Dennis W. Hess
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Computer Science
Dennis W. Hess's Degrees
- PhD Computer Science Stanford University
- Masters Computer Science Stanford University
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(Suggest an Edit or Addition)Dennis W. Hess's Published Works
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Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- Fabrication of "roll-off" and "sticky" superhydrophobic cellulose surfaces via plasma processing. (2008) (447)
- Hierarchical silicon etched structures for controlled hydrophobicity/superhydrophobicity. (2007) (277)
- A mathematical model for spin coating of polymer resists (1984) (237)
- A Novel Method of Etching Copper Oxide Using Acetic Acid (2001) (230)
- Mechanically robust superhydrophobicity on hierarchically structured Si surfaces (2010) (223)
- XPS investigation of Nafion® membrane degradation (2007) (212)
- Global Model of Plasma Chemistry in a High Density Oxygen Discharge (1993) (210)
- Superhydrophobicity on two-tier rough surfaces fabricated by controlled growth of aligned carbon nanotube arrays coated with fluorocarbon. (2005) (176)
- Well-aligned open-ended carbon nanotube architectures: an approach for device assembly. (2006) (174)
- Creation of superhydrophobic stainless steel surfaces by acid treatments and hydrophobic film deposition. (2012) (168)
- Oxygen plasma etching for resist stripping and multilayer lithography (1989) (158)
- Patterning of superhydrophobic paper to control the mobility of micro-liter drops for two-dimensional lab-on-paper applications. (2009) (149)
- Relationship between Work of Adhesion and Contact Angle Hysteresis on Superhydrophobic Surfaces (2008) (131)
- UV and thermally stable superhydrophobic coatings from sol-gel processing. (2008) (131)
- Structural properties of titanium dioxide films deposited in an rf glow discharge (1983) (126)
- Growth and electrical characterization of high-aspect-ratio carbon nanotube arrays (2006) (125)
- Aligned carbon nanotube stacks by water-assisted selective etching. (2005) (120)
- Transport models for swelling and dissolution of thin polymer films (1989) (103)
- Surface modification of paper and cellulose by plasma-assisted deposition of fluorocarbon films (2005) (103)
- Monitoring carbon nanotube growth by formation of nanotube stacks and investigation of the diffusion-controlled kinetics. (2006) (101)
- Superhydrophobic and low light reflectivity silicon surfaces fabricated by hierarchical etching. (2008) (98)
- Area selective atomic layer deposition of titanium dioxide : Effect of precursor chemistry (2006) (92)
- Biomimetic creation of hierarchical surface structures by combining colloidal self-assembly and Au sputter deposition. (2006) (91)
- Structural and optical properties of plasma-deposited boron nitride films (1986) (88)
- Creation of superhydrophobic wood surfaces by plasma etching and thin-film deposition (2015) (85)
- Design and fabrication of superamphiphobic paper surfaces. (2013) (75)
- Two-Step Process To Create "Roll-Off" Superamphiphobic Paper Surfaces. (2017) (73)
- Electrowetting of aligned carbon nanotube films. (2006) (71)
- Area-Selective ALD of Titanium Dioxide Using Lithographically Defined Poly(methyl methacrylate) Films (2006) (70)
- Plasma‐enhanced CVD: Oxides, nitrides, transition metals, and transition metal silicides (1984) (69)
- Tunability of the Adhesion of Water Drops on a Superhydrophobic Paper Surface via Selective Plasma Etching (2009) (68)
- Comparison of Aluminum Etch Rates in Carbon Tetrachloride and Boron Trichloride Plasmas (1981) (67)
- Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures (1999) (67)
- Chemical Bonding of Partially Fluorinated Graphene (2014) (66)
- Kinetics of the Thermal Oxidation of Silicon in O 2 / HCl Mixtures (1977) (66)
- Silicon surface structure-controlled oleophobicity. (2010) (66)
- Inhibition of Bacterial Adhesion on Nanotextured Stainless Steel 316L by Electrochemical Etching (2017) (65)
- Tungsten Etching in CF 4 and SF 6 Discharges (1984) (65)
- Chemical Vapor Deposition: A Chemical Engineering Perspective (1985) (62)
- The growth of carbon nanotube stacks in the kinetics-controlled regime (2007) (62)
- Superhydrophobic optically transparent silica films formed with a eutectic liquid (2009) (61)
- Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition (2007) (56)
- Oxidation of silicon in an electron cyclotron resonance oxygen plasma: Kinetics, physicochemical, and electrical properties (1990) (55)
- Effects of dc bias on the kinetics and electrical properties of silicon dioxide grown in an electron cyclotron resonance plasma (1991) (55)
- Plasma-assisted oxidation, anodization, and nitridation of silicon (1999) (54)
- Plasma‐enhanced chemical vapor deposition of β‐tungsten, a metastable phase (1984) (54)
- Swelling of poly(methyl methacrylate) thin films in low molecular weight alcohols. (1990) (52)
- Fabrication of non-fluorinated hydrophilic-oleophobic stainless steel mesh for oil-water separation (2017) (46)
- Ion transit through capacitively coupled Ar sheaths: Ion current and energy distribution (1988) (43)
- Effect of chain length on the wetting properties of alkyltrichlorosilane coated cellulose-based paper (2016) (41)
- Fabrication of oleophobic paper with tunable hydrophilicity by treatment with non-fluorinated chemicals (2015) (41)
- Microelectronics Processing: Chemical Engineering Aspects (1989) (41)
- Measurement of rotational temperature and dissociation in N2O glow discharges using in situ Fourier transform infrared spectroscopy (1988) (39)
- Plasma etch chemistry of aluminum and aluminum alloy films (1982) (39)
- Plasma–material interactions (1990) (38)
- Kinetics of photoresist etching in an electron cyclotron resonance plasma (1990) (38)
- Water and Moisture Uptake by Plasma Polymerized Thermoresponsive Hydrogel Films (2006) (38)
- Nitrogen incorporation in thin oxides by constant current N2O plasma anodization of silicon and N2 plasma nitridation of silicon oxides (1996) (37)
- Reaction of atomic and molecular chlorine with aluminum (1986) (37)
- Robust Superhydrophobic Surfaces Prepared With Epoxy Resin and Silica Nanoparticles (2012) (37)
- Correlation of chemical and electrical properties of plasma‐deposited tetramethylsilane films (1981) (37)
- A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films (2006) (37)
- In Situ Ellipsometry to Monitor Swelling and Dissolution of Thin Polymer Films (1989) (36)
- Dissolution of Thin Poly(methyl methacrylate) Films in Ketones, Binary Ketone/Alcohol Mixtures, and Hydroxy Ketones (1989) (36)
- Chemical Etching and Patterning of Copper, Silver, and Gold Films at Low Temperatures (2015) (36)
- Photoelectron spectroscopy studies of plasma-fluorinated epitaxial graphene (2012) (35)
- A Bergman cyclization approach to polymers for thin-film lithography (2001) (35)
- Diagnostics and modeling of N/sub 2/O RF glow discharges (1989) (35)
- Plasma-Surface Interactions in Plasma-Enhanced Chemical Vapor Deposition (1986) (33)
- An in situ study of dissolution and swelling behavior of poly‐(methyl methacrylate) thin films in solvent/nonsolvent binary mixtures (1987) (32)
- Influence of Processing and Molecular Parameters on the Dissolution Rate of Poly‐(Methyl Methacrylate) Thin Films (1987) (31)
- Aluminum Etching in Carbon Tetrachloride Plasmas (1980) (31)
- Reaction of 1,1,1,5,5,5‐Hexafluoro‐2,4‐pentanedione (H+hfac) with CuO , Cu2 O , and Cu Films (1995) (31)
- Low-Temperature Etching of Cu by Hydrogen-Based Plasmas (2010) (31)
- Kinetics of the Thermal Oxidation of Silicon in O 2 / H 2 O and O 2 / Cl2 Mixtures (1978) (31)
- Plasma polymerized hydrogel thin films (2006) (30)
- Underwater Curvature-Driven Transport between Oil Droplets on Patterned Substrates. (2018) (30)
- Aligned carbon nanotubes for electrical interconnect and thermal management (2005) (29)
- Effect of the polarity of carbon-fluorine bonds on the work function of plasma-fluorinated epitaxial graphene (2012) (28)
- Hysteresis controlled water droplet splitting on superhydrophobic paper (2013) (28)
- Ferroelectric fatigue endurance of Bi4-xLaxTi3O12 thin films explained in terms of x-ray photoelectron spectroscopy (2007) (27)
- Creation of low hysteresis superhydrophobic paper by deposition of hydrophilic diamond-like carbon films (2013) (27)
- Wettability control of stainless steel surfaces via evolution of intrinsic grain structures (2016) (26)
- Conduction mechanism in plasma-polymerized tetramethylsilane films (1981) (25)
- Demonstration of plutonium etching in a RF glow discharge (1991) (25)
- UV-Resistant and Superhydrophobic Self-Cleaning Surfaces Using Sol–Gel Processes (2008) (25)
- Post Plasma Etch Residue Removal Using CO 2 TMAHCO 3 Mixtures: Comparison of Single-Phase and Two-Phase Mixtures (2004) (25)
- Assembling Carbon Nanotube Films as Thermal Interface Materials (2007) (25)
- Local work function measurements of plasma-fluorinated epitaxial graphene (2014) (25)
- Plasma-Enhanced Chemical Vapor Deposition of Tungsten Films, (1982) (24)
- Sustainable and long-time 'rejuvenation' of biomimetic water-repellent silica coating on polyester fabrics induced by rough mechanical abrasion. (2018) (24)
- Deposition chemistry and structure of plasma-deposited silicon nitride films from 1,1,3,3,5,5-hexamethylcyclotrisilazane (1988) (23)
- Post-Plasma-Etch Residue Removal Using CO 2-Based Fluids (2003) (23)
- Molybdenum etching with chlorine atoms and molecular chlorine plasmas (1988) (23)
- Nitrogen Incorporation in Thin Silicon Oxides in a N 2 O Plasma Effects of Processing Conditions (1998) (23)
- Plasma-deposited fluorocarbon films: insulation material for microelectrodes and combined atomic force microscopy-scanning electrochemical microscopy probes. (2008) (23)
- Optimization of a Carbon Dioxide-Assisted Nanoparticle Deposition Process Using Sequential Experimental Design with Adaptive Design Space (2012) (22)
- Oxide formation during plasma etching of silicon‐containing resists (1989) (22)
- Tantalum etching in fluorocarbon/oxygen rf glow discharges (1990) (22)
- Tunable bands in biased multilayer epitaxial graphene. (2012) (21)
- Low-temperature hydrolysis (oxidation) of plasma-deposited silicon nitride films (1989) (21)
- Directional Mobility and Adhesion of Water Drops on Patterned Superhydrophobic Surfaces (2011) (20)
- Lotus effect surface for prevention of microelectromechanical system (MEMS) stiction (2005) (20)
- Mid-infrared chemical sensors utilizing plasma-deposited fluorocarbon membranes. (2007) (20)
- Comparison of plasma chemistries and structure-property relationships of fluorocarbon films deposited from octafluorocyclobutane and pentafluoroethane monomers (2001) (20)
- Reaction of 1,1,1,5,5,5‐Hexafluoro‐2,4‐pentanedione ( H + hfac ) with Iron and Iron Oxide Thin films (1996) (20)
- Structure and optical properties of plasma‐deposited fluorinated silicon nitride thin films (1988) (20)
- Plasma etching of copper films at low temperature (2007) (20)
- Incomplete Wetting of Nanoscale Thin-Film Structures (2003) (19)
- Control of fixed charge at Si–SiO2 interface by oxidation‐reduction treatments (1973) (19)
- Plasma-enhanced chemical vapor deposition of silicon nitride from 1,1,3,3,5,5-hexamethylcyclotrisilazane and ammonia (1987) (19)
- Reactions between CO2 and tetramethylammonium hydroxide in cleaning solutions (2003) (18)
- Detection of dry etching product species with in situ Fourier transform infrared spectroscopy (1989) (18)
- Anode wire aging tests with selected gases (1990) (18)
- Surface-modified ZnSe waveguides for label-free infrared attenuated total reflection detection of DNA hybridization. (2011) (18)
- Thermal Stability of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas (2000) (18)
- Design of Superhydrophobic Paper/Cellulose Surfaces via Plasma Enhanced Etching and Deposition (2009) (18)
- Mechanistic studies of oxygen plasma etching (1988) (18)
- A mass spectrometric analysis of CF4/O2 plasmas: Effect of oxygen concentration and plasma power (1990) (18)
- “zero-undercut” semi-additive copper patterning - a breakthrough for ultrafine-line RDL lithographic structures and precision RF thinfilm passives (2015) (18)
- Photoelectrochemical properties of plasma-deposited TiO2 thin films (1984) (18)
- Plasma enhanced chemical vapor deposition of fluorinated silicon nitride using SiH4‐NH3‐NF3 mixtures (1987) (17)
- Creation of Wettability Contrast Patterns on Metallic Surfaces via Pen Drawn Masks (2017) (17)
- Magnetic field effects in the plasma-enhanced chemical vapor deposition of boron nitride (1985) (17)
- Moisture absorption studies of fluorocarbon films deposited from pentafluoroethane and octafluorocyclobutane plasmas (2002) (17)
- Surface reactions in microelectronics process technology. (2011) (16)
- Removal of Resist Materials Using Acetic Acid (2003) (16)
- Degradation of poly(methyl methacrylate) in CF4 and CF4/O2 plasmas (1983) (16)
- Aluminum etching in boron tribromide plasmas (1985) (16)
- Synthesis of Optically Active ZnS–Carbon Nanotube Nanocomposites in Supercritical Carbon Dioxide via a Single Source Diethyldithiocarbamate Precursor (2012) (16)
- Temperature Effects and Optical Emission Spectroscopy Studies of Hydrogen-Based Plasma Etching of Copper (2011) (15)
- Mechanical durability of liquid repellent coatings (2017) (15)
- Fabrication of fully enclosed paper microfluidic devices using plasma deposition and etching. (2019) (15)
- Kinetics of the Thermal Oxidation of Silicon in O 2 / N 2 Mixtures at 1200°C (1975) (14)
- Surface Cleaning and Carbonaceous Film Removal Using High Pressure, High Temperature Water, and Water/ CO 2 Mixtures (1998) (14)
- Effect of Nitrogen and Oxygen/Nitrogen Mixtures on Oxide Charges in MOS Structures (1975) (14)
- Low Temperature Cu Etching Using CH4-Based Plasmas (2013) (14)
- Radiation Damage to Thermal Silicon Dioxide Films in Radio Frequency and Microwave Downstream Photoresist Stripping Systems (1992) (14)
- Mechanistic considerations of low temperature hydrogen-based plasma etching of Cu (2011) (14)
- Optimizing geometrical design of superhydrophobic surfaces for prevention of microelectromechanical system (MEMS) stiction (2006) (14)
- Phase Behavior and Modeling of CO2/Methanol/Tetramethylammonium Bicarbonate and CO2/Methanol/Tetramethylammonium Bicarbonate/Water Mixtures at High Pressures (2004) (14)
- Mechanistic Considerations in the Plasma Deposition of Silicon Nitride Films (1990) (14)
- Deposition and characterization of zirconium tin titanate thin films as a potential high-k material for electronic devices (2004) (14)
- Constant Current N 2 O Plasma Anodization of Silicon (1997) (13)
- Flow control in fully enclosed microfluidics paper based analytical devices using plasma processes (2020) (13)
- Fabrication of amphiphobic softwood and hardwood by treatment with non-fluorinated chemicals (2016) (13)
- Fabrication of highly amphiphobic paper using pulp debonder (2016) (13)
- Chemical model for wire chamber aging in CF4/iC4H10 gases (1993) (13)
- The effect of Ar+ sputtering on the X-ray photoelectron spectra of plasma-deposited silicon nitride films (1989) (13)
- In situ FTIR diagnostics of the radio-frequency plasma decomposition of N2O (1987) (13)
- In-situ opening aligned carbon nanotube films/arrays for multichannel ballistic transport in electrical interconnect (2006) (13)
- Photoresist Removal Using Low Molecular Weight Alcohols (2000) (13)
- Controlling the properties of silver nanoparticles deposited on surfaces using supercritical carbon dioxide for surface-enhanced Raman spectroscopy (2012) (13)
- The Effect of Temperature and Flow Rate on Aluminum Etch Rates in RF Plasmas (1986) (13)
- Use of angle-resolved XPS to determine depth profiles based on Fick’s second law of diffusion: description of method and simulation study (2004) (12)
- Patterning of Cu Films by a Two-Step Plasma Etching Process at Low Temperature (2010) (12)
- Effects of ion implantation on charges in the silicon--silicon dioxide system (1977) (12)
- Ion‐bombardment‐enhanced plasma etching of tungsten with NF3/O2 (1988) (12)
- Plasma-enhanced deposition of silicon oxynitride films (1987) (12)
- A rapid growth of aligned carbon nanotube films and high-aspect-ratio arrays (2006) (12)
- Nonfluorinated Superhydrophobic Chemical Coatings on Polyester Fabric Prepared with Kinetically Controlled Hydrolyzed Methyltrimethoxysilane (2019) (12)
- Photoresist and Residue Removal Using Gas-Expanded Liquids (2006) (12)
- Electrochemical Cleaning of Post-Plasma Etch Fluorocarbon Residues Using Reductive Radical Anion Chemistry (2004) (12)
- Plasma-enhanced deposition of silicon oxynitride films (1987) (12)
- Initial Experimental Design Methodology Incorporating Expert Conjecture, Prior Data, and Engineering Models for Deposition of Iridium Nanoparticles in Supercritical Carbon Dioxide (2013) (12)
- Mechanistic Considerations in Plasma-Assisted Etching of Ag and Au Thin Films (2013) (12)
- Comparison of Nitrided HfO2 Films Deposited in O2 and N2O by Direct Liquid Injection CVD (2006) (11)
- In-situ Opening Aligned Carbon Nanotubes and Applications for Device Assembly and Field Emission (2006) (11)
- Evaluating Photoresist Dissolution, Swelling, and Removal with an In Situ Film Refractive Index and Thickness Monitor (2005) (11)
- Photoresist and Etch Residue Removal Effect of Surface Energy and Interfacial Tension (2006) (11)
- Hydrophobicity and Improved Localized Corrosion Resistance of Grain Boundary Etched Stainless Steel in Chloride-Containing Environment (2017) (11)
- Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane/Argon Plasmas (2001) (11)
- Detection of ppb ozone using a dispersive surface acoustic wave reflective delay line with integrated reference signal (2014) (10)
- A generalized model of heat effects in surface reactions. II. Application to plasma etching reactions (1992) (10)
- Comparison of low‐pressure and plasma‐enhanced chemical vapor deposited tungsten thin films (1988) (10)
- Plasma‐Enhanced Etching of Tungsten and Tungsten Silicide in Chlorine‐Containing Discharges (1987) (10)
- In Situ Monitoring of Radiation Damage to Thermal Silicon Dioxide Films Exposed to Downstream Oxygen Plasmas (1993) (10)
- A Novel Method to Prepare Superhydrophobic, Self-Cleaning and Transparent Coatings for Biomedical Applications (2007) (10)
- An x‐ray photoelectron spectroscopic analysis of plasma deposited silicon nitride films (1990) (10)
- Assembling Carbon Nanotube Bundles Using Transfer Process for Fine-Pitch Electrical Interconnect Applications (2007) (10)
- Polymer pattern formation on SiO2 surfaces using surface monolayer initiated polymerization (2001) (10)
- Investigation of silicon etching and silicon dioxide bubble formation during silicon oxidation in HCl-oxygen atmospheres (1977) (9)
- Post Plasma Etch Residue Removal Using CO2-Based Mixtures: Mechanistic Considerations (2005) (9)
- Plasma‐ and gas‐surface interactions during the chemical vapor deposition of tungsten from H2/WF6 (1988) (9)
- Superhydrophobicity and UV stability of polydimethylsiloxane/polytetrafluoroethylene (PDMS/PTFE) coatings (2006) (9)
- Characterization of plasma-enhanced CVD processes (1990) (9)
- Ion-implanted photoresist removal using water/carbon dioxide mixtures at elevated temperature and pressure (2001) (8)
- Plasma-Enhanced Etching and Deposition (1989) (8)
- Fine-pitch carbon nanotube bundles assembly using CNT transfer for electrical interconnects (2007) (8)
- Plasma Stripping, Cleaning, and Surface Conditioning (2008) (8)
- ${\rm SiO}_{2}$ Etching With Aqueous HF: Design and Development of a Laboratory-Scale Integrated Wet Etch/Dry Reactor (2011) (8)
- Growth of aligned carbon nanotube arrays for electrical interconnect (2005) (8)
- Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications (2013) (7)
- Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5‐Hexamethylcyclotrisilazane Plasmas (1988) (7)
- Photoresist and Fluorocarbon Postplasma Etch Residue Removal Using Electrochemically Generated Radical Anions (2008) (7)
- Area Selective Atomic Layer Deposition of Titanium Dioxide (2007) (7)
- Removal of Thermally Grown Silicon Dioxide Films Using Water at Elevated Temperature and Pressure (1995) (7)
- Effect of Chlorine on the Negative Bias Instability in MOS Structures (1977) (7)
- Preparation of multi-functional silicon surface structures for solar cell applications (2008) (7)
- Layers of Experiments with Adaptive Combined Design (2015) (7)
- A generalized model of heat effects in surface reactions. I. Model development (1992) (6)
- Dissolution and Swelling Behaviour of Plasma-Polymerized Polyethylene Glycol-Like Hydrogel Films for use as Drug Delivery Reservoirs (2008) (6)
- Synthesis of Cu(2)ZnSnS(4) micro- and nanoparticles via a continuous-flow supercritical carbon dioxide process. (2012) (6)
- Plasma etching of thick polynorbornene layers for electronic packaging applications (2002) (6)
- Study of plasma chemistry in wire chambers by GC/MS (1990) (6)
- Superhydrophobic silicone/PTFE films for biocompatible application in encapsulation of implantable microelectronics devices (2006) (6)
- Microscopic Models of Piezoelectric Polymers (1986) (6)
- Electrical characterization of rf glow discharges using an operating impedance bridge (1985) (6)
- E.2.III - Elevated Pressure CO 2 -Based Fluids Containing Polar Co-Solvents for Cleaning in Microelectronic Device Fabrication (2007) (5)
- In Situ Infrared Studies of Polyvinyl Chloride Films Exposed to H 2 / O 2 / Ar Downstream Microwave Plasmas (1996) (5)
- Semi-enclosed microfluidic device on glass-fiber membrane with enhanced signal quality for colorimetric analyte detection in whole blood (2021) (5)
- Dielectric science and technology (2006) (5)
- Ultrahigh molecular weight poly(methyl methacrylate) as an electron‐beam resist (1983) (5)
- Subtractive Etching of Cu with Hydrogen-Based Plasmas (2010) (5)
- A Century of Dielectric Science and Technology (2003) (5)
- Enhancement of isopropanol-based photoresist removal by the addition of aqueous alkaline solutions (2001) (5)
- Temperature and flow effects in aluminum etching using bromine‐containing plasmas (1988) (5)
- Low-temperature, fine-pitch interconnections using self-patternable metallic nanoparticles as the bonding layer (2008) (5)
- Chemical Properties of Polymer Films Formed during the Etching of Aluminum in CCl4 Plasmas (1982) (5)
- A Framework for Initial Experimental Design in the Presence of Competing Prior Knowledge (2013) (4)
- Electrical properties of plasma-deposited fluorinated silicon nitride (1988) (4)
- Study of silylation mechanisms and kinetics through variations in silylating agent and resin (1991) (4)
- Transport Considerations in the Plasma-Assisted Oxidation of Copper Films (2004) (4)
- Lowering protein fouling by rational processing of fluorine-free hydrophobic coatings (2019) (4)
- In Situ Measurement of Resist Dissolution with a Psi‐Meter (1984) (4)
- Underwater Oil Droplet Splitting on a Patterned Template. (2017) (4)
- Etching of Tungsten and Tungsten Silicide Films by Chlorine Atoms (1988) (4)
- Deposition of Titanilum Nitride Thin Films by Plasma Enhanced CVD and Reactive Sputtering (1986) (4)
- CO2-expanded liquids as alternatives to conventional solvents for resist and residue removal (2004) (4)
- Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition (2000) (4)
- Eutectic liquid in Sol-Gel process for superhydrophobic silica thin films — antistiction of MEMS devices (2007) (4)
- Dry Etching Processes (1989) (4)
- KINETICS OF THE THERMAL OXIDATION OF SILICON IN O2/N2 MIXTURES AT 1200 C (1975) (3)
- Ordering and Grain Growth Kinetics in CoPt Thin Films (1995) (3)
- Summary Abstract: The reaction of atomic and molecular chlorine with aluminum (1986) (3)
- A 29Si-NMR Investigation of Amorphous Hydrogenated Silicon Nitride (1986) (3)
- Effect of Growth Morphology on the Electronic Structure of Epitaxial Graphene on SiC (2013) (3)
- Hierarchically Etched Silicon Lotus Effect Surface Structures for Reduced Light Reflection (2008) (3)
- Electron cyclotron resonance etching of silylated resist (1992) (3)
- Etching of Ag and Au films in CH4-based plasmas at low temperature (2015) (3)
- Plasma Processing for Silicon-Based Integrated Circuits (1999) (3)
- Dissolution And Swelling Studies Of Poly(Methyl Methacrylate) Resist Films (1987) (3)
- KINETICS OF THE THERMAL OXIDATION OF SILICON IN OXYGEN-HYDROGEN CHLORIDE MIXTURES (1977) (3)
- Looking Back, Charging Ahead (2009) (3)
- Plasma-Assisted Etching of Aluminum and Aluminum Alloys (1984) (3)
- Photoresist Removal Using Alternative Chemistries and Pressures (2009) (2)
- Effects Of Freons On Wire Chamber Aging (1990) (2)
- Quantum Dots in Semiconductor Optoelectronic Devices (2006) (2)
- Area selective atomic layer deposition: use of lithographically defined polymer masking layers for the deposition of titanium dioxide (2005) (2)
- A novel top surface imaging approach utilizing direct-area selective atomic layer deposition of hardmasks (2007) (2)
- Effect of Ionic Conductivity of Elevated Pressure TMAHCO3 /MeOH/CO2 Mixtures on Cleaning Efficiency (2005) (2)
- Through-plane uniformity of optical anisotropy in spin-coated biphenyl dianhydride-p-phenylenediamine films (2005) (2)
- Ionic Conductivity of Elevated Pressure TMAHCO 3 / MeOH / CO 2 Mixtures (2005) (2)
- Refractive index measurements of films with biaxial symmetry. 2. Determination of film thickness and refractive indices using polarized transmission spectra in the transparent wavelength range. (2005) (2)
- Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium (2000) (2)
- Oxygen Reactive Ion Etching For Multilevel Lithography (1987) (2)
- Deposition Chemistry and Structure of Amorphous Fluorinated Silicon Nitride (1988) (2)
- Phase separation in plasma-deposited polysiloxane films (1981) (2)
- The GT Materials Research Science and Engineering Center (MRSEC) on New Electronic Materials: Research, Education and Outreach (2010) (2)
- Coprecursor approach to the fabrication of superhydrophobic durable self-cleaning films (2005) (2)
- Helical Resonator Plasma Oxidation of Amorphous and Polycrystalline Silicon for Flat Panel Displays (1996) (2)
- Plasma-Enhanced Chemical Vapor Deposition of Beta-Tungsten, a Metastable Phase, (1984) (2)
- Optimization of carbon dioxide-assisted nanoparticle deposition process with uncertain design space (2012) (2)
- Ultrahigh vacuum surface analysis coupled with a high pressure system for the study of near critical and supercritical fluid processing (1997) (2)
- Design of a Novel Wet-Etch Reactor and Etch Chemistries: Simulations and Experimental Verification (2010) (2)
- Formulation of Selective Etch Chemistries for Silicon Dioxide–Based Films (2010) (2)
- Sorption and desorption behaviors of hexadecane vapors in plasma deposited fluorocarbon films using a quartz crystal microbalance (2006) (1)
- Novel Approaches to Nanopatterning: From Surface Monolayer Initiated Polymerization to Hybrid Organometallic-Organic Bilayers (2001) (1)
- Super-hydrophobic paper influence on bacterial attachment suggests potential application as packaging material (2013) (1)
- Preface to the Focus Issue on Atomic Layer Etch and Clean (2015) (1)
- Effect of oxidant on downstream microwave plasma enhanced CVD of hafnium oxynitride films (2006) (1)
- (Henry B. Linford Award for Distinguished Teaching Address) Low Temperature Plasma Etching of Copper, Silver, and Gold Films (2014) (1)
- Editorial - Chemistry of Materials - The "Reaction" Continues (1994) (1)
- Editorial - Chemistry of Materials - The Honeymoon is Just Beginning (1991) (1)
- Retraction of “Initial Experimental Design Methodology Incorporating Expert Conjecture, Prior Data, and Engineering Models for Deposition of Iridium Nanoparticles in Supercritical Carbon Dioxide” (2020) (1)
- Subtractive Etching of Cu at Low Temperature in Hydrogen-Based Plasmas (2012) (1)
- Assembly of Fine-Pitch Carbon Nanotube Bundles for Electrical Interconnect Applications (2007) (1)
- Novel surface imaging method using surface monolayer initiated polymerization (2002) (1)
- MOS electrode size effects (1976) (1)
- Preparation of Superhydrophobic Silica Thin Films for Antistiction of MEMS Devices Using a Novel Sol-Gel Process (2007) (1)
- Effects of oxidation and nitrogen annealing on ion‐implantation‐induced interface states in the silicon–silicon dioxide system (1977) (1)
- Capacitance‐Voltage Technique for the Determination of Carrier Concentrations in Thin Film Photoanodes (1984) (1)
- Sol-Gel Process Derived Superhydrophobic Silica Thin Films for Antistiction of MEMS Devices (2007) (1)
- Retraction Note: Controlling the properties of silver nanoparticles deposited on surfaces using supercritical carbon dioxide for surface-enhanced Raman spectroscopy (2021) (1)
- Functionalization of high frequency SAW RFID devices for ozone dosimetry (2009) (1)
- Deposition and Etching of Amorphous Carbon Films Prepared by ECR-Plasma-Enhanced Benzene Chemical Vapor Deposition (1998) (1)
- Liquid Repellence of Phobic Fiber Networks. (2022) (1)
- Modification of Paper/Cellulose Surfaces to Control Liquid Wetting and Adhesion (2015) (1)
- Compatibility of high pressure cleaning mixtures with a porous low dielectric constant film: A positronium annihilation lifetime spectroscopic study (2005) (1)
- Low Temperature Plasma Etching of Copper for Minimizing Size Effects in sub-100 nm Features (2006) (1)
- Structural and Interfacial Characteristics of thin (l10 nm) SiO 2 Films Grown by Electron Cyclotron Resonance Plasma Oxidation on [100] Si Substrates (1991) (1)
- Superhydrophobic Silica Thin Films Prepare by Sol-Gel Process for Antistiction of MEMS Devices (2007) (1)
- Cellulose-Based Materials: Plasma Modification (2016) (0)
- KINETICS OF THE THERMAL OXIDATION OF SILICON IN OXYGEN WATER AND OXYGEN CHLORINE MIXTURES (1978) (0)
- Refractive index measurements of films with biaxial symmetry. 1. Determination of complex refractive indices using polarized reflectance/transmittance ratio. (2005) (0)
- Chemical modeling of aging processes in CF4/isobutane gases (1991) (0)
- MOLECULAR WEIGHT EFFECTS OF POLY ( BENZOTHIADIAZOLE-SEXITHIOPHENE ) POLYMERIC SEMICONDUCTOR ON CHARGE CARRIER PROPERTIES (2013) (0)
- Retraction of “Optimization of a Carbon Dioxide-Assisted Nanoparticle Deposition Process Using Sequential Experimental Design with Adaptive Design Space” (2020) (0)
- Partial pressure analysis of CF/sub 4//O/sub 2/ plasmas (1989) (0)
- Rewet suppression through press felt engineering (2022) (0)
- Publishing Luminescence and Display Materials Content in ECS Journals: Past, Present, and Future (2013) (0)
- The Si-SiO2 Interface: Current Understanding of Chemical and Electronic Defects (1981) (0)
- Well-Aligned Carbon Nanotubes for Device and Assembly Applications (2006) (0)
- Plasma-Enhanced Chemical Vapor Deposition of Transition Metals and Transition Metal Silicides* *Portions of this article are adapted from Solid State Technology26 (3), p. 125 (1983). Reprinted with permission from Solid State Technology, Technical Publishing, a company of Dun and Bradstreet. (1984) (0)
- Continuation of Research in the Development of High Sensitivity X-Ray and Electron Beam Resists Processes. (1987) (0)
- Impact of phase behavior on photoresist removal using CO2based mixtures (2004) (0)
- Plasma Deposited Silicon Nitride Film Chemistry (1989) (0)
- Proceedings of the Tutorial Symposium on Semiconductor Technology (1982) (0)
- Photoelectron Spectroscopy Studies of Plasma-Treated Graphene (2012) (0)
- Barrier films on paper and cellulose using fluorocarbon plasmas (2003) (0)
- ENERGY TRANSFER ENHANCEMENT OF PHOTON UPCONVERSION SYSTEMS FOR SOLAR ENERGY HARVESTING (2012) (0)
- Plasma-Generated Nanostructured Paper for Control of Fluid Interactions (2013) (0)
- Central and forward tracking collaboration. Progress report for FY 1991 (1991) (0)
- Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas. (1989) (0)
- Patterning of Superhydrophobic Paper Surfaces to Control the Mobility and Transport of Liquid Drops for Microfluidic Applications (2009) (0)
- A Chemical Model for Wire Chamber Aging in CF{sub 4}/iC{sub 4}H{sub 10} Gases (1992) (0)
- Electrical Properties and Temperature-Humidity Studies of Fluorocarbon Films Deposited from Pentafluoroethane Õ Argon Plasmas (2001) (0)
- Superhydrophobic Silicon Surfaces with Low Light Reflectivity (2009) (0)
- Plasma-Enhanced Chemical Vapor Deposition of Metal and Metal Silicide Films (1984) (0)
- Plasma‐Enhanced Etching of Tungsten and Tungsten Silicide in Chlorine‐Containing Discharges. (1987) (0)
- Effects Of Ion Bombardment In Oxygen Plasma Etching (1988) (0)
- Thermal Oxidation of Silicon. (1990) (0)
- Partial Pressure Analysis of CF4/O2 Plasmas (1990) (0)
- Retraction: Synthesis of Cu 2 ZnSnS 4 Micro‐ and Nanoparticles via a Continuous‐Flow Supercritical Carbon Dioxide Process (2020) (0)
- Fabrication of amphiphobic softwood and hardwood by treatment with non-fluorinated chemicals (2016) (0)
- Retraction of “Synthesis of Optically Active ZnS–Carbon Nanotube Nanocomposites in Supercritical Carbon Dioxide via a Single Source Diethyldithiocarbamate Precursor” (2020) (0)
- Structural and interfacial characteristics of thin ( (2008) (0)
- Materials Processing 2 (2018) (0)
- Plasma-Enhanced Deposition and Processing of Transition Metal Silicides. (1983) (0)
- Analysis of potential component cleaning techniques. Final report, July 6, 1992--July 5, 1995 (1997) (0)
- Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A. (1990) (0)
- Electronic field effect tuning of the electronic properties of fluorinated epitaxial graphene (2017) (0)
- Chemical Vapor Deposition of Dielectric and Metal Films (1992) (0)
- (Gordon E. Moore Medal for Outstanding Achievement in Solid State Science and Technology Award Address) Towards Silicon-Based Photonic Integrated Circuits: The Quest for Compatible Light Sources (2017) (0)
- Plasma-Enhanced Deposition and Processing of Transition Metals and Transition Metal Silicides for VLSI. (1986) (0)
- Comment on “Enhancing the Ambient-Enduring Performance of Pentacene Thin-Film Transistors by SnO2-Encapsulation” [ Electrochem. Solid-State Lett. , 8 , G341 (2005) ] (2006) (0)
- Silicon Oxidation During Bilayer Resist Etching (1989) (0)
- MOLECULAR WEIGHT EFFECTS OF POLY ( BENZOTHIADIAZOLE-SEXITHIOPHENE ) POLYMERIC SEMICONDUCTOR ON CHARGE CARRIER PROPERTIES (2013) (0)
- Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A. (1986) (0)
- JSS FOCUS ISSUE ON ADVANCED INTERCONNECTS :M ATERIALS ,P ROCESSING, AND RELIABILITY Chemical Etching and Patterning of Copper, Silver, and Gold Films at Low Temperatures (2015) (0)
- CHEMICAL VAPOR DEPOSITION OF ZIRCONIUM TIN TITANATE : A DIELECTRIC MATERIAL FOR POTENTIAL MICROELECTRONIC APPLICATIONS (2002) (0)
- Contemporary instrumentation for antenna measurements (1977) (0)
- Polysilicon TFTs for AMLCD applications with gate oxides grown in a low-temperature N2O plasma (1997) (0)
- Dependence of Photoresist and Etch Residue Removal on CO2 Pressure in Alcohol-Based Gas-Expanded Liquids (2006) (0)
- Kinetics of Photoresist Etching (1990) (0)
- Reactive Ion Etching of Silicon Containing Resists (1990) (0)
- (Invited) Surface Modification to Control Wetting and Adhesion of Aqueous Solutions (2022) (0)
- Development and characterization of an ultrathin rapid thermal silicon nitride for IC sensor applications (1992) (0)
- Assembling CarbonNanotube Films asThermalInterface Materials (2015) (0)
- Hydrogen Plasma-Based Etching of Copper (2012) (0)
- Plasma Processing of Thin Films [Part I and II] (2014) (0)
- Erratum: “Reaction of 1,1,1,5,5,5‐Hexafluoro‐2,4‐pentanedione (H+hfac) with CuO , Cu2 O , and Cu Films” [J. Electrochem. Soc., 142, 961 (1995)] (1995) (0)
- Plasma Nanoscience and Nanotechnology 3 (2018) (0)
- Ion Current, Energy Distribution, and Radical Species Detection in RF Plasmas by Cylindrical Mirror Analyzer Quadrupole Mass Spectroscopy (1988) (0)
- hyperpnea challenge in the rat Strain dependence of the airway response to dry-gas (2015) (0)
- Controlled Growth of Well-Aligned Carbon Nanotubes and Their Assembly (2006) (0)
- Plasma and Thermal Processes for Materials Modification, Synthesis and Processing 2 (2016) (0)
- Erratum: Aluminum etching in boron tribromide plasmas [J. Vac. Sci. Technol. A 3, 962 (1985)] (1986) (0)
- PLASMA-ENHANCED DEPOSITION AND PROCESSING OF TRANSITION METALS AND TRANSITION METAL turn SILICIDES FOR VLSI 2 V (0)
- IMPACT OF PROCESS PARAMETER MODIFICATION ON POLY ( 3-HEXYLTHIOPHENE ) FILM MORPHOLOGY AND CHARGE TRANSPORT (2013) (0)
- Inhibitition of wire aging using CF/sub 4/-based gases (1990) (0)
- Thin Film Processing with Ecr and Downstream Oxygen Plasmas (1991) (0)
- Evaluation of an In-Situ Particle Monitoring System on an MxP Plasma Etch Tool (2000) (0)
- Edward Goodrich Acheson Award Presentation) Plasmas for Thin Film Processing and Surface Modification (2012) (0)
- A novel two-step strategy to construct multifunctional superhydrophobic wood by liquid-vapor phase deposition of methyltrimethoxysilane for improving moisture resistance, anti-corrosion and mechanical strength (2023) (0)
- Patterning via surface monolayer initiated polymerization: A study of surface initiator photoreaction kinetics (2004) (0)
- Development of High Sensitivity X-Ray and Electron Beam Resist Processes. (1985) (0)
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What Schools Are Affiliated With Dennis W. Hess?
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