Harold Franklin Winters
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Harold Franklin Winterschemistry Degrees
Chemistry
#4575
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#5659
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Physical Chemistry
#700
World Rank
#755
Historical Rank
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Chemistry
Harold Franklin Winters's Degrees
- PhD Chemistry University of California, Berkeley
- Bachelors Chemistry University of California, Berkeley
Why Is Harold Franklin Winters Influential?
(Suggest an Edit or Addition)Harold Franklin Winters's Published Works
Number of citations in a given year to any of this author's works
Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching (1979) (634)
- Plasma etching—A discussion of mechanisms (1979) (450)
- Surface Science Aspects of Etching Reactions (1992) (373)
- Sputtering of chemisorbed gas (nitrogen on tungsten) by low‐energy ions (1974) (285)
- The etching of silicon with XeF2 vapor (1979) (271)
- Surface processes in plasma-assisted etching environments (1983) (215)
- GAS INCORPORATION INTO SPUTTERED FILMS. (1967) (203)
- Ionic Adsorption and Dissociation Cross Section for Nitrogen (1966) (195)
- Chemical sputtering of fluorinated silicon (1981) (190)
- Ion‐surface interactions in plasma etching (1977) (172)
- Conductance considerations in the reactive ion etching of high aspect ratio features (1989) (160)
- Dissociation of methane by electron impact (1975) (142)
- The role of chemisorption in plasma etching (1978) (117)
- Total dissociation cross section of CF/sub 4/ and other fluoroalkanes for electron impact (1982) (113)
- Gaseous products from the reaction of XeF2 with silicon (1983) (111)
- The kinetic isotope effect in the dissociative chemisorption of methane (1976) (94)
- The activated, dissociative chemisorption of methane on tungsten (1975) (92)
- Plasma‐assisted etching mechanisms: The implications of reaction probability and halogen coverage (1985) (91)
- Plasma etching A ’’pseudo‐black‐box’’ approach (1977) (91)
- Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb (1985) (87)
- The interaction of Sb4 molecular beams with Si(100) surfaces: modulated-beam mass spectrometry and thermally stimulated desorption studies (1986) (83)
- Etching reactions for silicon with F atoms: Product distributions and ion enhancement mechanisms (1991) (67)
- Influence of the altered layer on depth profiling measurements (1976) (62)
- Plasma-Assisted Etching in Microfabrication (1983) (60)
- The chemisorption of nitrogen at activated sites on a polycrystalline tungsten surface (1971) (57)
- The etching of Cu(100) with Cl2 (1985) (56)
- Plasma etching - a discussion of mechanisms (1981) (55)
- Influence of Surface Absorption Characteristics on Reactively Sputtered Films Grown in the Biased and Unbiased Modes (1972) (52)
- Effect of Oxygen on the rf-Sputtering Rate of SiO2 (1968) (51)
- Proposed Model for the Composition of Sputtered Multicomponent Thin Films (1969) (50)
- Dissociation of methane and ethane on Pt(110): Evidence for a direct mechanism under thermal conditions (1994) (50)
- The etching of W(111) with XeF2 (1985) (44)
- Interaction of hydrogen, methane, ethylene, and cyclopentane with hot tungsten: Implications for the growth of diamond films (1994) (42)
- Etch products from the reaction of XeF2 with SiO2, Si3N4, SiC, and Si in the presence of ion bombardment (1983) (40)
- Influence of energy reflected from the target on thin film characteristics (1993) (39)
- Dissociation of ethane by electron impact (1979) (38)
- Electron‐beam effects in depth profiling measurements with Auger electron spectroscopy (1975) (37)
- An XPS and Auger investigation of CF+3 ion bombardment of silicon (1979) (35)
- Adsorption of Gases Activated by Electron Impact (1964) (33)
- Some fruits and nuts for the tropics. (1960) (32)
- Excitation of Molecular Nitrogen by Electron Impact (1965) (30)
- Penetration of fluorine into the silicon lattice during exposure to F atoms, F2, and XeF2: Implications for spontaneous etching reactions (2007) (29)
- Mass effect in the physical sputtering of multicomponent materials (1982) (28)
- Elementary processes at solid surfaces immersed in low pressure plasmas (1980) (27)
- Chapter 3 Coatings and surface modification using low pressure non-equilibrium plasmas (1985) (25)
- Phenomena produced by ion bombardment in plasma‐assisted etching environments (1988) (24)
- Energy transfer to a tungsten lattice by ion bombardment (1974) (22)
- The role of energetic ion bombardment in silicon-fluorine chemistry (1987) (22)
- Sputtering of Chemisorbed Nitrogen with Ar (1971) (20)
- Electron impact dissociation cross sections for C2F6 (2006) (19)
- Mass‐Spectrometric and Vapor Pressure Studies on the Sublimation of Realgar (As4S4) (1971) (19)
- Chemical Sputtering of Tungsten at Elevated Temperatures (1963) (18)
- The growth of nitrided surface layers by ion bombardment (1972) (18)
- Gas Analysis in Films by Laser‐Induced Flash Evaporation Followed by Mass Spectrometry (1972) (18)
- Ion‐induced etching of SiO2: The influence of mixing and lattice damage (1988) (17)
- Our hardy Hibiscus species as ornamentals (1970) (14)
- Annealing Study of EuO Films Doped with Iron and Europium (1971) (14)
- Abstract: Mechanisms in plasma etching (1978) (13)
- rf induction technique for sample heating in surface science experiments (1978) (13)
- Ion‐induced volatilization (IIV): A method for quantitative measurement of the amounts of perfluoropolyether lubricant on a particulate disk surface and in the media porosity (1986) (12)
- Electron-impact dissociation cross sections for CHF3 and C3F8 (2007) (12)
- Influence of ion bombardment on the interaction of Sb with the Si(100) surface (1987) (11)
- POLLINATION AND FRUIT SET OF YELLOW PASSIONFRUIT IN SOUTHERN FLORIDA (2007) (11)
- Physical Sputtering: A Discussion of Experiment and Theory (1976) (10)
- Abstract: Etching in reactive plasmas (1979) (9)
- Energy transfer to a copper surface by low energy noble gas ion bombardment (1992) (9)
- Chemisorption of ethane on W(111) (1978) (7)
- THE EFFECT OF THREE FACTORIAL LEVELS OF NITROGEN AND PHOSPHORUS ON THE GROWTH AND COMPOSITION OF CINCHONA LEDGERIANA. (1948) (7)
- Influence of Temperature on Growth and Alkaloid Content of Cinchona Seedlings. (1947) (7)
- Automation of a residual gas analyzer on a time-shared computer (1971) (7)
- Chemical sputtering, a discussion of mechanisms (1982) (6)
- Operation of a Bayard‐Alpert Ionization Gauge (1962) (6)
- Etch Products from the reaction on Cl_2 with Al and Cu and XeF_2 with W and Nb (1985) (6)
- Evaluation of Spinach Accessions and Cultivars for Resistance to Fusarium Wilt. I. Greenhouse-bench Method1 (1977) (5)
- THE EFFECT OF LIGHT AND NITROGEN LEVELS ON GROWTH AND ALKALOID CONTENT OF YOUNG PLANTS OF CINCHONA LEDGERIANA. (1952) (5)
- MANGO AND AVOCADO EVALUATION IN SOUTHEASTERN FLORIDA (1971) (4)
- Summary Abstract: Surface processes in plasma-assisted etching environments (1983) (3)
- Automation of a Residual Gas Analyzer on a Time Shared Computer (1972) (3)
- Summary Abstract: Chemical sputtering of fluorinated silicon (1981) (3)
- Etching Reactions at Solid Surfaces (1984) (3)
- Changes in Scientific Names for Certain Crop Plants1 (1974) (3)
- The “Palo de tomate” or tree tomato (1949) (3)
- Erratum: Influence of doping on the etching of Si(111) [Phys. Rev. B36, 6613 (1987)] (1988) (2)
- Gas content of sputtered Ni films using laser induced flash evaporation and mass spectrometry (1967) (2)
- SOME ADDITIONS TO THE ORCHID FLORA OF PUERTO RICO (1956) (2)
- Evaluation of spinach accessions and cultivars for resistance to Fusarium [oxysporum] wilt, 1: Greenhouse-bench method [Fungal pathogens] (1977) (2)
- Influence of Adsorption at Endothermic Surface Sites on the Pumping and Outgassing Rate for Ion Gauges, Residual Gas Analyzers, and other Similar Devices (1970) (2)
- Influence of High, Medium, and Low Soil Moisture on Growth and Alkaloid Content of Cinchona ledgeriana. (1947) (2)
- Energy Transfer from Energetic Ions to Thin Films Using a Pyroelectric Calorimeter (1988) (1)
- Vegetable gardening in the tropics. (1950) (1)
- Plasma-assisted etching: Ion-assisted surface chemistry (1985) (1)
- Total Dissociation Cross-Sections of Fluoroalkanes for Electron Impact: Their Usefulness for Understanding Plasma-Assisted Etching Environments (1987) (1)
- Impact activated sorption as a means for gas incorporation in sputtered thin films (1967) (1)
- Fruit and tree nut germplasm resources inventory (1977) (1)
- The Influence of Surface Absorption Characteristics on Reactively Sputtered Films (1972) (1)
- Herbicide Trials with Young Tropical and Sub-tropical Fruit and Nut Trees (1963) (1)
- Summary Abstract: Plasma–surface interactions in dry processing (1981) (1)
- Compatibility, Pollination, and Disease in Relation to Fruit Yields of Strophanthus intermedius in Puerto Rico (1957) (1)
- Influence of Energy Deposited by Energetic Particle Bombardment on thin Film Characteristics (1991) (1)
- Some Large-Leaved Ornamental Plants for the Tropics (2017) (0)
- ADSORPTION OF N2 ON W(100) UNDER LONG EXPOSURE. (1980) (0)
- ‘Pink Lady’ and ‘Sleeping Beauty’ Rose Mallow Hibiscus1 (1979) (0)
- Preventing damping-off in Cinchona seedbeds. (1950) (0)
- Energy Transfer from Low Energy Noble Gas Ions to Gold Surfaces Using a Pyroelectric Calorimeter (1990) (0)
- The Influence of Ion Bombardment on Etching Reactions (1985) (0)
- Cinchona investigations in Puerto Rico. (1946) (0)
- Branched Pedicels in New Guinea Impatiens1 (1982) (0)
- ion source has double room (1975) (0)
- Plasma‐assisted etching: ion‐assisted surface chemistry (2008) (0)
- Introductions now available from the U.S. Plant introduction Garden, Glenn Dale, Maryland / (1957) (0)
- Adsorption of Activated Nitrogen (1963) (0)
- Flower Longevity in New Guinea Impatiens1 (1977) (0)
- Dissociation of Methane and Ethane on Pt(110): Evidence for a Direct Mechanism under Thermal Conditions. (2010) (0)
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