Jacobus Swart
#131,044
Most Influential Person Now
Brazilian engineer
Jacobus Swart's AcademicInfluence.com Rankings
Jacobus Swartengineering Degrees
Engineering
#7753
World Rank
#9169
Historical Rank
Civil Engineering
#506
World Rank
#612
Historical Rank
Applied Physics
#3524
World Rank
#3629
Historical Rank
Download Badge
Engineering
Jacobus Swart's Degrees
- Bachelors Civil Engineering Federal University of Rio de Janeiro
- Masters Structural Engineering Federal University of Rio de Janeiro
- PhD Civil Engineering Federal University of Rio de Janeiro
Why Is Jacobus Swart Influential?
(Suggest an Edit or Addition)According to Wikipedia, Jacobus Swart is a professor at State University of Campinas - UNICAMP, Campinas, Brazil and was named Fellow of the Institute of Electrical and Electronics Engineers in 2014 for contributions to microelectronics education in Brazil.
Jacobus Swart's Published Works
Number of citations in a given year to any of this author's works
Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- Light emission from a poly-silicon device with carrier injection engineering (2018) (120)
- Carbon nanotubes growth by chemical vapor deposition using thin film nickel catalyst (2004) (61)
- Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature (2004) (49)
- CMOS-Based Active Pixel for Low-Light-Level Detection: Analysis and Measurements (2007) (35)
- Optoelectronic properties analysis of silicon light-emitting diode monolithically integrated in standard CMOS IC (2019) (29)
- Deposition of silicon nitride by low-pressure electron cyclotron resonance plasma enhanced chemical vapor deposition in N2/Ar/SiH4 (1997) (28)
- CF4 plasma etching of materials used in microelectronics manufacturing (2000) (25)
- Inductively coupled plasma etchingof in-based compound semiconductorsin CH4/H2/Ar (1998) (22)
- The Influence of Impurities on Cobalt Silicide Formation (1991) (21)
- Platinum thin films deposited on silicon oxide by focused ion beam: characterization and application (2008) (21)
- Silicon nitride deposited by ECR–CVD at room temperature for LOCOS isolation technology (2003) (21)
- Silicon nitride etching in high- and low-density plasmas using SF6/O2/N2 mixtures (2003) (17)
- High quality of ultra-thin silicon oxynitride films formed by low-energy nitrogen implantation into silicon with additional plasma or thermal oxidation (2000) (16)
- Fabrication of high-aspect ratio silicon nanopillars and nanocones using deep reactive ion etching (2009) (16)
- A multisampling time-domain CMOS imager with synchronous readout circuit (2007) (16)
- Electrical Characterization of Platinum Thin Films Deposited by Focused Ion Beam (2007) (15)
- Different carbon nanostructured materials obtained in catalytic chemical vapor deposition (2006) (15)
- Analysis of The Etching Mechanisms of Tungsten in Fluorine Containing Plasmas (1995) (15)
- Layout techniques for radiation hardening of standard CMOS active pixel sensors (2007) (14)
- Photodetection With Gate-Controlled Lateral BJTs From Standard CMOS Technology (2013) (13)
- Development of a cluster tool and analysis of deposition of silicon oxide by TEOS/O{sub 2} PECVD (1996) (11)
- Development of process for far infrared sensor fabrication (2006) (11)
- Controlled Deposition and Electrical Characterization of Multi-Wall Carbon Nanotubes (2008) (11)
- Study of Conditions for Anisotropic Plasma Etching of Tungsten and Tungsten Nitride Using SF 6 / Ar Gas Mixtures (2002) (11)
- Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition (2006) (11)
- Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix (2007) (11)
- Rapid Thermal Flow of PSG Films in Vacuum Using a Graphite Heater (1990) (10)
- X-ray multiple diffraction on the shallow junction of B in Si(0 0 1) (2005) (10)
- IonRock: software for solving strain gradients of ion-implanted semiconductors by X-ray diffraction measurements and evolutionary programming (2004) (8)
- Mechanisms of silicon nitride etching by electron cyclotron resonance plasmas using SF6- and NF3-based gas mixtures (2004) (8)
- Thermal stability of Ni(Pt) silicide films formed on poly-Si (2005) (8)
- A wideband noise canceling low-noise amplifier for 50MHz–5GHz wireless receivers in CMOS technology (2011) (8)
- Insulators obtained by electron cyclotron resonance plasmas on Si or GaAs (2003) (8)
- Improving performance of microwave AlGaAs/GaAs HBTs using novel SiN/sub x/ passivation process (1999) (8)
- Synthesis of carbon nanotubes and nanofibers by thermal CVD on SiO2 and Al2O3 support layers. (2009) (7)
- Analog automatic gain control (AGC) CMOS WLAN direct conversion receiver (DCR) (2011) (7)
- Monolithically integrated SQW laser and HBT laser driver via selective OMVPE regrowth (1993) (6)
- Formation and characterization of tin layers for metal gate electrodes of CMOS capacitors (2014) (6)
- Titanium Silicide Formation and Arsenic Dopant Behavior under Rapid Thermal Treatments in Vacuum (1989) (6)
- Modification of the refractive index and the dielectric constant of silicon dioxide by means of ion implantation (2000) (6)
- Achievement of High Lifetime by a Combination of HCl Oxidation and POGO Gettering Techniques (1981) (6)
- SOLAR-T: terahertz photometers to observe solar flare emission on stratospheric balloon flights (2012) (6)
- Understanding the Formation of the Self-Assembly of Colloidal Copper Nanoparticles by Surfactant: A Molecular Velcro (2013) (6)
- Low noise Si based monolithic transimpedance amplifiers for 10 Gbps, 40 Gbps and 100 Gbps applications (2014) (6)
- A design methodology for low-noise CMOS transimpedance amplifiers based on shunt-shunt feedback topology (2016) (5)
- Improvement of Electrical and Thermal Contacts Between Carbon Nanotubes and Metallic Electrodes by Laser Annealing (2014) (5)
- Study of the Thermal Stability of the Al / TiW / TiSi2 / Si Structure (1991) (5)
- Design and optimization of high sensitivity transimpedance amplifiers in 130 nm CMOS and BiCMOS technologies for high speed optical receivers (2015) (5)
- Amorphous carbon nitride films irradiated with argon ions (2000) (4)
- Thin titanium oxide films obtained by RTP and by sputtering (2014) (4)
- Reactive ion etching and plasma etching of tungsten (1993) (4)
- Improvement of the electrical contact between carbon nanotubes and metallic electrodes by laser irradiation (2013) (4)
- SiGe HBT mm-wave DC coupled ultra-wide-band low noise monolithic amplifiers (2014) (4)
- Permittivity of amorphous hydrogenated carbon (a-C:H) films as a function of thermal annealing (2001) (4)
- Electrolyte-Insulator-Semiconductor field effect device for pH detecting (2014) (4)
- A logarithmic CMOS image sensor with wide output voltage swing range (2017) (3)
- Analysis of the mean crystallite size and microstress in titanium silicide thin films (1989) (3)
- The Impact of LCE and PAMDLE Regarding Different CMOS ICs Nodes and High Temperatures (2021) (3)
- Influence of the substrate thickness and radio frequency on the deposition rate of amorphous hydrogenated carbon a-C:H films (1999) (3)
- Rapid Thermal Diffusion of Sn from Spin‐on‐Glass into GaAs (1995) (3)
- One-Step Silicon Nitride Passivation by ECR-CVD for Heterostructure Transistors and MIS Devices (1999) (3)
- Photoluminescence and the Raman scattering in porous GaSb produced by ion implantation (2005) (3)
- Low electrical resistivity polycrystalline SiGe films obtained by vertical LPCVD for MOS devices (2005) (3)
- Dynamic Characterization of Thermo-Resistive Micro-Sensor (2005) (3)
- A CMOS wideband mixer for Direct-Conversion Receivers (DCRs) (2012) (3)
- Initiatives for promotion of microelectronics and microfabrication at Sao Paulo State Universities-Brazil (2001) (2)
- Interpretation of a non-conventional reverse-current curve of a depletion-type gate-controlled diode (1983) (2)
- Complementary AlGaAs/GaAs HBT I2 L ( CHI2 L) Technology (1992) (2)
- Education on microfabrication in Latin America and the microelectronics workshop at UNICAMP (1998) (2)
- Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications (1998) (2)
- Structural and surface properties of Si1-xGex thin films obtained by reduced pressure CVD (2007) (2)
- Design and characterization of 0.13 µm CMOS and BiCMOS low noise transimpedance amplifiers for high speed optical interconnects (2015) (2)
- Plasma Etching of Si 3 N 4 with High Selectivity Over Si and SiO 2 (2)
- Microelectrodes array technology: A review of integrated circuit biopotential amplifiers (2016) (2)
- RF passive components in MCM-D (2007) (2)
- Efficacy of ECR-CVD silicon nitride passivation in InGaP∕GaAs HBTs (2006) (2)
- Plasma Etching of Silicon Nitride with High Selectivity over Silicon Oxide and Silicon in Fluorine Containing Plasmas (2002) (2)
- Electrooptic Modulation in Future All-Silicon Integrated Microwave Circuits: An Introduction of Gated MOSFET Devices With Increased Optical Emissions (2022) (2)
- Electrolyte-insulator-semiconductor structure (EIS) with TiO2 thin film for Pb+ detecting (2016) (2)
- Modeling of interconnection lines for simulation of VLSI circuits (1991) (1)
- INVESTIGATION OF Ni SILICIDES FORMATION ON (100) Si BY X-RAY DIFFRACTION (XRD) (2008) (1)
- Temporal noise analysis and measurements of CMOS active pixel sensor operating in time domain (2013) (1)
- Synthesis of Ge Nanocrystals Grown by Ion Implantation and Subsequent Annealing (2006) (1)
- Control of micron and submicron feature dimensions in 2μm resolution photolithographic system for MOS and MEMS applications (2004) (1)
- Fabrication of 60 channel microelectrode arrays for future use with cultured neuronal networks (2015) (1)
- Ultra-thin silicon oxynitride gate-dielectric made by ECR plasmas (2004) (1)
- Integration of carbon nanotubes in microelectronics (2008) (1)
- New composite material based on micrographite particles in glassy matrices for applications in piezoresistive sensors (2021) (1)
- Current-mode motion detector sensor using copier cell in CMOS technology (2011) (1)
- Three-color detectors for APS-CMOS image sensors employing a triple junctions (2003) (1)
- Morphological Study of Polycrystalline SiGe Alloy Deposited by Vertical LPCVD (2006) (1)
- An experimental measurement technique of interconnection RC delay for integrated circuits using the step voltage response (1989) (1)
- A Tunable CMOS Image Sensor with High Fill-Factor For High Dynamic Range Applications. (2020) (1)
- A very simple Al-gate technology for high performance LSI circuits (1983) (1)
- High performance active pixel sensors fabricated in a standard 2.0 /spl mu/m CMOS technology (2004) (1)
- Impact of the Octagonal Layout Style for MOSFETs using 180nm Bulk CMOS ICs Technology Node (2018) (1)
- Electrolyte-Insulator-Semiconductor Structure for Pb+ Detecting (2014) (1)
- Local Laser Annealing of Contacts Between MWCNTs and Metallic Electrodes (2014) (1)
- Thin titanium oxide films deposited by e-beam evaporation or by sputtering technique with additional rapid thermal oxidation (2014) (1)
- A CMOS continuous variable gain low-noise amplifier(LNA) for WLAN applications (2011) (1)
- Sample preparation method for scanning force microscopy (2001) (1)
- SAW sensor without the reference channel based on the two path delay line (2014) (1)
- Innovation Environment in Brazil: The Case for an Open Access User Facility for Micro/Nano Research (2010) (1)
- Using Ellipsoidal Layout Style to Boost the Electrical Performance of the MOSFETs Regarding the 180 nm CMOS ICs Manufacturing Process (2018) (1)
- Pecvd teos silicon oxide deposited in a home made cluster tool system (1995) (0)
- GROWTH OF MULTI-WALLED CARBON NANOTUBES BY CHEMICAL VAPOR DEPOSITION (2008) (0)
- SAW Sensors and RF ID Tags without a Reference Channel (2011) (0)
- Orientation-dependent anisotropic etching simulation in silicon wafer (2003) (0)
- AN E / D NMOS TECHNOLOGY FOR EDUCATIONAL AND MULTI-PROJECT CHIP ACTIVITIES (2001) (0)
- Construction of a heart cell perfusion and stimulation chamber using microeletronics techniques (2000) (0)
- Etching of Polycrystalline Silicon in SF 6 Containing Plasmas (0)
- A Low Frequency Remote Plasma Rapid Thermal CVD System with Face Down Electrostatic Clamp Wafer Holder (1993) (0)
- Selective etching of polycrystalline silicon in a hexode type plasma etcher (2004) (0)
- Comparative Study for gm/IDS of Ellipsoidal Layout MOSFET for 180 nm Technology (2018) (0)
- Development of a GaAs Hall sensor (0)
- A 3.3 Gb/s Sample Circuit with GaAs MESFET Technology and SCFL Gates (1997) (0)
- The influence of poly‐Si/SiGe gate in CMOS transistors for RF and microwave circuit applications (2010) (0)
- CV characteristics of polycrystalline sige films with low GE concentration (2006) (0)
- DC Performance and Low Frequency Noise in n-MOSFETs using Self-Aligned Poly-Si/SiGe Gate (2008) (0)
- Shallow Junction Formation with Preamorphization and Rapid Thermal Annealing of Boron Implanted Silicon (2001) (0)
- Suspended membranes made by silicon nitride deposited by ECR-CVD (2004) (0)
- An Optimization Study of Thermal Stability of W/GaAs Schottky Gates (1993) (0)
- Preparation and characterization of silicon nanostructures obtained by ion implantation (2004) (0)
- 10 GHz RF Passive Components Obtained by MCM-D Technology (2007) (0)
- Platinum to Kill Lifetime in Power Diode Design (2011) (0)
- Adjustment of Microwave Integrated Circuit (MIC) with Focused Ion Beam (FIB) (2008) (0)
- A motion detection pixel system using an inductorless UWB transmitter on standard 0.35µm/CMOS technology (2013) (0)
- Selective silicon nitride etching by ECR plasmas using SF6and NF3 based gas mixtures (2003) (0)
- Silicon oxynitride gate-dielectric made by ECR plasma oxynitridation (2004) (0)
- Uncooled thermal infrared detector for detection of far-infrared radiation (2004) (0)
- Electrical characterization of thin gate oxynitride obtained by N+ implantation into polysilicon/thermal oxide/silicon structure (2004) (0)
- Rapid thermal annealing of Mg + and P + co-implanted GaAs (1996) (0)
- 11 Integration of Carbon Nanotubes in Microelectronics (2017) (0)
- Microfluidic devices and Gigahertz sensor applied to measurements of liquid mixtures concentration (2017) (0)
- CHARGE PUMP CURRENT LIMITATION AND DRIVER (2007) (0)
- Effects of the process parameters on the carbon nanotubes growth by thermal CVD (2005) (0)
- SBCCI 2020 Cover Page (2020) (0)
- Proton radiation hardening of silicon oxynitride gate nMOSFETs formed by nitrogen implantation into silicon prior to oxidation (2001) (0)
- Simulation and Fabrication of Suspended-Membrane Resistive Microbolometers Using Gold-Black as Absorber (2008) (0)
- Fabrication of Multi-point Test Structures Using Focused Ion Beam and Selective Carbon Nanotubes Deposition by Dielectrophoresis (2008) (0)
- Low-power consumption gas sensors based on decorated multi-wall carbon nanotubes (2010) (0)
- The research networks NAMITEC and NANOFAB: nanocharacterization and nanofabrication activities (2006) (0)
- COMPARATIVE ANALYSIS SYSTEM FOR RADIATION TOLERANCE IN SRAM MEMORY CELLS (2011) (0)
- Modeling fo Interconnections Lines for Stimulation of VLSI Circuits (1991) (0)
- The Influence of Poly-Si/SiGe Gate in Threshold, Sub-Threshold Parameters and Low Frequency Noise in p-MOSFETs (2009) (0)
- Fabrication of submicron structures in polycristalline silicon by reactive ion etching using fluorine- and chlorine- containing plasmas (2003) (0)
- Modeling and simulation of static characteristics of a PMOS compatible hot wire principle-based flow micro-sensor (2003) (0)
- Functional cyclic bending test for integrated inductors on flexible Kapton substrate (2022) (0)
- ECR-CVD SiNX Passivation in GaAs-based MISFET Devices (2007) (0)
- Contact Improvement for Carbon Nanotubes Deposited by Dielectrophoresis (2007) (0)
- Fabrication and Characterization of 60 Channel Microelectrode Arrays for Recording and Stimulation from Cardiac Cells in Culture (2017) (0)
- Synthesis of carbon nanotubes by plasma-enhanced chemical vapor deposition (2003) (0)
- Evaluation of interconnects based on electromigration criteria and circuit performance (2017) (0)
- Boosting the Performance of MOSFET Operating Under a Huge Range of High Temperature by Using the Octagonal Layout Style (2019) (0)
- High sensitivity obtained by three-color detector APS-CMOS using antireflective coating (2004) (0)
- High-Sensitivity Photodetector Systems for Fluorescence Imaging (2006) (0)
- All manuscripts, correspondence and communication should be directed to IEEE/EDS Publications Office (2010) (0)
- Study of carbon nanotubes growth by atmospheric pressure chemical vapor deposition (2004) (0)
- A comparative study of aluminum and tungsten silicon Schottky diodes (2003) (0)
- Maskless production of neural-recording graphene microelectrode arrays (2019) (0)
- Modification of the dielectric constant of silicon dioxide by means of ion implantation (0)
- Advances in the process and in the methodology of emulsion optical masks construction (2003) (0)
- Use of a langmuir probe for ECR plasma characterization (2004) (0)
- Photoresponse Analysis of Sensors Fabricated with Standard 2.0 μm CMOS Technology (2007) (0)
- MODELING OF INTERCONNECTION LINES FOR SIMULATION OF (1991) (0)
- Low Frequency Noise (1/f ) Improvements on CMOS Transistors with a Single nmm + Doped Poly Si-SiGe Gate Stack (2009) (0)
- The effect of nitrogen concentration at silicon oxynitride gate insulators formed by 28N2+ implantation into silicon with additional conventional or rapid thermal oxidation (2003) (0)
- The Influence of Substrates on the Carbon Nanotube Growth Process (2007) (0)
- Piezoresistive Sensor Based on Micrographite-Glass Thick Films (2022) (0)
- Stress analysis of vertical LPCVD thick poly-SI by micro-raman spectroscopy for MEMS applications (2004) (0)
- Characteristics of polycrystalline SI1-XGEX alloy deposited in a vertical LPCVD system (2004) (0)
- Microfluidic devices on glass for liquid mixtures concentration with coupled Thz sensor (2018) (0)
- DC Improvements and Low-Frequency 1/f Noise Characteristics of Complimentary Metal–Oxide–Semiconductor Transistors with a Single n+-Doped Polycrystalline Si/SiGe Gate Stack (2010) (0)
- SPICE DC parameter extraction of MESFETs with diffused and grown channel (1993) (0)
- Formation of nickel silicides onto as-doped silicon using a thin Pt/Pd interlayer (2004) (0)
- Graphene – Coated Microelectrode Arrays (2018) (0)
- Formation of nickel silicides onto (100) silicon wafer surfaces using a thin platinum interlayer (2003) (0)
- Subterahertz sensor in microfluidic devices for on-line determination and control of ethanol concentration (2017) (0)
- ASIC design and prototyping for education and innovation with a look on Latin America (2015) (0)
- Formation and stability of Ni(Pt)Si/poly-Si layered structure (2004) (0)
- A compact fast-response charge-pump gate driver (2009) (0)
- A Fast-Response Charge-Pump Gate Driver Applied to Linear Regulation (2010) (0)
- Formation of nickel monosilicide onto (100) silicon wafer surfaces (2002) (0)
- SEM/EDS Characterization of Ni and Ni/Pt Silicide Formation (2007) (0)
- Improvement Of The Harmonic Distortion By Using Diamond Mosfet (2018) (0)
- Use of the charge pumping technique for the evaluation of mosfet degradation due to stress in silicide / polysilicon double layer (1990) (0)
- INFLUENCE OF TEMPERATURE ON THE DEPOSITION RATE OF POLYCRYSTALLINE SILICON OBTAINED BY VERTICAL LPCVD (2008) (0)
This paper list is powered by the following services:
Other Resources About Jacobus Swart
What Schools Are Affiliated With Jacobus Swart?
Jacobus Swart is affiliated with the following schools:
