Eberhard Adolf Spiller

Eberhard Adolf Spiller's AcademicInfluence.com Rankings

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Physics

Eberhard Adolf Spiller's Degrees

PhD Physics University of California, Berkeley
Masters Physics University of California, Berkeley
Bachelors Physics University of California, Berkeley

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Eberhard Adolf Spiller's Published Works

Number of citations in a given year to any of this author's works

Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author

Published Works

Femtosecond diffractive imaging with a soft-X-ray free-electron laser (2006) (915)
Soft-x-ray optics (1994) (400)
Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) (2012) (349)
Coherence and Fluctuations in Light Beams (1964) (318)
Femtosecond time-delay X-ray holography (2007) (227)
Single particle X-ray diffractive imaging. (2007) (221)
Improved reflectance and stability of Mo-Si multilayers (2002) (185)
Transmission microscropy of unmodified biological materials: comparative radiation dosages with electrons and ultrasoft x-ray photons. (1977) (182)
Sub-arcsecond observations of the solar X-ray corona (1990) (154)
X-Ray Optics (1949) (146)
Improved reflectance and stability of Mo/Si multilayers (2001) (143)
Multilayer x‐ray mirrors: Interfacial roughness, scattering, and image quality (1993) (123)
Reflective multilayer coatings for the far uv region. (1976) (120)
Multilayer reflective coatings for extreme-ultraviolet lithography (1998) (114)
Potential operating region for ultrasoft x-ray microscopy of biological materials. (1977) (110)
Propagation of x rays in waveguides (1974) (107)
Controlled fabrication of multilayer soft‐x‐ray mirrors (1980) (106)
Low-Loss Reflection Coatings Using Absorbing Materials (1972) (102)
Determination Of Thickness Errors And Boundary Roughness From The Measured Performance Of A Multilayer Coating (1985) (102)
Smooth multilayer films suitable for x‐ray mirrors (1979) (95)
High-resolution soft x-ray microscopy. (1977) (91)
Characterization of multilayer coatings by X-ray reflection (1988) (78)
Stability of multilayers for synchrotron optics (1986) (73)
Localized defects in multilayer coatings (2004) (69)
Subnanometer-scale measurements of the interaction of ultrafast soft x-ray free-electron-laser pulses with matter. (2006) (68)
Enhancement Of The Reflectivity Of Multilayer X-Ray Mirrors By Ion Polishing (1989) (64)
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists (1979) (60)
X-ray microscopy of biological objects with carbon kappa and with synchrotron radiation. (1976) (59)
High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition. (2003) (58)
Application of synchrotron radiation to x‐ray lithography (1976) (54)
Smoothing of multilayer x‐ray mirrors by ion polishing (1989) (54)
System integration and performance of the EUV engineering test stand (2001) (51)
Replication of 0.1‐μm geometries with x‐ray lithography (1975) (48)
Saturable Optical Resonator (1972) (46)
First lithographic results from the extreme ultraviolet Engineering Test Stand (2001) (42)
Advances in multilayer reflective coatings for extreme ultraviolet lithography (1999) (42)
EUV scattering and flare of 10X projection cameras (1999) (41)
Specimen replication for electron microscopy using x rays and x‐ray resist (1976) (41)
Totally reflecting thin-film phase retarders. (1984) (40)
Development and testing of EUV multilayer coatings for the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory (2005) (40)
Design And Assembly Of A High Resolution Schwarzschild Microscope For Soft X Rays (1982) (39)
Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography. (2007) (36)
Graded-index AR surfaces produced by ion implantation on plastic materials. (1980) (34)
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic (2002) (33)
Camera for coherent diffractive imaging and holography with a soft-x-ray free-electron laser. (2007) (33)
Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution (2001) (33)
Multisegmented, multilayer-coated mirrors for the Solar Ultraviolet Imager (2013) (33)
An ion-assisted Mo-Si deposition process for planarizing reticle substrates for extreme ultraviolet lithography (2001) (31)
Imaging performance of a normal incidence soft x‐ray telescope (1982) (31)
CHARACTERIZATION OF MULTILAYERS BY FOURIER ANALYSIS OF X-RAY REFLECTIVITY (1997) (30)
Early history of X-ray lithography at IBM (1993) (29)
Experience With The In Situ Monitor System For The Fabrication Of X-Ray Mirrors (1985) (28)
Developing a viable multilayer coating process for extreme ultraviolet lithography reticles (2004) (28)
Smoothing of mirror substrates by thin-film deposition (1999) (27)
Fabrication of high-efficiency multilayer-coated gratings for the EUV regime using e-beam patterned substrates (2004) (26)
Fabrication and testing of large area multilayer coated x-ray optics. (1989) (26)
Initial results from the EUV engineering test stand (2001) (25)
Strongly coupled ferromagnetic resonances of Fe films (1987) (25)
Intensity Fluctuations in Light Beams with Several Degrees of Freedom (1966) (25)
High resolution microchemical analysis using soft X-ray lithographic techniques (1979) (25)
Filters For Soft X-Ray Solar Telescopes (1989) (25)
THE FABRICATION OF MULTILAYER X‐RAY MIRRORS (1980) (24)
Multilayer Interference Coatings for the Vacuum Ultraviolet (1974) (24)
High transmission x-ray masks for lithographic applications (1975) (24)
A Scanning Soft X-Ray Microscope Using Normal Incidence Mirrors (1984) (24)
Sub-100-nm lithographic imaging with an EUV 10X microstepper (1999) (24)
EUVL mask with Ru ML capping (2003) (24)
Imaging performance of multilayer x-ray mirrors (1992) (24)
Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks (2007) (21)
Phase-Slip and Localization Diffusion Lengths in Amorphous W-Re Alloys (1980) (20)
Construction Of A Multilayered X-Ray Telescope For Solar Coronal Studies From Space (1985) (19)
X-ray tests of multilayer coated optics. (1984) (19)
Normal incidence soft x-ray telescopes (1991) (19)
In-band and out-of-band reflectance calibrations of the EUV multilayer mirrors of the atmospheric imaging assembly instrument aboard the Solar Dynamics Observatory (2012) (18)
A silicon-based, sequential coat-and-etch process to fabricate nearly perfect substrate surfaces. (2005) (18)
Refractive index of amorphous carbon near its K-edge. (1990) (18)
Interference filters for the ultraviolet and the surface plasmon of aluminum. (1974) (17)
Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5 (2013) (17)
Sub-micron focusing of soft x-ray free electron laser beam (2009) (17)
Smoothing of diamond-turned substrates for extreme ultraviolet illuminators (2004) (16)
Fluctuation Measurements in Mixed Light Fields (1966) (16)
Progress in the fabrication of low-defect density mask blanks for extreme ultraviolet lithography (2006) (16)
Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system. (2002) (16)
Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks (2007) (16)
High-performance multilayer coatings for EUV lithography (2004) (13)
Flares Observed by the Normal Incidence X-Ray Telescope on 1989 September 11 (1991) (13)
Multilayer Optics for X-Rays (1988) (13)
Static microfield printing at the Advanced Light Source with the ETS Set-2 optic (2002) (13)
Aerial Image Microscope for the inspection of defects in EUV masks (2002) (13)
The optics of long-wavelength X rays. (1978) (12)
Advancing the ion beam thin film planarization process for the smoothing of substrate particles (2005) (12)
MULTILAYER X-RAY MIRRORS, A FIRST STEP TOWARDS THE CUSTOM DESIGN OF NEW MATERIAL PROPERTIES (1985) (12)
Phase conventions in thin film optics and ellipsometry. (1984) (12)
Experimental investigations on gain and maximum output of the He-Ne laser (1965) (12)
Multilayer coating requirements for extreme ultraviolet lithography masks (2002) (12)
Projection optics for EUVL micro-field exposure tools with 0.5 NA (2014) (12)
Overcoming substrate defect decoration effects in EUVL mask blank development (2004) (11)
Ferromagnetic resonance of uncoupled and coupled ultra-thin films of Fe (1986) (11)
Fabrication Of Free-Standing X-Ray Transmission Gratings And Zone Plates (1984) (11)
Imaging performance and tests of soft x-ray telescopes (1991) (11)
Low pass filter for soft x‐ray monochromators (1990) (11)
Multilayers for next-generation x-ray sources (2007) (10)
Ru-capped EUVL ML mask blank performance (2004) (10)
Recent developments towards high resolution X-ray imaging (1980) (10)
Evaporated Multilayer Dispersion Elements for Soft X‐Rays (2008) (10)
Multilayer x-ray mirrors for the objective crystal spectrometer on the Spectrum Roentgen Gamma satellite (1995) (10)
Large area coatings with uniform thickness fabricated in a small vacuum chamber. (1989) (9)
ASSESSMENT OF THE POTENTIAL OF ULTRASOFT X‐RAY MICROSCOPY (1978) (9)
The first use of transmission gratings for measurements of optical constants in the soft X-ray range (1982) (9)
Defect mitigation and reduction in EUVL mask blanks (2007) (9)
Progress towards the development of a commercial tool and process for EUVL mask blanks (2005) (9)
Multilayer coating of 10X projection optics for extreme ultraviolet lithography (1999) (9)
Results from the recent flights of the IBM/SAO x-ray telescopes (1994) (8)
Aperiodic Mo/Si multilayers for hard x-rays. (2016) (8)
Multilayer coated optics for an alpha-class extreme ultraviolet lithography system (1999) (8)
Ultra-high accuracy optical testing: creating diffraction-limited short-wavelength optical systems (2005) (7)
Femtosecond Diﬀractive Imaging with a Soft-X-ray Free-Electron Laser (2008) (7)
Microroughness measurements and EUV calibration of the solar ultraviolet imager multilayer-coated mirrors (2012) (7)
Multilayer coating and test of the optics for two new 10× Microstepper extreme-ultraviolet lithography cameras (2001) (7)
High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography (2000) (7)
Static EUV micro-exposures using the ETS Set-2 optics (2003) (6)
Ion beam deposition for defect-free EUVL mask blanks (2008) (6)
Imaging Performance Of A Normal Incidence X-Ray Telescope Measured At 0.18 keV (1982) (6)
Recent Advances in Multilayer Reflective Optics for EUV/X-Ray Sources (2016) (6)
Current status of next-generation EUVL mask blank tool development (2003) (6)
Lithography and microscopy with X-rays (1977) (6)
Multilayer coating and tests of a 10x extreme-ultraviolet lithographic camera (1998) (6)
Derivation of the optical constants of gold from transmission diffraction measurements in the 280-640-eV range (1984) (5)
Soft x-ray optics 1971-1981: a personal history (1992) (5)
Broadening of short light pulses by many reflections from multilayer dielectric coatings. (1971) (5)
Smoothing of diamond-turned substrates for extreme-ultraviolet lithography illuminators (2004) (5)
The coronal structure above sunspots and pores (1993) (5)
Evaluation of alternative capping layers for EUVL mask ML blank (2005) (5)
Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects (2003) (5)
X-ray optics and diagnostics for first experiments on the Linac Coherent Light Source (LCLS) (2001) (5)
X-ray Lithography (1977) (4)
X‐Ray Lithography and X‐Ray Microscopy (1976) (4)
Two Normal Incidence Collimators Designed For The Calibration Of The Extreme Ultraviolet Explorer (1988) (4)
Studies toward the optimization of ion polishing for multilayer x-ray mirrors (1994) (4)
Fabrication and performance of nanoscale ultrasmooth programed defects for extreme ultraviolet lithography (2008) (4)
ULTRAFAST COHERENT DIFFRACTION IMAGING WITH X-RAY FREE- ELECTRON LASERS* (2006) (3)
Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma (2003) (3)
14. Reflecting Optics: Multilayers (1998) (3)
Erratum: ‘‘Imaging performance of multilayer x‐ray mirrors’’ [Appl. Phys. Lett. 61, 1481 (1992)] (1992) (3)
Coherence effects from visible light to X-rays (1994) (3)
Interference in Thin Films: Theory (1994) (3)
Design and Evaluation of System Configurations for an EUV Mask Inspection Microscope (2002) (3)
Improved holographic correlation measurements by use of an additional spatial filter (1968) (3)
Post-polish figuring of optical surfaces using multilayer deposition (1996) (3)
Normal incidence soft x-ray λ=63.5 Å telescope of 1991 (1992) (3)
SOFT X-RAYS FOR BIOLOGICAL AND INDUSTRIAL PATTERN REPLICATIONS (1978) (3)
Performance Of Multilayer Dispersion Elements From 80 To 500 eV (1984) (3)
X-ray Microholography, Exciting Possibility or Impossible Dream? (1987) (3)
Spectral characteristics of multilayer cobalt—carbon mirrors for the λ ≈7.5 nm range (1997) (2)
Multilayer x-ray optics (1990) (2)
Employing a detailed compositional analysis to develop a low defect Mo/Si deposition tool and process for EUVL mask blanks (2006) (2)
Recent progress in the fabrication of low defect density mask blanks (2005) (2)
Projection optics for EUVL micro-field exposure tools with a numerical aperture of 0.5 (2013) (2)
Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography (2007) (2)
Substrate smoothing for high-temperature condenser operation in EUVL source environments (2005) (2)
Windows and Filters (1994) (2)
Multilayer Mirrors as X-ray Filters for Slit Scan Radiography (1985) (2)
Design of Multilayer Structures (1994) (2)
Mirrors for the Extreme Ultraviolet (2008) (1)
A Double Crystal Multilayer X-Ray Monochromator (1989) (1)
Test of Multilayer Structures (1994) (1)
Multilayer deposition and EUV reflectance characterization of 131 ? flight mirrors for AIA at LLNL (2006) (1)
Performance of Transition Metal--Carbon Multilayer Mirrors From 80 To 350eV (1984) (1)
Objective Crystal Spectrometer (OXS) on the Spectrum-X-y satellite: crystal calibrations (1997) (1)
Computation and error analysis of the optical constants of gold in the 280 to 640 eV range from transmission diffraction data (1983) (1)
Hard and soft x-ray study of the correlation between substrate quality and multilayer performance for Co/C coating produced by electron beam evaporation using ion polishing (1995) (1)
Improved Reflectance and Stability of Mo / Si Mu It i layers (1)
Growth and Printability of Multilayer Phase Defects on EUV MaskBlanks (2007) (1)
Smoothing EUVL mask substrate defects with an emphasis on real-world pits (2006) (1)
Diffraction-limited large X-ray optics (1994) (1)
Normal incidence optics for solar coronal imaging (1995) (1)
14 – REFLECTING OPTICS: MULTILAYERS (2000) (1)
Lithographic characterization of the printability of programmed EUV substrate defects (2002) (1)
High resolution soft X-ray optics. Conference held at Brookhaven, N.Y., USA, 18 - 20 November 1981. (1981) (1)
Multilayer Mirrors For X-Ray Lithography (1993) (1)
Multilayer coatings of 10x projection for extreme-ultraviolet lithography (1999) (1)
Obtaining high resolution XUV coronal images (1992) (1)
Applications of Soft X-Ray Optics (1994) (1)
Stability of Multilayers for Short-Wavelength Optics* (1986) (0)
Physical Optics of X-Ray Multilayer Structures (1992) (0)
Image Quality and Scattering by Multilayer X-Ray Mirrors and its Implication for the Fabrication of Diffraction Limited Large X-Ray Optics (1992) (0)
New EUVL ML capping design for ML blank multiple reuses (2005) (0)
X-Ray Lithography and Microscopy (1979) (0)
Summary Abstract: Multilayer thin films for x‐ray optics (1988) (0)
Imaging Systems for X Rays (1994) (0)
A method of manufacturing a mask (1976) (0)
High resolution lenses for optical waveguides. (1974) (0)
X-Ray Lithography (With 32 Figures) (1977) (0)
X-Rays: Optical Elements (2015) (0)
Diffraction-limited large x-ray optics. (1994) (0)
High Quality Fraunhofer Diffraction Spectra Taken at SSRL in the Soft X‐Ray Range (2008) (0)
Limits and applications of imaging with soft x rays (A) (1979) (0)
LOW-COST METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY OPTICS (2017) (0)
Characterization of ion polished multilayer mirrors (1989) (0)
Information Capacity of a Radiation Field (1994) (0)
Aperiodic x-ray multilayer interference coatings with high reflectance and large field of view (2018) (0)
Results from flights of x-ray multilayer telescopes (1991) (0)
EUV/X-ray multilayer optics: Meeting the challenges of next-generation applications (2016) (0)
Reflection from a Single Boundary (1994) (0)
Femtosecond pump-probe coherent X-ray diffraction imaging of ultra-fast processes (2007) (0)
Thin Film Quarter Wave Retarders (1984) (0)
Ion beam deposition for defect-free EUVL mask blanks (2009) (0)
Optical waveguide lens (1974) (0)
Recent advances in x-ray optics (2005) (0)
Method of manufacturing a high quality mask (1976) (0)
Fabrication and performance of nanoscale ultra-smooth programmed defects for EUV Lithography (2005) (0)
National Laboratory Title Ultra-high accuracy optical testing : creating diffraction-limited short-wavelength optical systems Permalink (2005) (0)
Characterization of multilayer reflective coatings for extreme ultraviolet lithography (1999) (0)
Radiographic Imaging at Medium Energies Using Multilayer Mirrors (1986) (0)
High resolution soft X-ray optics : November 18-20, 1981, Brookhaven, New York (1982) (0)
Procédé de réduction de la réflection optique de surfaces (1980) (0)
Femtosecond dynamic diffraction imaging with free electron lasers: X-ray snapshots of ultra-fast nanoscale phenomena (2009) (0)
X-ray microscopy of biological objects with carbon Kalpha and with synchrotron radiation (A) (1976) (0)
Extreme ultraviolet coatings for the next generation lithography (2001) (0)
Initial Calibration of the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory (SDO) (2011) (0)
How Coronal Loops Brighten: Observational Results from the Normal Incidence X-Ray Telescope Sounding Rocket Experiment (1992) (0)
Scattering from multilayer x-ray mirrors (1991) (0)
Final Report for Lith 112 High-NA Optics for the Micro-Exposure Tool (MET) (2001) (0)
Advanced Multilayer Coatings for National Security (2019) (0)
EUV reflectance characterization of the 94/304 ? flight secondary AIA mirror at beamline 6.3.2 of the Advanced Light Source (2006) (0)
Results from Flights of an X-ray Multilayer Telescope (1991) (0)

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What Schools Are Affiliated With Eberhard Adolf Spiller?

Eberhard Adolf Spiller is affiliated with the following schools:

Uppsala University