Andrew R. Neureuther
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Andrew R. Neureutherengineering Degrees
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Electrical Engineering
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Engineering
Andrew R. Neureuther's Degrees
- PhD Electrical Engineering University of California, Berkeley
- Masters Electrical Engineering University of California, Berkeley
- Bachelors Electrical Engineering University of California, Berkeley
Why Is Andrew R. Neureuther Influential?
(Suggest an Edit or Addition)Andrew R. Neureuther's Published Works
Number of citations in a given year to any of this author's works
Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- Ultrabroadband mirror using low-index cladded subwavelength grating (2004) (454)
- Modeling projection printing of positive photoresists (1975) (242)
- A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography (1979) (227)
- Self-organized silver nanoparticles for three-dimensional plasmonic crystals. (2008) (176)
- A general simulator for VLSI lithography and etching processes: Part II—Application to deposition and etching (1980) (118)
- Line‐Profile resist development simulation techniques (1977) (115)
- Rigorous three-dimensional time-domain finite-difference electromagnetic simulation (1995) (113)
- Scattering from a perfectly conducting surface with a sinusoidal height profile: TE polarization (1971) (98)
- Mask topography effects in projection printing of phase-shifting masks (1994) (80)
- Electron-beam resist edge profile simulation (1979) (77)
- From poly line to transistor: building BSIM models for non-rectangular transistors (2006) (75)
- Simplified models for edge transitions in rigorous mask modeling (2001) (66)
- Development of positive photoresist (1984) (64)
- Modeling oblique incidence effects in photomasks (2000) (63)
- Modeling ion milling (1979) (55)
- Energy deposition and transfer in electron-beam lithography (2001) (53)
- Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering (2002) (53)
- Models and algorithms for three-dimensional topography simulation with SAMPLE-3D (1994) (52)
- Identifying And Monitoring Effects Of Lens Aberrations In Projection Printing (1987) (50)
- Algorithms for simulation of three-dimensional etching (1994) (46)
- Shot-noise and edge roughness effects in resists patterned at 10 nm exposure (1998) (43)
- Studies of Ag photodoping in GexSe1−x glass using microlithography techniques (1985) (42)
- Coherence of defect interactions with features in optical imaging (1987) (40)
- An efficient photoresist development simulator based on cellular automata with experimental verification (2000) (40)
- Massively Parallel Algorithms for Scattering in Optical Lithography (1990) (40)
- Extension of the Hopkins theory of partially coherent imaging to include thin-film interference effects (1993) (39)
- An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification (1993) (38)
- Extreme ultraviolet mask defect simulation: Low-profile defects (2000) (36)
- Quantitative phase retrieval with arbitrary pupil and illumination. (2015) (32)
- Fast simulation methods and modeling for extreme ultraviolet masks with buried defects (2009) (32)
- Reduction in x‐ray lithography shot noise exposure limit by dissolution phenomena (1988) (31)
- Modeling and simulation of a deep‐ultraviolet acid hardening resist (1990) (30)
- Measuring optical image aberrations with pattern and probe based targets (2002) (29)
- SIMPL-2 (SIMulated Profiles from the Layout-Version 2) (1985) (29)
- The Analysis of Monopole Antennas Located on a Spherical Vehicle: Part 2, Numerical and Experimental Results (1976) (29)
- Moving boundary transport model for acid diffusion in chemically amplified resists (1999) (28)
- Proximity Effects And Influences Of Nonuniform Illumination In Projection Lithography (1982) (28)
- Radiation patterns for two monopoles on a perfectly conducting sphere (1970) (27)
- Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging (2003) (27)
- Reaction‐diffusion modeling and simulations in positive deep ultraviolet resists (1995) (27)
- A study of the sheath helix with a conducting core and its application to the helical antenna (1967) (26)
- Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations (2006) (26)
- Post-decomposition assessment of double patterning layouts (2008) (26)
- Transport of intensity phase imaging in the presence of curl effects induced by strongly absorbing photomasks. (2014) (25)
- Shot noise models for sequential processes and the role of lateral mixing (2006) (25)
- Simulation of locally enhanced three‐dimensional diffusion in chemically amplified resists (1993) (24)
- Optical Imaging With Phase Shift Masks (1984) (24)
- Application of Line-Edge Profile Simulation to Thin-Film Deposition Processes (1980) (23)
- Rigorous simulation of mask corner effects in extreme ultraviolet lithography (1998) (22)
- Numerical Solutions of Electromagnetic Boundary Value Problems by Means of the Asymptotic Anticipation Method (1968) (22)
- Calculating aerial images from EUV masks (1999) (21)
- Compensation methods using a new model for buried defects in extreme ultraviolet lithography masks (2010) (21)
- Negative resist corner rounding. Envelope volume modeling (1996) (20)
- Methodology for accurate and rapid simulation of large arbitrary 2D layouts of advanced photomasks (2002) (20)
- Three-dimensional simulation of optical lithography (1991) (20)
- The intertool profile interchange format: a technology CAD environment approach [semiconductor technology] (1991) (20)
- Contrast Enhanced UV Lithography With Polysilanes (1984) (19)
- 3D Lithography, Etching, and Deposition Simulation (Sample-3D) (1991) (19)
- Massively parallel electromagnetic simulation for photolithographic applications (1995) (18)
- An Efficient Loop Detection and Removal Algorithm for 3D Surface-Based Lithography Simulation (1992) (18)
- The Analysis of Monopole Antennas Located on a Spherical Vehicle: Part 1, Theory (1976) (18)
- Simulated profiles from the layout-design interface in X (SIMPL-DIX) (1988) (18)
- Simplified model for absorber feature transmissions on EUV masks (2006) (18)
- Photoinduced diffusion of Ag in GexSe1−x glass (1985) (17)
- Compensation methods for buried defects in extreme ultraviolet lithography masksa) (2011) (17)
- Performance of repaired defects and attPSM in EUV multilayer masks (2002) (17)
- Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation (1998) (17)
- Simulation of dry etched line edge profiles (1979) (17)
- Developer temperature effect on negative deep ultraviolet resists: Characterization, modeling, and simulation (1997) (16)
- Algorithms for three-dimensional simulation of photoresist development (1990) (16)
- A pattern matching system for linking TCAD and EDA (2004) (16)
- Applications of profile simulation for thin film deposition and etching processes (1983) (15)
- Simulation of x‐ray resist line edge profiles (1978) (15)
- Compensation methods for buried defects in extreme ultraviolet lithography masks (2010) (15)
- Enhanced quantitative analysis of resist image contrast upon line- edge roughness (LER) (2003) (15)
- Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography (1993) (15)
- Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection (2015) (15)
- Extreme ultraviolet mask defect simulation (1999) (15)
- Microlithography with Soft X Rays (1980) (15)
- Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists (2005) (14)
- No-fault assurance: linking fast process CAD and EDA (2002) (14)
- Factors Affecting Linewidth Control Including Multiple Wavelength Exposure And Chromatic Aberration (1981) (14)
- Smoothing based fast model for images of isolated buried EUV multilayer defects (2008) (14)
- Influence Of Partial Coherence On Projection Printing (1979) (14)
- Fabrication and characteristics of free-standing shaped pupil masks for TPF-coronagraph (2006) (14)
- Understanding metrology of polysilicon gates through reflectance measurements and simulation (1991) (14)
- Exploration of scattering from topography with massively parallel computers (1989) (14)
- Reaction diffusion kinetics in deep-UV positive-tone resist systems (1995) (13)
- Physically Based Modeling of Stress-Induced Variation in Nanoscale Transistor Performance (2011) (13)
- Validation of the aberration-pattern-matching OPC strategy (2002) (13)
- Investigation of reflective notching with massively parallel simulation (1990) (13)
- Effects of conductivity, groove shape, and physical phenomena on the design of diffraction gratings (1973) (13)
- A utility-based integrated process simulation system (1990) (13)
- Domain decomposition methods for simulation of printing and inspection of phase defects (2003) (13)
- Through-focus pattern matching applied to double patterning (2009) (12)
- Optical requirements for projection lithography (1981) (12)
- Characterization of phase defects in phase shift masks (2000) (12)
- Negative resist profiles in 248 nm photolithography: experiment, modelling and simulation (1998) (12)
- Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography (1988) (12)
- RING OSCILLATOR SENSITIVITY TO SPATIAL PROCESS VARIATION (1996) (12)
- PSM polarimetry: monitoring polarization at 193nm high-NA and immersion with phase shifting masks (2005) (12)
- Critical assessment of the transport of intensity equation as a phase recovery technique in optical lithography (2014) (12)
- Propagation effects of partial coherence in optical lithography (1996) (12)
- Simulation of fine structures and defects in EUV etched multilayer masks (2004) (12)
- Analysis of shot noise limitations due to absorption count in EUV resists (2015) (12)
- Evaluating the end-to-end performance of TPF-C with vector propagation models: Part I. Pupil mask effects (2005) (11)
- Variability aware interconnect timing models for double patterning (2009) (11)
- Modeling methodologies and defect printability maps for buried defects in EUV mask blanks (2006) (11)
- Simulation of optical lithography and inspection (1992) (11)
- Monitoring polarization and high-numerical aperture with phase shifting masks: Radial phase grating (2005) (11)
- Radar cross section of a long wire (1969) (11)
- SIMPL-1 (SIMulated Profiles from the Layout-version 1) (1983) (11)
- A 3D substrate and buried defect simulator for EUV mask blanks (2005) (11)
- Effects of shifter edge topography on through focus performance (2001) (11)
- Investigation of the exposure and bake of a positive acting resist with chemical amplification (1990) (11)
- Postexposure bake characterization and parameter extraction for positive deep-UV resists through broad-area exposure experiments (1996) (10)
- EUV Resists: Pushing to the Extreme (2014) (10)
- A utility-based integrated system for process simulation (1992) (10)
- Simulation of EUV multilayer mirror buried defects (2000) (10)
- Polarization effects in mask transmission (1992) (10)
- Fast three-dimensional simulation of buried EUV mask defect interaction with absorber features (2007) (10)
- Are pattern and probe aberration monitors ready for prime time? (2005) (10)
- Platform for collaborative DFM (2006) (10)
- Linear phase ring illumination monitor (2003) (10)
- Exploration of fabrication techniques for phase-shifting masks (1991) (10)
- Resist Characterization: Procedures, Parameters, And Profiles (1982) (10)
- Negative resist profiles of close-spaced parallel and isolated lines: experiment, modelling and simulation (1999) (10)
- Study of energy delivery and mean free path of low energy electrons in EUV resists (2016) (10)
- Edge-profile, materials, and protective coating effects on image quality (1991) (10)
- The use of bias in electron beam lithography for improved profile quality and linewidth control (1981) (10)
- Edge effects in phase-shifting masks for 0.25-µm lithography (1993) (10)
- Linking tcad and eda through pattern matching (2004) (9)
- Zernike phase contrast microscope for EUV mask inspection (2014) (9)
- Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation (1994) (9)
- Layout 'hot spots' for advancing optical technologies (2006) (9)
- Electron‐beam investigation and use of Ge–Se inorganic resist (1986) (9)
- Stray-light sources from pupil mask edges and mitigation techniques for the TPF Coronagraph (2006) (9)
- Models for characterizing the printability of buried EUV defects (2001) (9)
- Variability aware timing models at the standard cell level (2010) (9)
- Overview of the STORM program application to 193nm singe layer resists (2000) (9)
- Investigation of buried EUV mask defect printability using actinic inspection and fast simulation (2009) (9)
- Influence of axial chromatic aberration in projection printing (1981) (9)
- Printability of defects in optical lithography: Polarity and critical location effects (1988) (9)
- Modeling and Simulation of Multiple Chemical States in Photoresist Materials (1989) (9)
- Experimental and simulation studies of alignment marks (1991) (9)
- Phase measurements of EUV mask defects (2015) (9)
- Phase-shifting mask design tool (1992) (8)
- Optical printability of defects in two‐dimensional patterns (1988) (8)
- Studying Resist Stochastics with the Multivariate Poisson Propagation Model (2014) (8)
- Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging (2000) (8)
- If it moves, simulate it! (2008) (8)
- Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction (1998) (8)
- Smith-Purcell radiation from a narrow tape helix (1967) (8)
- Screening layouts for high-numerical aperture and polarization effects using pattern matching (2005) (8)
- Effects of through-focus symmetry in maskless lithography using micromirror arrays (2005) (8)
- Modeling phase-shifting masks (1991) (8)
- Parameter-specific ring oscillator for process monitoring at the 45 nm node (2010) (8)
- Phase-enhanced defect sensitivity for EUV mask inspection (2014) (8)
- Phase-shifting mask polarimetry: monitoring polarization at 193-nm high numerical aperture and immersion lithography with phase shifting masks (2005) (8)
- Printability of phase-shift defects using a perturbational model (1994) (8)
- Computer analysis on the collection of alpha-generated charge for reflecting and absorbing surface conditions around the collector (1984) (8)
- Negative‐tone deep‐ultraviolet resists containing benzylic crosslinkers: Experimental and simulation studies of the crosslinking process (1994) (8)
- A statistically based model of electron‐beam exposed, chemically amplified negative resist (1991) (8)
- Diagnostics of patterning mechanisms in chemically amplified resists from bake dependencies of images (1996) (7)
- Modeling defect-feature interactions in the presence of aberrations (2001) (7)
- The Intertool Profile Interchange Format (1990) (7)
- Improving resist resolution and sensitivity via electric-field enhanced postexposure baking (2002) (7)
- Characterizing illumination angular uniformity with phase-shifting masks (2003) (7)
- Linking TCAD to EDA - benefits and issues (1991) (7)
- Experimental verification of EUV mask limitations at high numerical apertures (2013) (7)
- LAVA web-based remote simulation: enhancements for education and technology innovation (2001) (7)
- Investigation of shot-noise-induced line-edge roughness by continuous-model-based simulation (2004) (7)
- Experimental verification of PSM polarimetry: monitoring polarization at 193nm high-NA with phase shift masks (2006) (7)
- Algorithmic implementations of domain decomposition methods for the diffraction simulation of advanced photomasks (2002) (7)
- Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography (2017) (7)
- Computer-aided design tool for phase-shifting masks (1992) (7)
- Understanding extreme stochastic events in euv resists (2017) (7)
- Stochastics and EUV Patterning in the 1x-nm Regime (2016) (6)
- Exploration of electron-beam writing strategies and resist development effects (1981) (6)
- Actinic EUV scatterometry for parametric mask quantification (2018) (6)
- Electromagnetic characterization of nanoimprint mold inspection (2003) (6)
- Characterization Of Voting Suppression Of Optical Defects Through Simulation (1988) (6)
- Two-Dimensional Optical Proximity Effects (1986) (6)
- Comparison of proximity effects in contrast enhancement layer and bilayer resist processes (1987) (6)
- Improving chemically amplified resist modeling for 2D layout patterns (2003) (6)
- Calibrated exposure and focus test patterns for characterization of optical projection printing (1989) (6)
- Extreme ultraviolet mask roughness: requirements, characterization, and modeling (2014) (6)
- Characterization and modeling of materials for photolithographic simulation (1990) (6)
- IC process modeling and topography design (1983) (6)
- Alignment signals from silicon tapered steps for electron beam lithography (1982) (6)
- Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features (2009) (6)
- Polarization masks: concept and initial assessment (2002) (6)
- Phase-shifter edge effects on attenuated phase-shifting mask image quality (1994) (6)
- Illustration of illumination effects on proximity, focus spillover, and design rules (2009) (6)
- Smoothing based model for images of buried EUV multilayer defects near absorber features (2008) (6)
- Mutual coupling in linear dipole arrays (1972) (6)
- Modeling of novel resist technologies (2019) (6)
- Application of line-edge profile simulation to thin-film deposition processes (1980) (6)
- Mask electron modeling for Coulomb interaction by mask-scattered electrons in electron-beam projection lithography (1998) (6)
- Simulation of backscattered electron signals for x-ray mask inspection (1983) (6)
- Mechanistic Advantages of Organotin Molecular EUV Photoresists. (2022) (6)
- Simulating VLSI wafer topography (1980) (6)
- Design methodology for dark-field phase-shifted masks (1991) (6)
- A comparison of backscattered electron and optical images for submicron defect detection (1985) (6)
- Hypersensitive parameter-identifying ring oscillators for lithography process monitoring (2008) (6)
- Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects (2009) (6)
- Investigating phase-shifting mask layout issues using a CAD toolkit (1991) (6)
- A General Etching Simulator for VLSI Lithography and Etching Processes: Part II - Application to Deposition and Etching (1980) (5)
- Simulation analysis of LER and dose tradeoffs for EUV resists with photo-decomposable quenchers (2013) (5)
- Vector scattering analysis of TPF coronagraph pupil masks (2004) (5)
- Determination Of Quantitative Resist Models From Experiment (1988) (5)
- Self-interferometric electrical image monitors (2006) (5)
- Diffraction Characterization For Process Monitoring, Linewidth Measurement And Alignment (1984) (5)
- Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool (2017) (5)
- Interferometric-probe monitors for self-diagnostics of phase-shifting mask performance (2003) (5)
- Interferometric-probe aberration monitors: aerial image and in-resist performance (2003) (5)
- Topography-dependent electrical parameter simulation for VLSI design (1983) (5)
- EUV scatterometry-based measurement method for the determination of phase roughness (2013) (5)
- Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation (1995) (5)
- Illumination, mask, and tool effects on pattern and probe-based aberration monitors (2002) (5)
- Analysis of OPC features in binary masks at 193 nm (2000) (5)
- Proximity effect correction in variably shaped electron‐beam lithography (1985) (5)
- Prediction of interconnect delay variations using pattern matching (2007) (5)
- Characterizing edge-generated stray light sources for TPF Coronagraph pupil masks (2005) (5)
- Role of illumination and thin film layers on the printability of defects (1995) (5)
- Diffusion effects in chemically amplified deep-UV resists (1994) (5)
- Topography Dependent Step Coverage Resistance Simulation for VLSI Design (1982) (5)
- Quantitative phase retrieval for EUV photomasks (2020) (5)
- Advanced multilayer mirror design to mitigate EUV shadowing (2019) (5)
- Comparative analysis of shot noise in EUV and e-beam lithography (2014) (5)
- Extracting solid conductors from a single triangulated surface representation for interconnect analysis (1996) (5)
- Proximity effects and printability of defects in GexSe1−x resist (1985) (5)
- Enhancement of resist resolution and sensitivity via applied electric field (2000) (5)
- Lithographic performance of thin dendritic polymer resists (2000) (5)
- Numerical experiment of the Shannon entropy in partially coherent imaging by Koehler illumination to show the relationship to degree of coherence. (2011) (5)
- Rigorous electromagnetic simulation applied to alignment systems (2001) (5)
- Effect Of Developer Type And Agitation On Dissolution Of Positive Photoresist (1988) (5)
- Characterization Of The Induction Effect At Mid-Ultraviolet Exposure: Application To AZ2400 At 313 Nm (1982) (5)
- Parameter-specific electronic measurement and analysis of sources of variation using ring oscillators (2009) (5)
- Edge Sharpening, Contrast Enhancement, And Feature Dependent Amplification In Inorganic Resist - A Simulation Study (1983) (5)
- Analysis and modeling of photomask edge effects for 3D geometries and the effect on process window (2009) (5)
- Fast simulation of buried EUV mask defect interaction with absorber features (2007) (5)
- EUV Extendibility: Challenges Facing EUV at 1x and beyond (2013) (4)
- Interferometric-probe aberration monitor performance in the production environment (2004) (4)
- Characterization and monitoring of photomask edge effects (2007) (4)
- Investigating EUV radiochemistry with condensed phase photoemission (2019) (4)
- The characterization and optimization of masked ion beam lithography with 〈100〉 silicon channeling masks (1987) (4)
- The study of phase effects in EUV mask pattern defects (2015) (4)
- Investigating EUV radiation chemistry with first principle quantum chemistry calculations (2019) (4)
- Fast simulation methods for defective EUV mask blank inspection (2004) (4)
- Simulation of imaging and stray light effects in immersion lithography (2003) (4)
- Limitations of resist-based characterization of EUV mask surface roughness (2014) (4)
- Measuring the Phase of EUV Photomasks (2019) (4)
- Extensions of boundary layer modeling of photomask topography effects to fast-CAD using pattern matching (2009) (4)
- Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study (2016) (4)
- Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation. (2011) (4)
- Engineering surface plasmon grating couplers through computer simulation (2008) (4)
- Effects of treatment parameters in electric-field-enhanced postexposure bake (2003) (4)
- Simulation study of the influence of PEB reaction rates on resist LER (2015) (4)
- Methodology for modeling and simulating line-end shortening effects in deep-UV resist (1999) (4)
- 3-D Topography Simulation Using Surface Representation and Central Utilities (1995) (4)
- Effects of wafer topography on the formation of polysilicon gates (1995) (4)
- Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks (2017) (4)
- Alignment Signals from Symmetrical Silicon Marks for Electron Beam Lithography (1983) (4)
- Efficient simulation of postexposure bake processes in STORM (1999) (4)
- Aerial image calculation by eigenvalues and eigenfunctions of a matrix that includes source, pupil, and mask (2010) (4)
- Monte Carlo simulation of registration signals for electron beam microfabrication (1980) (4)
- Modeling chemically amplified resists for 193-nm lithography (2000) (3)
- Large-area optical proximity correction using pattern-based corrections (1994) (3)
- Automatic numerical determination of lateral influence functions for fast-CAD (2010) (3)
- Enabling EUV Ressist Research at the 1 and Smaller Regime (2015) (3)
- Filter design methodology for defect detection in wafer inspection (1997) (3)
- Phase shift mask interferometric birefringence monitor (2006) (3)
- Smoothing Based Model for Images of Isolated Buried EUV Multilayer Defects (2008) (3)
- Rapid simulation of silylation and the role of physical mechanisms in profile shapes (1998) (3)
- Advanced lithography for ULSI (1996) (3)
- Defocus based phase imaging for quantifying electromagnetic edge effects in photomasks Aamod (2014) (3)
- Modeling Optical Lithography Physics (2010) (3)
- Absorber topography dependence of phase edge effects (2015) (3)
- Modeling and simulation for nanometricsa) (2005) (3)
- Simulating photomask edge roughness and corner rounding (1997) (3)
- Modeling stochastic effects of exposure/diffusion and dissolution on missing contacts (2021) (3)
- Analysis of sub-wavelength sized OPC features (1998) (3)
- Modeling anomalous depth dependent dissolution effects in chemically amplified resists (2000) (3)
- Characterizing the dependence of thick-mask edge effects on illumination angle using AIMS images (2015) (3)
- Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure (1998) (3)
- Wavelength and polarization dependent absorbtion effects in millisecond annealing of metal gate structures (2008) (3)
- Alignment signals from resist-coated marks for direct wafer writing (1981) (3)
- Analysis of edge effects in attenuating phase-shift masks using quantitative phase imaging (2013) (3)
- Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks (2004) (3)
- Aberrations are a big part of OPC for phase shifting masks (2002) (3)
- Survey of chemically amplified resist models and simulator algorithms (2001) (3)
- Vector wavefront propagation modeling for the TPF coronagraph (2004) (3)
- Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner (2008) (3)
- Coupling Models and Algorithms for 3D Topography Simulation: Plasma Etching, lon Milling and Deposition in SAMPLE-3D (1992) (3)
- Sample-3D benchmarks including high-NA and thin-film effects (1994) (3)
- Tolpography Modeling in Dry Etching Processes (1984) (3)
- Gradient phase-shifter transitions fabricated by ion milling (1992) (3)
- Models for characterizing phase-shift defects in optical projection printing (1995) (3)
- Recovering effective amplitude and phase roughness of EUV masks (2013) (3)
- Transistor-based electrical test structures for lithography and process characterization (2007) (3)
- Experimental assessment of pattern and-probe aberration monitors (2003) (3)
- Polarization Dependence Of Diffraction By High Resolution Masks (1988) (3)
- Resonance region scatterer studies by a rail line range (1971) (3)
- Improvement of the physical-optics approximation for topography simulation in optical lithography (1993) (3)
- Mathematical model for calculating speckle contrast through focus (2013) (3)
- Polarization contact: mask engineering (2002) (2)
- Images in photoresist for self-interferometric electrical image monitors (2007) (2)
- Algebraic model for the printability of nonplanar phase defects (2003) (2)
- Predicting LER PSD caused by mask roughness using a mathematical model (2014) (2)
- An investigation of some depth of focus issues in high numerical aperture projection lithography system by experiment and simulation (1990) (2)
- Predictive Compact Modeling for Strain Effects in Nanoscale Transistors (2009) (2)
- Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask (2017) (2)
- Perspective on TCAD Integration at Berkeley (1993) (2)
- A self-consistent investigation of Smith–Purcell radiation from a narrow tape helix (1969) (2)
- Probe-pattern grating focus monitor through scatterometry calibration (2008) (2)
- Off-axis Aberration Estimation in an EUV Microscope Using Natural Speckle (2016) (2)
- Operational model for pattern and probe based aberration monitors (2002) (2)
- Examination of phase retrieval algorithms for patterned EUV mask metrology (2015) (2)
- Effects of image contrast and resist types upon line edge roughness (LER) (2002) (2)
- Focus shift and process latitude of contact holes on attenuated phase-shifting masks (1995) (2)
- Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers (2020) (2)
- Effect of the partial coherence on reflective notching (1997) (2)
- Applying double exposed sharp tip technique (DEST) to characterize material phenomena in DUV photoresist (2005) (2)
- Comparison of Approximate-Analysis Techniques for Diffraction Gratings* (1972) (2)
- Partially Coherent Quantitative Phase Retrieval for EUV Lithography (2015) (2)
- ArF imaging modeling by using resist simulation and pattern matching (2001) (2)
- Topography dependent electrical parameter simulation (1982) (2)
- Effects of multilayer mask roughness on extreme ultraviolet lithography (2002) (2)
- Integration of an adaptive parallel N-body solver into a particle-by-particle electron-beam interaction simulator (1999) (2)
- Pattern noise in electron beam resists: PMMA, KRS-XE, TOK, HSQ (2006) (2)
- Limits of optical lithography (1974) (2)
- Characterization of electron‐beam exposed optical resist (1988) (2)
- Assessment of synchronous filtering as an alternative to phase-shifting masks at k1=0.4 (1999) (2)
- Application of a general reaction/diffusion resist model to emerging materials with extension to nonactinic exposure (1997) (2)
- Picometer sensitivity metrology for EUV absorber phase (2020) (2)
- Alignment signals for electron beam lithography (1984) (2)
- Utilizing maximum likelihood deblurring algorithm to recover high frequency components of scanning electron microscopy images (2004) (2)
- Measurement of latent image in resist using scanning probe techniques (2020) (2)
- Projection Lithography with High Numerical Aperture Optics (1981) (2)
- Mutual coupling in infinite dipole arrays (1969) (2)
- Simulation of reflective notching with TEMPEST (1997) (2)
- Experimental assessment of pattern and probe-based aberration monitors (2003) (2)
- Resist Characterization On Reflecting Substrates (1986) (2)
- Measurement and modeling of diffusion characteristics in EUV resist (2018) (2)
- Interaction of electron beams with a modulated reactance surface (1966) (2)
- Process simulation and experiment for RC-parasitics in multilevel metallization (1989) (2)
- Simulation of image quality issues at low k1 for 100-nm lithography (2001) (2)
- LAVA: lithography analysis using virtual access (1998) (1)
- Contrast curves for low energy electron exposures of an EUV resist in a scanning electron microscope (2017) (1)
- Two-dimensional Electromagnetic Simulation of Topography Scattering and Diffraction for Optical Lithography (2016) (1)
- DRC and mask friendly pattern and probe aberration monitors (2007) (1)
- 3D modeling of EUV photoresist using the multivariate Poisson propagation model (2021) (1)
- Effect of background exposure dose upon line-edge roughness (LER) (2004) (1)
- 45nm-generation parameter-specific ring oscillator monitors (2010) (1)
- Computational Evaluation Of Three-dimensional Topography Process Simulation Components (1993) (1)
- 2004 International Microprocesses and Nanotechnology Conference Committee Members (2004) (1)
- Simulation of exposure and alignment for nanoimprint lithography (2002) (1)
- Polarization contact: Concept and initial assessment (2002) (1)
- Aberration estimation using EUV mask roughness (2015) (1)
- Efficient and innovative use of three-dimensional geometry services in IC topography and process flow simulations (1995) (1)
- Characterizing the demons in high-NA phase-shifting masks (2004) (1)
- Fast resist modeling and its application in 193-nm lithography (2004) (1)
- Erratum: Monte Carlo simulation of registration signals for electron beam microfabrication[App. Phys. Lett. 36, 6, 672 (1981)] (1981) (1)
- Wafer Topography Simulation (1983) (1)
- Effects of residual aberrations on line-end shortening in 193-nm lithography (2002) (1)
- Phase shifting mask as a precision instrument for characterizing image-forming optical systems (2005) (1)
- An Experimental Characterization System for Deep Ultra-Violet (UV) Photoresists (1989) (1)
- Simulation of Soft-X-Ray Images from a 1:1 Ring-Field Optic (1993) (1)
- Three-dimensional lithography cases for exploring technology solutions and benchmarking simulators (1993) (1)
- Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations (2020) (1)
- Practical cage‐effect model for crosslinking in a negative chemically amplified resist and its use in comparing e‐beam and optical exposure (1992) (1)
- Spatially resolved dissolution monitoring using AFM (2022) (1)
- Process modeling and simulation tools (1986) (1)
- Lithographic performance of advanced thin resists (2000) (1)
- Simulation of lithography (1986) (1)
- Simulating novel EM effects (2007) (1)
- Resist Profile Quality and Linewidth Control (1983) (1)
- A Utility-Based Integrated System for Process (1992) (1)
- Stress dependent silylation model and two-dimensional profile simulation (1997) (1)
- Machining integrated optical structures in photoresist (1973) (1)
- Lateral interactions between standard cells using pattern matching (2007) (1)
- Fast imaging algorithm for simulating pattern transfer in deep-UV resist and extracting postexposure bake parameters (2000) (1)
- Impact of noise sources and optical design on defect sensitivity for EUV actinic pattern inspection (2016) (1)
- Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection (2017) (1)
- The effects of the photomask on multiphase shift test monitors (2006) (1)
- Three-dimensional post-exposure modeling and its applications (2001) (1)
- Improved performance of Apex-E photoresist with the application of the electric-field-enhanced PEB (2004) (1)
- EUV phase-shifting masks and aberration monitors (2002) (1)
- Inorganic resist phenomena and their applications to projection lithography (1986) (1)
- Efficient phase defect modeling using domain decomposition methods (2002) (1)
- Algebraic model for extremely unlikely resist dissolution events (2020) (1)
- Comparison of exposure, bake, and dissolution characteristics of electron beam and optically exposed chemically amplified resists (1990) (1)
- Excitation selectivity in model tin-oxo resist: a computational chemistry perspective (2020) (1)
- Rigorous simulation of statistical electron–electron interactions with fast multipole acceleration and a network of workstations (1998) (1)
- Collaborative platform, tool-kit, and physical models for DfM (2007) (0)
- Introduction to Electronics: Sophomore Self-Study Course (1979) (0)
- Lawrence Berkeley National Laboratory Lawrence Berkeley National Laboratory Title Comparison of fast 3 D simulation and actinic inspection for EUV masks with buries defects (2009) (0)
- Database and data analysis strategy for multi-designer testchips (2007) (0)
- Resist parameter extraction with graphical user interface in X (1991) (0)
- Simulation of mask scattering effects in masked ion beam lithography (1985) (0)
- X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources (1984) (0)
- On the numerical analysis of thin-wire antennas mounted on a conducting sphere (1970) (0)
- Take A Look Inside : Photronics Best Student Oral Finalist EUV Mask Characterization with Actinic Scatterometry (2019) (0)
- Investigation of proximity effects for a rim phase-shifting mask printed with annular illumination (1994) (0)
- Modeling Validation, Techniques and Applications for X-Ray Lithography. (1976) (0)
- Recovering Curl Using an Iterative Solver for the Transport of Intensity Equation (2015) (0)
- Pattern and probe-based aberration monitors for the human eye (2003) (0)
- A perspective on collaborative research for emerging technologies and design (2012) (0)
- EUV phase scatterometry with linearized rigorous scattering (2022) (0)
- Two-wave pattern shift aberration monitor for centrally obscured optical systems (2005) (0)
- Characterization of a Photoresist Selected Tone with Wavelength (1990) (0)
- High-sensitivity interferometric schemes for ML2 micromirror calibrations (2006) (0)
- Image denoising for electron beam metrology (2020) (0)
- Application of Lithography Simulation to Projection X-Ray (1993) (0)
- Impact of EUV SRAF on Bossung tilt (2017) (0)
- Application of kernel convolution for complementing source mask optimizationa) (2011) (0)
- Exploratory Test Structures for Image Evaluation in Optical Projection Printing (1989) (0)
- Effect of amplitude roughness on EUV mask specifications (2014) (0)
- Design of Asymmetrical Grating Couplers for Surface Plasmon Enhanced Illuminators Through Rigorous Computer Simulation (2008) (0)
- Characterization of a photoresist with wavelength selected tone (1990) (0)
- Exploratory test structures for characterization of electron-beam lithography (1989) (0)
- Fast algorithm for extraction of worst-case image degradation due to flare (2004) (0)
- EUV mask characterization with actinic scatterometry (2018) (0)
- Lawrence Berkeley National Laboratory Recent Work Title Shot noise models for sequential processes and the role of lateral mixing Permalink (2006) (0)
- Thank you to our 2022 Sponsors! Organized By: (2022) (0)
- Expansion of image interaction by the eigenfunction of the transmission cross coefficient to show the interaction between features. (2010) (0)
- INTERACTION OF MODULATED ELECTRON BEAMS WITH OPEN PERIODIC STRUCTURES (1966) (0)
- STUDY OF ALIGNMENT SIGNALS FOR ELECTRON LITHOGRAPHY. (1980) (0)
- Effects of Sizing, Alignment and Defects on Projection Printing with Phase-Shifting Masks (1991) (0)
- Continuous-slope phase-shift transition (1992) (0)
- Resist Characterization and Lithography Simulation (1991) (0)
- 3-D Diffusion Models for Chemically-Amplified Resists Using Massively Parallel Processors (1993) (0)
- Concurrent Circuit Design/Process Engineering in a (1993) (0)
- Collaborative research on emerging technologies and design (2011) (0)
- Impact of tool design on defect detection sensitivity for EUV actinic blank inspection (2017) (0)
- Coulomb interactions and the effect of compensating lens aberration in projection electron-beam systems (2000) (0)
- Pattern noise in e-beam exposed sub-35nm contacts (2006) (0)
- Title Absorber topography dependence of phase edge effects Permalink (2015) (0)
- RESIST TECHNOLOGY FOR NANOELECTRONICS AND DUV/EUV LITHOGRAPHY: EXPERIMENT, MODELING, AND SIMULATION (1998) (0)
- Image Simulation for Soft-X-ray Projection Printing (1993) (0)
- Characterization of material contrast and effective wavelength effects in immersion inspection (2004) (0)
- OPC rectification of random space patterns in 193-nm lithography (2002) (0)
- Technologies for Microlithography Manufacturing (1995) (0)
- Elucidating the radiation chemistry of prototypical tin-oxo resist with first-principles computations (2021) (0)
- Study of Defects in Multilayer Reflective Coatings for Soft X-ray Projection Lithography Mask (1993) (0)
- Picometer sensitivity metrology for EUV absorber phase (2021) (0)
- Modeling Soft X-Ray Projection Lithography (1993) (0)
- JMI 2014 List of Reviewers. (2015) (0)
- Rigorous Three-dimensional Time-do Ain Finite-difference Electromagnetic 1 P Simulation 1 Rigorous Three-dimensional Time-domain Finite-difference Electromagnetic Simulation Rigorous Three-dimensional Time-domain Finite-difference Electromagnetic Simulation Copyright 0 1994 Abstract Rigorous Three-d (0)
- Simulation of Non-uniformities in Sources and Optics in Projection Printing (1994) (0)
- Diagnosing phenomena that influence missing contacts and pillars (2022) (0)
- Verification of a high-resolution PEB parameter extraction methodology based on double exposure technique (2002) (0)
- Predictive Compact Modeling for Strain Effects in (2009) (0)
- Actinic EUV scatterometry for parametric mask quantification (Conference Presentation) (2017) (0)
- Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model (2021) (0)
- Validation of Modeling Hoechst AZ PN114 for EUV Projection Lithography and Investigation of Diffusion Effects (1994) (0)
- Parameter sensitive patterns for scatterometry monitoring (2007) (0)
- Structure of stochastic Coulomb interactions in electron beam columns (2000) (0)
- Measurement and characterization of EUV mask performance at high-NA Rikon (2013) (0)
- Innovative Technologies for Maskless Lithography and Non-Conventional Patterning (2008) (0)
- Tiny footprint programmable electrical defocus monitors (2009) (0)
- Conference of The American Vacuum Society Endorsed by : American Physical Society Endorsed by : Optical Society of America and Technical Co-sponsorship by : The Electron Devices Society of the Institute of Electrical and Electronic Engineers (2013) (0)
- Measuring EUV mask 3D effects with hyperspectral Zernike phase contrast (2021) (0)
- Impact of positive ions and effect of lens aberrations in projection electron-beam systems (2001) (0)
- Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. (2017) (0)
- Processing issues and modeling (2017) (0)
- Addendum: Interaction of electron beams with a modulated reactance surface (1966) (0)
- WORKSHOP ON N OF PROCESSES AN INTEGRATED (1986) (0)
- Feature level test patterns for characterizing residual process effects (2004) (0)
- Impact of photomask quadrature edge effects through focus (2008) (0)
- Two-dimension diffraction by slits or strips (1966) (0)
- Web tool for worst-case assessment of aberration effects in printing a layout (2003) (0)
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