) (29)
Fundamental aspects of low-temperature growth of microcrystalline silicon (2003) (29)
The light-induced metastable lattice expansion in hydrogenated amorphous silicon (2000) (29)
The dynamics of photoexcited carriers in microcrystalline silicon (1984) (29)
Anomalous Optical and Structural Properties of B-Doped a-Si:H (1982) (29)
Nucleation mechanism of microcrystalline silicon from the amorphous phase (2004) (28)
Device-Grade Amorphous Silicon Prepared by High-Pressure Plasma (2002) (28)
The role of argon involved in plasma-deposited amorphous Si:H films (1980) (28)
EXPERIMENTAL EVIDENCE FOR NEGATIVE CORRELATION ENERGY AND VALENCE ALTERNATION IN AMORPHOUS SELENIUM (1997) (27)
Low-temperature growth of crystalline silicon on a chlorine-terminated surface (1999) (27)
Formation of interface defects by enhanced impurity diffusion in microcrystalline silicon solar cells (2002) (26)
Electron and Ion Energy Controls in a Radio Frequency Discharge Plasma with Silane (1997) (26)
Recent understanding of the growth process of amorphous silicon from a silane glow-discharge plasma (1997) (26)
Hydrogenated amorphous silicon prepared by ArF and F2 excimer laser‐induced photochemical vapor deposition (1987) (26)
Interpretation of 29Si nuclear magnetic resonance spectra of amorphous hydrogenated silicon (1986) (26)
Spectroscopic diagnostics of plasma‐chemical‐vapor deposition from silane and germane (1987) (25)
(Invited) Optical, Electrical and Structural Properties of Plasma-Deposited Amorphous Silicon (1980) (25)
Microcrystalline silicon solar cells fabricated on polymer substrate (2002) (24)
Structural study of initial layer for μc-Si:H growth using real time in situ spectroscopic ellipsometry and infrared spectroscopy (2000) (24)
Influence of Power-Source Frequency on the Properties of GD a-Si:H (1984) (24)
Low-temperature fabrication of microcrystalline silicon and its application to solar cells (2002) (24)
Particle formation and a-Si:H film deposition in narrow-gap RF plasma CVD (1999) (23)
Reduced light‐induced changes of photoconductivity in duterated amorphous silicon (1990) (22)
Gap States Distribution of Undoped a-Si: H Determined with Phase-Shift Analysis of the Modulated Photocurrent (1982) (21)
Doping properties of boron-doped microcrystalline silicon from B2H6 and BF3: material properties and solar cell performance (2004) (21)
Metal‐semiconductor junctions and amorphous‐crystalline heterojunctions using B‐doped hydrogenated amorphous silicon (1984) (21)
Deposition Kinetics and Structural Control of Highly Photosensitive A-SiGe:H Alloys (1986) (21)
Ar (3P2) induced chemical vapor deposition of hydrogenated amorphous silicon (1985) (20)
Anomalous behavior of electron temperature in silane glow discharge plasmas (2001) (20)
Thermal Stability of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD method (1988) (20)
ANNEALING STUDIES ON LOW OPTICAL ABSORPTION OF GD a-Si:H USING PHOTOACOUSTIC SPECTROSCOPY (1981) (20)
Neutral radical detection in silane glow-discharge plasma using coherent anti-stokes raman spectroscopy☆ (1983) (20)
Photochemical vapor deposition of hydrogenated amorphous silicon films from disilane and trisilane using a low pressure mercury lamp (1986) (19)
Localized surface plasmon enhanced microcrystalline–silicon solar cells (2012) (19)
Observation of Meyer-Neldel rule in extended energy regime using novel a-Si:H TFTs (1996) (18)
In-situ investigation of the growing a-Si:D surface by infrared reflection absorption spectroscopy (1993) (17)
Nonphotochemical Synthesis of a Base-free Silyl(silylene)iron Complex and Its Reaction with CO: Another Direct Evidence for Reversible 1,2- and 1,3-Group Migrations (2005) (17)
Control of photodegradation in amorphous silicon: The effect of deuterium (1991) (17)
Improvement of hydrogenated amorphous silicon germanium alloys using low power disilane–germane discharges without hydrogen dilution (1995) (16)
Microcrystalline silicon thin-film solar cells prepared at low temperature using RF-PECVD (2000) (16)
Stability of thin film solar cells having less-hydrogenated amorphous silicon i-layers (2008) (16)
Improvement of Voc using carbon added microcrystalline Si p-layer in microcrystalline Si solar cells (2002) (16)
Saturation of the defect density in hydrogenated amorphous silicon by pulsed light soaking (1992) (16)
Modified Triode Plasma Configuration Allowing Precise Control of Ion-Energy for Preparing High Mobility a-Si:H (1996) (15)
On the Transport Properties of Microcrystalline Silicon at Low Temperatures (1998) (15)
Parallel Synthesis of Oligosaccharide Conjugated Enediynes onto Silyl-linked Solid-Support (2001) (15)
Nucleation Mechanism of Microcrystalline Silicon Studied by Real Time Spectroscopic Ellipsometry and Infrared Spectroscopy (2000) (15)
Chemical-reaction dependence of plasma parameter in reactive silane plasma (2001) (15)
A Defect Density of ∼ 10 14 cm -3 in Hydrogenated Amorphous Silicon Deposited at High Substrate Temperatures (1992) (15)
Hydrogen-mediated low-temperature epitaxy of Si in plasma-enhanced chemical vapor deposition (2000) (15)
Time-domain measurements of spin relaxation processes of dangling-bond defects in hydrogenated amorphous silicon (1994) (15)
Lattice orientation of microcrystallites in μc-Si:H (1989) (15)
Enhancement of Open Circuit Voltage via Light soaking in Amorphous Silicon Solar Cells (2000) (14)
Recent developments in the high growth rate technique of device-grade microcrystalline silicon thin film (2003) (14)
A novel approach for the growth of μc-Si at a high rate over 3 nm/s (2003) (14)
Coherent Anti-Stokes Raman Spectroscopy of Radio-Frequency Discharge Plasmas of Silane and Disilane (1986) (14)
Dependence of steady‐state defect density in hydrogenated amorphous silicon on carrier generation rate studied over a wide range (1993) (14)
Defect formation process during growth of hydrogenated amorphous silicon at high temperatures (1992) (13)
Pulsed ESR Study of the Conduction Electron Spin Center in μc-Si:H (1996) (13)
STM observation on the initial growth of amorphous and microcrystalline silicon films (1996) (13)
A New Model for the Carrier Transport in Amorphous Si: H Schottky Barrier Diodes (1980) (13)
A New Approach to Nine-Membered Enediyne Using a Palladium Catalyzed Cross-Coupling Reaction (1997) (13)
Nucleation and coalescence in hydrogenated amorphous silicon studied by scanning tunneling microscopy (1994) (13)
Amorphous Si and Si-based alloys from glow-discharge plasma (1988) (13)
Light-induced, reversible, above-gap, optical changes in hydrogenated amorphous silicon films (2000) (12)
Guiding Principles for Obtaining High-Quality Microcrystalline Silicon at High Growth Rates Using SiH4/H2 Glow-Discharge Plasma (2007) (12)
A Photoluminescence Study of Amorphous-Microcrystalline Mixed-Phase Si:H Films (1981) (12)
Reduction of light-induced defects by nano-structure tailored silicon solar cells using low-cost TCO substrates (2006) (12)
High-rate growth of stable a-Si:H (1999) (12)
Enhancement of the deposition rate of a-Si:H by introduction of an electronegative molecule into a silane discharge (1996) (12)
A detailed photoluminescence study of crystallized a-Si:H multiquantum-well structures (1993) (12)
Detection of photoinduced structural change in a-Si:H by bending effect (1998) (11)
Synthesis of 9-membered masked enediyne analogues possessing DNA intercalator and sugar moieties. (1998) (11)
Two‐photon laser‐induced fluorescence measurements of absolute atomic hydrogen densities and powder formation in a silane discharge (1994) (11)
High-pressure plasma CVD for high-quality amorphous silicon (2001) (11)
Control of the Electron and Hole Drift mobilities in Plasma Deposited a-Si:H (1994) (11)
High rate growth of device-grade microcrystalline silicon films at 8 nm/s (2006) (11)
Thin film silicon solar cells on liquid crystal polymer substrate (2003) (11)
Control of plasma and surface conditions for low defect density a-Si:H at high growth rates (1996) (11)
Proton nuclear magnetic resonance study on hydrogen incorporation in amorphous‐microcrystalline mixed‐phase hydrogenated silicon (1984) (11)
Microcrystalline Silicon Thin-Film Solar Cells Prepared at Low Temperature (2001) (11)
Role of hydrogen dilution in improvement of a-SiGe:H alloys (1996) (11)
Real-time characterization of free-carrier absorption during epitaxial Si p-layer growth (2003) (11)
Glow-Discharge Deposition of Amorphous Silicon from SiH3F (1984) (11)
Behavior of surface hydrogen on a-Ge:H (1996) (10)
The determinants of hydrogen concentrations in hydrogenated amorphous silicon films prepared using a triode deposition system (2007) (10)
Importance of the transport isotropy in μc-Si:H thin films for solar cells deposited at low substrate temperatures (2002) (10)
Silane thermometry in radio‐frequency discharge plasma by coherent anti‐Stokes Raman spectroscopy (1986) (10)
The Orthorhombic-to-Tetragonal Phase Transition in Sputtered Gd-Ba-Cu-O Thin Films by Low Temperature Processing (1988) (10)
Deposition of ultrapure hydrogenated amorphous silicon (1999) (10)
Photocarrier capture properties of light-induced defects in a-Si:H (2001) (9)
Deposition mechanism of hydrogenated amorphous SiGe Films (1988) (9)
NMR study of c-Si:H (1983) (9)
DNA cleaving activities of 9-membered masked enediyne analogues possessing DNA intercalator and sugar moieties. (1998) (9)
Stable hydrogenated amorphous silicon films deposited from silane and dichlorosilane by radio frequency plasma chemical vapor deposition (1995) (9)
Trial to control hydrogen content in a-Si:H deposited using rare-gas-diluted silane plasmas (1993) (9)
Hopping Transport of Electrons and Holes at Localized Band Tail States in Amorphous Hydrogenated Silicon and Amorphous Heavy-Hydrogenated Silicon (2005) (9)
Dispersive photoluminescence decay of a-Si:H (1983) (8)
High rate growth of high-quality microcrystalline silicon films from plasma by interconnected multi-hollow cathode (2007) (8)
Structure, defect and transport properties of highly photoconductive a-SiGe:H and a-SiC:H alloys (1989) (8)
Fabrication of hydrogenated amorphous silicon films exibiting higher stability against light soaking (2004) (8)
Time of flight mobility measurements in a-Si:H grown under controlled-energy ion-bombardment (1996) (8)
Transport properties of microcrystalline silicon at low temperatures (1998) (8)
Defect determination kinetics during the growth of a-Si:H (1993) (8)
A study of the growth-mechanism and properties of microcrystalline silicon–germanium (1998) (8)
Independent control of spin density and hydrogen‐bonding configuration in glow‐discharge‐hydrogenated Si‐Ge alloys using a cathode‐heating method (1988) (8)
Excitation frequency dependence of the optical emission intensity vs. deposition rate relationship in silane plasmas (2000) (8)
Microcrystalline silicon solar cells grown at 20-30 a/s by high-pressure silane-depletion plasma (2003) (8)
Synthesis of 10-membered masked oxaenediyne analogue of kedarcidin-chr. and C-1027-chr., and its DNA cleaving activity (1996) (7)
A study on the correlation between the photoinduced volume expansion and the internal stress in hydrogenated amorphous silicon (2000) (7)
A new deposition parameter to control the carrier drift mobility in a-Si:H (1996) (7)
Electrode distance dependence of photo-induced degradation in hydrogenated amorphous silicon (2002) (7)
Gas Phase Diagnosis of Disilane/Hydrogen RF Glow Discharge Plasma and Its Application to High Rate Growth of High Quality Amorphous Silicon (1999) (7)
Preparation and Properties of Nanocrystalline Silicon (2004) (7)
High-Rate Plasma Process for Microcrystalline Silicon: Over 9% Efficiency Single Junction Solar Cells (2004) (7)
Light-soaking stability of silicon thin film solar cells using alternately hydrogenated dilution method (2004) (7)
Role of Hydrogen for Microcrystalline Silicon Formation (1998) (7)
Real-time studies of amorphous and microcrystalline Si:H growth by spectroscopic ellipsometry and infrared spectroscopy (2004) (7)
Very High Hydrogen Dilution Induced Novel Phenomena of Electronic Transport Properties in Hydrogenated Microcrystalline Silicon-Germanium Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Method (2001) (7)
The change of transport mechanism in μc-Si:H films induced by H2-diluted silane plasma (2000) (7)
Thermal stability of light-induced defects in hydrogenated amorphous silicon: Effect on defect creation kinetics and role of network microstructure (2008) (6)
Characteristics of Schottky Barrier Diodes in Reactively Sputtered Amorphous Si:H (1981) (6)
Gas‐temperature control in VHF‐ PECVD process for high‐rate (>5 nm/s) growth of microcrystalline silicon thin films (2010) (6)
Effect of halogen additives on the stability of a-Si:H films deposited at a high-growth rate (2001) (6)
Difference in light‐induced annealing behavior of deposition‐ and light‐induced defects in hydrogenated amorphous silicon (1993) (6)
Effects of Hydrogen Diluted silane plasma on Amorphous Silicon Solar Cells (2000) (6)
A study of light-induced degradation of a-Si:H by nanosecond laser pulse pairs of variable delay (2000) (5)
Interpretation of mechanism determining field effect mobility in a-Si:H TFT based on surface reaction model (1996) (5)
Laplace Meyer–Neldel relation (2010) (5)
Low-Temperature Fabrication of Nanocrystalline-Silicon Solar Cells (2004) (5)
Reduction of the defect density in hydrogenated amorphous silicon by thermally energized growth precursors (1994) (5)
How do Impurities Affect the Growth of μc-Si:H? (1998) (5)
Effect of Laser-Induced Dissociation during Measurements of Hydrogen Atoms in Silane Plasmas Using Two-Photon-Excited Laser-Induced Fluorescence (1992) (5)
Changes in hydrogenated amorphous silicon upon extensive light-soaking at elevated temperature (2001) (5)
Amorphous and Microcrystalline Silicon (2017) (5)
Crucial processing steps for microcrystalline silicon bottom cells (2005) (5)
Importance of Charged Dangling Bonds in Explaining the Photodegradation Behavior of Amorphous Silicon Films Prepared by Various Techniques (1991) (5)
Midgap-state profiles in undoped amorphous-silicon-based alloys (1989) (5)
2D and 1H Nuclear Magnetic Resonance Study of Deuterated Amorphous Silicon and Partially Deuterated Hydrogenated Amorphous Silicon (1991) (5)
Effect of Strained Si-Si Bonds in Amorphous Silicon Incubation Layer on Microcrystalline Silicon Nucleation (2001) (5)
New results of spin-lattice relaxation in a-Si:H by pulsed ESR (1993) (5)
Photo-induced bond switching in amorphous chalcogenides (1999) (5)
A Study of the Time Scales of Processes Responsible for the Light-induced Degradation of a-Si:H by Pulse Illumination (2000) (5)
Surface photovoltage measurements in μc-Si:H: Manifestation of the bottom space charge region (2002) (5)
A new approach to surface photovoltage measurements on hydrogenated microcrystalline silicon layers (2001) (5)
Importance of Starting Procedure for Film Growth in Substrate-Type Microcrystalline-Silicon Solar Cells (2011) (5)
1H Nuclear Magnetic Resonance Study of Hydrogen Distribution in Partially Deuterated Hydrogenated Amorphous Silicon (1991) (5)
Novel Plasma Control Method in PECVD for Preparing Microcrystalline Silicon (1997) (5)
Light-Induced Degradation Effects in a-Si:H Observed by Raman Scattering Measurements (1998) (4)
Correlation Between Surface Morphology and Lattice Orientation of Microcrystalline Silicon (1997) (4)
Silicon-29 Nuclear Magnetic Resonance Study of Amorphous-Microcrystalline Mixed-Phase Hydrogenated Silicon (1986) (4)
Less-understood phenomena in the light-induced degradation and photocarrier capture in a-Si:H (2002) (4)
Reduction of the Defect Density in a-Si:H Deposited at ≤250°C (1993) (4)
STM and Raman study of the evolution of the surface morphology in μc-Si:H (1996) (4)
Ultraviolet photon induced stimulation of surface reaction during growth of hydrogenated amorphous silicon: Estimation of the lifetime of film precursors (1993) (4)
31P Nuclear Magnetic Resonance Study of Local Bonding Configuration of Phosphorus in Amorphous Silicon-Hydrogen-Phosphorus Alloys (1987) (4)
Power Law Behavior in Amorphous Si:H and Si:D Due to Hopping‐Randomwalk of Electrons in Localized Band Tail States in Random Fractal Fluctuation (2002) (4)
Fast light-induced change in ellipsometry spectra of hydrogenated amorphous silicon measured through a transparent substrate upon bias light illumination (2001) (4)
Steady state defect density and annealing kinetics of light-induced defects in a-Si:H deposited from 'new' deposition techniques (1996) (4)
The effect of superlattice buffer of microcrystalline silicon solar cells (2003) (4)
Analysis of free-carrier optical absorption used for characterization of microcrystalline silicon films (2001) (4)
The effect of hydrogen species on the electronic properties of nc-Si:H prepared in a triode PECVD system (1996) (3)
High rate growth of microcrystalline silicon films assisted by high density plasma (2003) (3)
Energy location of light-induced ESR centers in undoped a-Si:H (1998) (3)
Reduction of defects of polycrystalline silicon thin films by heat treatment with high-pressure H2O vapor (2001) (3)
Threshold intensity for dangling-bond-termination reaction by ultraviolet laser irradiation during plasma deposition of a-Si:H films (1993) (3)
Low-Temperature Formation of Polycrystalline Silicon and Its Device Application (2003) (3)
Promising window layer of thin film si solar cell with p-i-n structure prepared by using SiH2Cl2 (2002) (3)
Photocarrier capture properties in a-Si:H (2002) (3)
Measurement of spatial distribution of gap states originating from dangling bonds near metal/a-Si:H interface (1985) (3)
Real-time observation of the energy band diagram during microcrystalline silicon p–i interface formation (2003) (3)
Classification of Inhomogeneities in Hydrogenated Amorphous Silicon (1991) (3)
Investigation of Light-Induced Defect Depth Profile in Hydrogenated Amorphous Silicon Films (2002) (3)
Incorporation of Constituent Atoms of Transparent Conductive Films into Hydrogenated Amorphous Silicon via Gas Phase (1988) (3)
Initial Growth of Microcrystalline Silicon on Atomically Flat Hetero-Substrate (1997) (3)
Control of Photo-Induced Degradation in a-Si:H Prepared from Xe-Diluted Silane (1991) (3)
Pulsed Esr Study of Light-Induced Metastable Defects in 17O and 13C Incorporated a-Si:H (1996) (3)
Structure of platinum-hydrogenated amorphous silicon interfaces studied by fluorescence-detected x-ray absorption spectroscopy (1985) (2)
Negative correlation energy in amorphous selenium: experimental evidence (1998) (2)
Positron Lifetime Study on Semiconductor Thin Films (1997) (2)
Microcrystalline silicon germanium: An attractive bottom-cell material for thin-film silicon-based tandem-solar-cells (1997) (2)
A study of surface reactions during the growth of B-doped a-Si:H using the intermittent deposition technique (1996) (2)
Synthesis of 10-Membered Masked Oxaenediyne Analogue of Kedarcidin-chr. and C-1027-chr., and Its DNA Cleaving Activity. (1996) (2)
Growth of microcrystalline silicon films using deuterium dilution (2002) (2)
Kinetics and steady-states of light-induced defects in a-Si:H prepared by three different techniques (1993) (2)
Fundamental Properties of Titanium-Doped Indium Oxide and Its Application to Thin-Film Silicon Solar Cells (2012) (2)
Control of Materials and Interfaces in μc-Si:H-based Solar Cells Grown at High Rate (2011) (2)
Relationship between the photo-induced degradation characteristics and film structure of a-Si:H films prepared under various conditions (2000) (2)
High rate growth of device grade silicon thin films for solar cells (2001) (2)
Polarized Electroabsorption in Pulse and Continuous Light-Soaked a-Si:H - Structural Change other than Defect Creation (1997) (2)
Electrical Properties of n--p Amorphous-Crystalline Silicon Heterojunctions (1983) (2)
Plasma Deposition and Characterization of Stable a-Si:H (Cl) From a Silane-Dichlorosilane Mixture (1995) (2)
Growth Mechanism of Hydrogenated Amorphous SiC from a Glow-Discharge Plasma (1992) (2)
Characteristics of Superconducting Gd-Ba-Cu-O Thin Films (1990) (2)
Difference between deposition- and light-induced defects in a-Si:H studied by light-induced annealing experiments (1993) (2)
Large area deposition of hydrogenated amorphous silicon by VHF-PECVD using novel electrodes (2000) (2)
Evidence for the dominance of charged dangling bond defects in the photodegradation of hydrogenated amorphous silicon (1991) (2)
Nanostructure characterization of nanocrystalline Si thin films by using small angle X-ray scattering (SAXS) (2003) (1)
Novel network control in hydrogenated amorphous silicon by molecular beam deposition method (2004) (1)
Improved Crystallinity of Microcrystalline Silicon Films Using Deuterium Dilution (2000) (1)
Light-induced metastability of 'stable' a-Si:H deposited from silane-dichlorosilane mixtures-comprehensive characterization (1996) (1)
μτ Products of 10 −6 cm 2 V −1 Deduced from Eleverse-Bias Dependence of Carrier-Collection Measurements in High Drift Mobility a-Si:H (1995) (1)
The relationship between $I_{{\rm H}_{\rm \alpha } } /(I_{{\rm SiH}}^* )^2$ and crystalline volume fraction in microcrystalline silicon growth (2010) (1)
New Doping Technique for Getting Highly Conductive p-Type Hydrogenated Amorphous Si and Sic Alloys (1990) (1)
Precursor lifetime estimation by ultraviolet laser modulation of a hydrogenated amorphous silicon growth surface (1994) (1)
Reexamination of high drift mobility a-Si:H (1998) (1)
Four terminal cell analysis of amorphous/microcrystalline Si tandem cell (2003) (1)
New Results of nc-Si:H Films Prepared by Hydrogen-Diluted Silane in a Triode Pecvd System (1996) (1)
Plasma CVD Processes for Thin Film Silicon Solar Cells (2008) (1)
Nonlinear Dependence of μ e τ e on Subgap Absorption in Pulse and cw Light-Soaked a-Si:H (1996) (1)
Etching of Amorphous As2S3 Evaporated Films (1975) (1)
Improved Stability of Hydrogenated Amorphous Silicon Solar Cells Fabricated by Triode-Plasma CVD (2005) (1)
High electron and hole drift mobility in a-Si:H [solar cells] (1994) (1)
Investigation of Growth Process in p-Type mc-Si:H for Thin Film-Si Solar Cells (2010) (1)
Charge Transport in Microcrystalline Silicon, Relation to Thin Film Solar Cells (1998) (1)
Film Growth Processes from Glow-Discharge Plasma (1988) (1)
A new perspective on the characterization of materials for a-Si:H solar cells (2001) (1)
1H Nuclear Magnetic Resonance Study of Hydrogenated Amorphous Silicon Deposited from a Xe-diluted Silane Plasma (1992) (1)
Light-soaking stability of nano-structure tailored silicon thin film solar cells (2003) (1)
Impurity diffusion effect on p/i interface properties of p-i-n junction microcrystalline silicon solar cells (2003) (1)
Growth of stable amorphous silicon films by gas‐flow‐controlled RF plasma‐enhanced chemical vapor deposition (2010) (1)
Dependence of Field-Effect Mobility on Deposition Conditions in a-Si:H TFT (1994) (1)
Suppression of Plasma Damage on SnO2 by Means of a Different Surface Chemistry Using Dichlorosilane (2000) (1)
Microcrystalline Si films deposited from dichlorosilane using RF-PECVD (2001) (0)
Control of defect density in a-Si : H by surface processes (1993) (0)
The degradation properties of a-Si:H films prepared by less-conventional methods [solar cells] (2000) (0)
Real-time studies of nucleation and interface formation in microcrystalline silicon growth (2003) (0)
A New Approach to Nine‐Membered Enediyne Using a Palladium Catalyzed Cross‐Coupling Reaction. (1997) (0)
Hydrogen-Initiated Nucleation and Growth of Hydrogenated Amorphous Silicon on Graphite (1995) (0)
Nonlinear dependence of {mu}{sub e}{tau}{sub e} on subgap absorption in pulse and CW light-soaked a-Si:H (1996) (0)
Fabrication of the hydrogenated amorphous silicon films containing less hydrogen and its stability against light soaking (2003) (0)
Fabrication of the Hydrogenated Amorphous Silicon Films Exhibiting High Stability Against Light Soaking (2011) (0)
Substrate Temperature Dependence of Deuteron Bonding States in Deuterated Amorphous Silicon Studied by 2H Nuclear Magnetic Resonance (1994) (0)
Preparation of high photosensitive a-SiGe:H alloys from glow-discharge plasma (1985) (0)
Processing of Thin Film Silicon Solar Cells under Ionic Bombardment Control (2001) (0)
Key Technologies for Next Generation Thin Film Silicon Solar Cells. Issues Upon Surface and Interface of Microcrystalline Silicon Thin Film as a Solar Cell Material. (2000) (0)
Field Enhanced Processes in Photodoping Effects in Amorphous As2S3 (1972) (0)
On the Role of Charged Defect States and Deep Traps in the Photocarrier Drift and Diffusion in a-Si:H (2000) (0)
Pulsed ESR study of light-induced metastable defects in {sup 17}O and {sup 13}C incorporated a-Si:H (1996) (0)
In-situ monitoring of surface hydrogen on the a-SiGe:H films (1997) (0)
The relationship between IHα/(I*SiH)2 and crystalline volume fraction in microcrystalline silicon growth (2010) (0)
Improvement of microcrystalline silicon solar cell by insertion of buffer layer to TCO/p interface (2003) (0)
Effects of Electrode Distance on Plasma Parameters and a-Si:H Film Properties in Plasma CVD Process (1997) (0)
Dependence of Steady-State Defect Density in Hydrogenated Amorphous Silicon on Carrier Generation Rate Studied Over a Wide Range (1993) (0)
Measurements on Radio-Frequency Discharge Plasma of Silane by Coherent Anti-Stokes Raman Spectroscopy and Laser-Induced Fluorescence (1989) (0)
Synthesis of 9-Membered Masked Enediyne Analogues [cf. (V) and (VIII)] Possessing DNA Intercalator and Sugar Moieties. (1999) (0)
A method for producing a silicon film on a substrate in a plasmaatmosphaere (1985) (0)
Gas temperature estimation of microcrystalline-slicon-film-growth process under high pressure in VHF PECVD (2017) (0)
Pump–probe pulse transient photoconductivity study in amorphous and microcrystalline Si:H (2002) (0)
Effects of Intermittent Deposition on the Defect Density in a-Si:H (1994) (0)
Development of Ultra-Clean Plasma Deposition Process (1999) (0)
Structural analysis of amorphous thin films by time of flight mass spectrometry (1996) (0)
Area 1 Crystalline and Thin Film Silicon PV GAS TEMPERATURE DETERMINATION AT MICROCRYSTALLINE SILCON FILM GROWTH UNDER HIGH GROWTH RATE CONDITION USING VHF-PECVD METHOD (2017) (0)
Film growth of amorphous silicon under high substrate temperature and surface dangling-bond reducation (2016) (0)
A SIMPLIFIED MODEL FOR THE DEPOSITION KINETICS OF GD a-Si : H FILMS (1981) (0)
4.2 Process Control for Obtaining High Quality Amorphous Silicon-Based Wide-Gap Materials(4.Film Properties and Device Performance, Science and Technology of Plasma-Enhanced Chemical Vapor Deposition for High-Efficiency Silicon Solar Cells) (2015) (0)
Laser Beam Deflection with CdS Single Crystal (1971) (0)
Manufacturing method of thin films, thin films and apparatus for the production of solar cell (2001) (0)
High Rate Growth of High Quality Polysilicon at Low Temperatures Using Plasma CVD (2000) (0)
Effect of Substrate-Surface Roughness on Defect Density and Photovoltaic Performance in μc-Si:H Solar Cells (2010) (0)
High–conductive and wide optical–gap boron–doped Si:H films (2008) (0)
As grown and light soaked defect densities in a-Si:H with sharp band tails (1996) (0)
Mechanism of plasma chemical-vapor deposition of hydrogenated amorphous silicon (1993) (0)
Characterization of thin films by a pulsed positron beam (2008) (0)
Electron temperature control in silane plasma for fabricating highly stabilized hydrogenated amorphous silicon (2003) (0)
Unusual hydrogen distribution and its change in hydrogenated amorphous silicon prepared using bias electric-field molecular beam deposition (2006) (0)
Factors limiting further improvement of a-SiGe:H (1996) (0)
Control of electron temperature in SiH4/H2 plasma for obtaining high photovoltaic performance in microcrystalline silicon solar cells (2013) (0)
Control of Plasma Deposition by the Observation of Plasma Spectrum (1980) (0)
Defect-Density Distribution in Microcrystalline Silicon Prepared at High Growth Rate (2010) (0)
Photoacoustic spectra of P‐doped and undoped GD a‐Si:H films (2008) (0)
Defect distribution in PADS a-Si:H and its application for solar cells (2016) (0)
Improvement of Photovoltaic Performance in Microcrystalline Silicon Thin Film Solar Cells by Means of Compress Layer (2010) (0)
Strategies and Issues on the Plasma Processing of Thin‐Film Silicon Solar Cells (2010) (0)

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What Schools Are Affiliated With Akihisa Matsuda?

Akihisa Matsuda is affiliated with the following schools:

Osaka University