Martin P. Seah

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Martin P. Seah is affiliated with the following schools: University of California, Berkeley, Stanford University, Kyoto University

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Martin P. Seah

Computer Science

#2610

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#2730

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Computational Linguistics

#44

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#44

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Machine Learning

#171

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#172

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Artificial Intelligence

#301

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#306

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Computer Science

Martin P. Seah's Degrees

PhD Computer Science Stanford University
Masters Computer Science Stanford University

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Martin P. Seah's Published Works

Number of citations in a given year to any of this author's works

Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author

Published Works

Practical surface analysis: By auger and x-ray photoelectron spectroscopy (1983) (4609)
Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solids (1979) (4244)
Practical Surface Analysis (1992) (3067)
Grain boundary segregation (1973) (544)
Auger and x-ray photoelectron spectroscopy (1990) (535)
Elastic Scattering Corrections in AES and XPS. II. Estimating Attenuation Lengths and Conditions Required for their Valid Use in Overlayer/Substrate Experiments (1997) (473)
The quantitative analysis of surfaces by XPS: A review (1980) (343)
Quantitative Auger electron spectroscopy and electron ranges (1972) (339)
Adsorption-induced interface decohesion (1980) (313)
AES: Energy calibration of electron spectrometers. I—an absolute, traceable energy calibration and the provision of atomic reference line energies (1984) (245)
Summary of ISO/TC 201 Standard: VII ISO 15472 : 2001—surface chemical analysis—x‐ray photoelectron spectrometers—calibration of energy scales (2001) (230)
XPS: binding energy calibration of electron spectrometers 5—re‐evaluation of the reference energies (1998) (212)
The theory of grain boundary segregation in terms of surface adsorption analogues (1977) (210)
Interface adsorption, embrittlement and fracture in metallurgy: A review (1975) (199)
Precision, accuracy, and uncertainty in quantitative surface analyses by Auger‐electron spectroscopy and x‐ray photoelectron spectroscopy (1990) (192)
Kinetics of surface segregation (1977) (183)
The determination of atomic force microscope cantilever spring constants via dimensional methods for nanomechanical analysis (2005) (182)
Ultrathin SiO2 on Si II. Issues in quantification of the oxide thickness (2002) (182)
Post‐1989 calibration energies for X‐ray photoelectron spectrometers and the 1990 Josephson constant (1989) (181)
Surface segregation and its relation to grain boundary segregation (1975) (169)
Grain boundary segregation and the T-t dependence of temper brittleness (1977) (164)
Quantification issues in the identification of nanoscale regions of homopolymers using modulus measurement via AFM nanoindentation (2005) (154)
Pure element sputtering yields using 500–1000 eV argon ions (1981) (147)
Quantitative XPS: I. Analysis of X-ray photoelectron intensities from elemental data in a digital photoelectron database (2001) (146)
Organic depth profiling of a nanostructured delta layer reference material using large argon cluster ions. (2010) (136)
Data compilations: their use to improve measurement certainty in surface analysis by aes and xps (1986) (129)
Argon cluster ion beams for organic depth profiling: results from a VAMAS interlaboratory study. (2012) (127)
An accurate semi‐empirical equation for sputtering yields I: for argon ions (2005) (126)
Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study (2004) (125)
Universal equation for argon gas cluster sputtering yields. (2013) (117)
XPS reference procedure for the accurate intensity calibration of electron spectrometers— results of a BCR intercomparison co‐sponsored by the VAMAS SCA TWA (1993) (117)
Ion detection efficiency in SIMS:: Dependencies on energy, mass and composition for microchannel plates used in mass spectrometry (2000) (107)
Sputtering yields of compounds using argon ions (2010) (104)
Segregation to interfaces (1977) (104)
Quantitative prediction of surface segregation (1979) (101)
Quantitative molecular depth profiling of organic delta-layers by C60 ion sputtering and SIMS. (2008) (100)
Ultrathin SiO2 on Si IV. Intensity measurement in XPS and deduced thickness linearity (2003) (92)
The depth dependence of the depth resolution in composition–depth profiling with Auger Electron Spectroscopy (1983) (91)
Simple universal curve for the energy‐dependent electron attenuation length for all materials (2012) (89)
Characterization of a high depth‐resolution tantalum pentoxide sputter profiling reference material (1983) (88)
Slow electron scattering from metals: I. The emission of true secondary electrons (1969) (84)
Interfacial and surface microchemistry. (1996) (83)
Modelling of nanomechanical nanoindentation measurements using an AFM or nanoindenter for compliant layers on stiffer substrates (2006) (82)
Quantitative AES and XPS: Determination of the electron spectrometer transmission function and the detector sensitivity energy dependencies for the production of true electron emission spectra in AES and XPS† (1990) (82)
Simplified equations for correction parameters for elastic scattering effects in AES and XPS for Q, β and attenuation lengths (2001) (79)
Random uncertainties in AES and XPS: I: Uncertainties in peak energies, intensities and areas derived from peak synthesis (1992) (78)
XPS: Energy calibration of electron spectrometers. 2—Results of an interlaboratory comparison (1984) (76)
Ultrathin SiO2 on Si. I. Quantifying and removing carbonaceous contamination (2003) (76)
Quantification and methodology issues in multivariate analysis of ToF‐SIMS data for mixed organic systems (2008) (73)
Static SIMS : towards unfragmented mass spectra - the G-SIMS procedure (2000) (70)
The quartz crystal microbalance; radial/polar dependence of mass sensitivity both on and off the electrodes (1990) (70)
An accurate semi-empirical equation for sputtering yields, II: for neon, argon and xenon ions (2005) (70)
Depth resolution in composition profiles by ion sputtering and surface analysis for single-layer and multilayer structures on real substrates (1981) (68)
Quantitative XPS: The calibration of spectrometer intensity—energy response functions. 1—The establishment of reference procedures and instrument behaviour (1984) (68)
The statistical sputtering contribution to resolution in concentration-depth profiles (1981) (66)
An accurate and simple universal curve for the energy‐dependent electron inelastic mean free path (2012) (66)
Quantification in AES and XPS. (1993) (65)
TOF-SIMS: Accurate mass scale calibration (2006) (62)
Grain boundary activity measurements by auger electron spectroscopy (1972) (61)
A review of the analysis of surfaces and thin films by AES and XPS (1984) (61)
The role of solute segregation in grain boundary diffusion (1982) (60)
Electron flood gun damage in the analysis of polymers and organics in time-of-flight SIMS (2002) (59)
Quantitative Auger electron spectroscopy; A comparison of techniques for adsorbed tin on iron (1973) (59)
Quantitative characterization of defect size in graphene using Raman spectroscopy (2014) (59)
Multivariate image analysis strategies for ToF‐SIMS images with topography (2009) (59)
A system for the intensity calibration of electron spectrometers (1995) (58)
Background subtraction: I. General behaviour of Tougaard-style backgrounds in AES and XPS (1999) (56)
Background subtraction: II. General behaviour of REELS and the Tougaard universal cross section in the removal of backgrounds in AES and XPS (2000) (55)
Developing repeatable measurements for reliable analysis of molecules at surfaces using desorption electrospray ionization. (2009) (55)
Simple method of depth profiling (stratifying) contamination layers, illustrated by studies on stainless steel (1994) (55)
Quantitative AES IX and quantitative XPS II: Auger and x‐ray photoelectron intensities and sensitivity factors from spectral digital databases reanalysed using a REELS database (2001) (53)
Site competition in surface segregation (1975) (53)
Quantitative XPS: The calibration of spectrometer intensity—energy response functions. 2—Results of interlaboratory measurements for commercial instruments (1984) (53)
Segregation and the strength of grain boundaries (1976) (52)
Chemistry of solid–solid interfaces — A review of its characterization, theory, and relevance to materials science (1980) (51)
Quantitative AES. VIII: analysis of auger electron intensities from elemental data in a digital auger database (1998) (51)
AES: Accurate intensity calibration of electron spectrometers—results of a BCR interlaboratory comparison co-sponsored by the VAMAS SCA TWP (1991) (51)
Improved methods and uncertainty analysis in the calibration of the spring constant of an atomic force microscope cantilever using static experimental methods (2009) (49)
Channel electron multipliers: quantitative intensity measurement—efficiency, gain, linearity and bias effects (1990) (49)
AES of bulk insulators – control and characterisation of the surface charge (2000) (48)
Static SIMS: A Study of Damage Using Polymers† (1996) (48)
Ion and neutral spectroscopy (1992) (47)
Ultrathin SiO2 on Si. VII. Angular accuracy in XPS and an accurate attenuation length (2005) (46)
VAMAS Surface chemical analysis standard data transfer format with skeleton decoding programs (1988) (46)
XPS: binding energy calibration of electron spectrometers 4—assessment of effects for different x‐ray sources, analyser resolutions, angles of emission and overall uncertainties (1998) (46)
Quantitative Auger electron spectroscopy: Via the energy spectrum or the differential? (1979) (44)
Concept of an imaging XPS system (1988) (43)
Optimized depth resolution in ion-sputtered and lapped compositional profiles with Auger electron spectroscopy (1981) (42)
Additive remedy for temper brittleness (1979) (42)
The ultra-high resolution depth profiling reference material - Ta2O5 anodically grown on Ta (1984) (40)
Topography and Field Effects in Secondary Ion Mass Spectrometry – Part I: Conducting Samples (2011) (40)
Stability of reference masses. IV: Growth of carbonaceous contamination on platinum-iridium alloy surfaces, and cleaning by UV/ozone treatment (1996) (39)
Impurities, segregation and creep embrittlement (1980) (38)
Surface science in metallurgy (1979) (38)
Measurement: AES and XPS (1985) (38)
VAMAS interlaboratory study for desorption electrospray ionization mass spectrometry (DESI MS) intensity repeatability and constancy. (2014) (38)
Validation and accuracy of software for peak synthesis in XPS (1998) (38)
Distinction between adsorbed monolayers and thicker layers in Auger electron spectroscopy (1973) (37)
An intercomparison of absolute measurements of the oxygen and tantalum thickness of tantalum pentoxide reference materials, BCR 261, by six laboratories (1988) (37)
Topography and field effects in the quantitative analysis of conductive surfaces using ToF-SIMS (2008) (37)
Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources. (2016) (36)
Ultrathin SiO2 on Si: III mapping the layer thickness efficiently by XPS (2002) (36)
Intensity and energy calibration in AES: The effect of analyser modulation (1983) (36)
The surface analysis of insulators by SIMS: Charge neutralization and stabilization of the surface potential (1981) (36)
Summary of ISO/TC 201 Standard: VIII, ISO 18115:2001—Surface chemical analysis—Vocabulary (2001) (35)
Ultrathin SiO2 on Si. VI. Evaluation of uncertainties in thickness measurement using XPS (2005) (34)
Ultra‐thin SiO2 on Si IX: absolute measurements of the amount of silicon oxide as a thickness of SiO2 on Si (2009) (34)
Approaches to analyzing insulators with Auger electron spectroscopy: Update and overview (2010) (34)
Roughness contributions to resolution in ion sputter depth profiles of polycrystalline metal films (1984) (33)
Analysis of cluster ion sputtering yields: correlation with the thermal spike model and implications for static secondary ion mass spectrometry (2007) (33)
Sputtering Yields of Gold Nanoparticles by C60 Ions (2012) (33)
Stability of Reference Masses II: The Effect of Environment and Cleaning Methods on the Surfaces of Stainless Steel and Allied Materials (1994) (32)
Linearity in electron counting and detection systems (1992) (32)
Nanoindentation measurement of Young’s modulus for compliant layers on stiffer substrates including the effect of Poisson’s ratios (2009) (32)
Quantification and measurement by Auger electron spectroscopy and X-ray photoelectron spectroscopy (1986) (31)
VAMAS interlaboratory study on organic depth profiling (2011) (30)
Slow electron scattering from metals: III. The coherently elastically scattered primary electrons (1969) (30)
Ultra‐thin SiO2 on Si VIII. Accuracy of method, linearity and attenuation lengths for XPS (2007) (29)
Stability of reference masses I: evidence for possible variations in the mass of reference kilograms arising from mercury contamination. (1994) (29)
Attenuation lengths in organic materials (2011) (29)
Topography and field effects in secondary ion mass spectrometry Part II: insulating samples (2012) (28)
Depth Profiling and Melting of Nanoparticles in Secondary Ion Mass Spectrometry (SIMS) (2013) (28)
Universal Equation for Argon Cluster Size-Dependence of Secondary Ion Spectra in SIMS of Organic Materials (2014) (28)
The temperature dependence of the magnitudes and positions of the peaks in LEED intensity–energy plots (1970) (27)
Quantitative AES and XPS: convergence between theory and experimental databases (1999) (27)
Atomic mixing and electron range effects in ultrahigh‐resolution profiles of the Ta2O5/Ta interface by argon sputtering with Auger electron spectroscopy (1984) (26)
AES and XPS depth profiling certified reference material (1984) (26)
Quantitative AES: determination of the effects of the relative orientations of the sample, electron gun and spectrometer on the direct spectrum shape for the establishment of standard reference spectra (1989) (26)
Use of a “BET” analogue equation to describe grain boundary segregation (1973) (26)
Imaging G-SIMS: a novel bismuth-manganese source emitter. (2008) (26)
Quantitative AES VII. The ionization cross‐section in AES (1998) (26)
Analysis of the interface and its position in C60(n+) secondary ion mass spectrometry depth profiling. (2009) (25)
Characterisation of computer differentiation of spectra in AES and its relation to differentiation by the modulation technique (1983) (25)
Quantitative AES: The establishment of a standard reference spectrum for the accurate determination of spectrometer transmission functions (1988) (25)
Effective dead time in pulse counting systems (1995) (24)
Organic molecule characterization—G-SIMS (2004) (24)
Slow electron scattering from metals: II. The inelastically scattered primary electrons (1969) (24)
Quantitative aes: the problems of the energy dependent phase shift and modulation amplitude and of the non-ideal behaviour of the channel electron multiplier (1987) (24)
G-SIMS of crystallisable organics (2003) (24)
Surface segregation as a guide to grain boundary segregation (1975) (24)
AES: energy calibration of electron spectrometers. IV. A re-evaluation of the reference energies (1998) (23)
Static TOF‐SIMS — a VAMAS interlaboratory study. Part I. Repeatability and reproducibility of spectra (2005) (23)
Cones formed during sputtering of InP and their use in defining AFM tip shapes (1999) (23)
On the applicability of XPS for quantitative total organic and elemental carbon analysis of airborne particulate matter. (2008) (23)
Channel electron multiplier efficiencies: the effect of the pulse height distribution on spectrum shape in Auger electron spectroscopy (1989) (23)
Quantitative x-ray photoelectron spectroscopy: Quadrupole effects, shake-up, Shirley background, and relative sensitivity factors from a database of true x-ray photoelectron spectra (2006) (22)
Angle dependence of argon gas cluster sputtering yields for organic materials. (2015) (22)
Identification of complex molecules at surfaces: G-SIMS and SMILES fragmentation pathways (2008) (22)
Cluster ion sputtering: molecular ion yield relationships for different cluster primary ions in static SIMS of organic materials (2007) (22)
Smoothing and the signal-to-noise ratio of peaks in electron spectroscopy (1989) (22)
Cluster Primary Ion Sputtering: Secondary Ion Intensities in Static SIMS of Organic Materials† (2010) (22)
Resolution parameters for model functions used in surface analysis (2002) (21)
Auger electron spectroscopy: Method for the accurate measurement of signal and noise and a figure of merit for the performance of AES instrument sensitivity (1988) (21)
CCQM-K32 key comparison and P84 pilot study: Amount of silicon oxide as a thickness of SiO2 on Si (2008) (20)
Simplified drift characterization in scanning probe microscopes using a simple two-point method (2009) (20)
Method to determine the analysis area of x‐ray photoelectron spectrometers—illustrated by a Perkin–Elmer PHI 550 ESCA/SAM (1985) (20)
Standard reference spectra for XPS and AES: Their derivation, validation and use (1990) (20)
Static SIMS inter-laboratory study (2000) (20)
Topography effects and monatomic ion sputtering of undulating surfaces, particles and large nanoparticles: Sputtering yields, effective sputter rates and topography evolution (2012) (20)
Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams (2012) (20)
Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy (2004) (20)
SUMMARY OF ISO/TC 201 STANDARD : I. ISO 14976:1998 : SURFACE CHEMICAL ANALYSIS : DATA TRANSFER FORMAT (1999) (20)
Nanomechanical measurements of hair as an example of micro-fibre analysis using atomic force microscopy nanoindentation. (2012) (19)
Static TOF‐SIMS. A VAMAS interlaboratory study. Part II — accuracy of the mass scale and G‐SIMS compatibility (2007) (19)
Mass spectrometry and informatics: distribution of molecules in the PubChem database and general requirements for mass accuracy in surface analysis. (2011) (19)
An atomic standard to calibrate analyser modulation in AES (1983) (18)
The intergranular fragility index — an engineering materials parameter (1980) (18)
Quantification issues in ToF‐SSIMS and AFM co‐analysis in two‐phase systems, exampled by a polymer blend (2003) (18)
SIGNAL LINEARITY IN XPS COUNTING SYSTEMS (1999) (17)
Towards a single recommended optimal convolutional smoothing algorithm for electron and other spectroscopies (1988) (17)
Summary of ISO/TC 201 Standard XI. ISO 17974:2002—Surface chemical analysis—High‐resolution Auger electron spectrometers—Calibration of energy scales for elemental and chemical‐state analysis (2003) (17)
The development of standards and guides for multivariate analysis in surface chemical analysis (2009) (17)
Sputtering Yields for Mixtures of Organic Materials Using Argon Gas Cluster Ions. (2015) (17)
Scattering in electron spectrometers, diagnosis and avoidance. I. Concentric hemispherical analysers (1993) (17)
High resolution digital Auger database of true spectra for Auger electron spectroscopy intensities (1996) (17)
Random uncertainties in AES and XPS. II: Quantification using either relative or absolute measurements (1992) (16)
Linearity of the instrumental intensity scale in TOF‐SIMS—a VAMAS interlaboratory study (2012) (16)
AES: energy calibration of electron spectrometers. Ill — General calibration rules (1997) (16)
Static SIMS: Surface charge stabilization of insulators for highly repeatable spectra when using a quadrupole mass spectrometer (1995) (16)
Summary of ISO/TC 201 Standard XII. ISO 17973:2002—Surface chemical analysis—Medium‐resolution Auger electron spectrometers—Calibration of energy scales for elemental analysis (2003) (16)
Quantitative auger electron spectroscopy: Modulating the spectrometer (1979) (16)
Repeatable intensity calibration of an X-ray photoelectron spectrometer (2006) (16)
Stability of Reference Masses III: Mechanism and Long-term Effects of Mercury Contamination on Platinum-Iridium Mass Standards (1995) (16)
Blowholing in PTH Solder Fillets: Part 3 Moisture and the PCB (1986) (16)
ENERGY AND SPATIAL DEPENDENCE OF THE ELECTRON DETECTION EFFICIENCIES OF SINGLE CHANNEL ELECTRON MULTIPLIERS USED IN ELECTRON SPECTROSCOPY (1991) (15)
Temperature, roughness and depth resolution in ion sputter profiles (1985) (15)
Summary of ISO/TC 201 Standard: ISO 18115‐1:2010 – surface chemical analysis – vocabulary – general terms and terms used in spectroscopy (2012) (15)
Sputter-induced cone and filament formation on InP and AFM tip shape determination (2000) (15)
A comparison of SIMS and DESI and their complementarities (2011) (15)
Background subtraction III: The application of REELS data to background removal in AES and XPS (2001) (15)
An intercomparison of tantalum pentoxide reference studies (1988) (15)
Surface chemical analysis—report on the vamas project (1986) (15)
Depth resolution at organic interfaces sputtered by argon gas cluster ions: the effect of energy, angle and cluster size. (2015) (14)
Summary of ISO/TC 201 standard: XXXIII, ISO 18115:2001/Amd. 2:2007—Surface Chemical Analysis—Vocabulary—Amendment 2 (2007) (14)
Scattering in electron spectrometers, diagnosis and avoidance. II. Cylindrical mirror analysers (1993) (14)
G-SIMS-FPM: molecular structure at surfaces : a combined positive and negative secondary ion study (2006) (14)
Investigating the difficulty of eliminating flood gun damage in TOF-SIMS (2003) (14)
Electron Flood Gun Damage Effects in 3D Secondary Ion Mass Spectrometry Imaging of Organics (2014) (14)
Quantitative AES. V. Practical analysis of intensities with detailed examples of metals and their oxides (1998) (14)
Fluence, flux, current and current density measurement in faraday cups for surface analysis (1995) (14)
VAMAS surface chemical analysis technical working party—an overview of project objectives, progress and the requirements for further work (1990) (14)
Lead monolayer lubrication in steel machining studied by Auger electron spectroscopy (1975) (13)
The Matrix Effect in Secondary Ion Mass Spectrometry (2018) (13)
Modelling of surface nanoparticle inclusions for nanomechanical measurements by an AFM or nanoindenter: spatial issues (2012) (13)
Sampling Depths, Depth Shifts, and Depth Resolutions for Bi(n)(+) Ion Analysis in Argon Gas Cluster Depth Profiles. (2016) (13)
Static SIMS–VAMAS interlaboratory study for intensity repeatability, mass scale accuracy and relative quantification (2010) (13)
Summary of ISO/TC 201 standard: XXI. ISO 21270:2004—Surface chemical analysis—X‐ray photoelectron and Auger electron spectrometers—Linearity of intensity scale (2004) (13)
VAMAS surface chemical analysis—a unifying approach for the 1990s (1992) (12)
Nonlinearities in depth profiling nanometer layers (2010) (12)
SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles (2016) (12)
Certainty of measurement using an automated infra-red laser inspection instrument for PCB solder joint integrity (1985) (12)
Atomistic Mechanisms of Intergranular Embrittlement (1983) (12)
Summary of ISO/TC 201 Standard: XXIII, ISO 24236:2005—surface chemical analysis—Auger electron spectroscopy—repeatability and constancy of intensity scale (2007) (12)
Argon cluster size‐dependence of sputtering yields of polymers: molecular weights and the universal equation (2015) (11)
Signal-to-noise ratio assessment and measurement in spectroscopies with particular reference to Auger and X-ray photoelectron spectroscopies (1993) (11)
Depth resolution in sputter depth profiling–characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS† (2000) (11)
Static SIMS: metastable decay and peak intensities (1999) (11)
Artifacts in the sputtering of inorganics by C60n (2008) (11)
The temperature dependence of the energy of leed intensity peaks and its effect on the surface debye temperature (1969) (11)
Identification and separation of protein, contaminant and substrate peaks using gentle-secondary ion mass spectrometry and the g-ogram. (2012) (11)
AES: Energy calibration of electron spectrometers. II—results of a BCRinterlaboratory comparison co‐sponsored by the vamas SCS TWP (1990) (11)
Esca microscope — a new approach for imaging in XPS (1987) (10)
Quantitative AES. VI. Backscattering and backgrounds—an analysis of elemental systematics and corrections of absolute intensity (1998) (10)
Blowholing in PTH Solder Fillets: Part 4 The Plated Copper Barrel (1986) (10)
Summary of ISO/TC 201 Standard: ISO 14701:2011 – Surface chemical analysis – X‐ray photoelectron spectroscopy—measurement of silicon oxide thickness (2012) (10)
Validation and accuracy of peak synthesis software for XPS (1999) (10)
A Faraday cup LEED apparatus with facility for investigating the energy and angular distributions of inelastically scattered or photoemitted electrons (1970) (10)
Blowholing in PTH Solder Fillets: Part 8 The Scientific Framework Leading to Recommendations for Its Elimination (1987) (10)
Cluster primary ion sputtering: correlations in secondary ion intensities in TOF SIMS (2011) (10)
Erratum to “An accurate semi-empirical equation for sputtering yields, II: for neon, argon and xenon ions” [Nucl. Instr. and Meth. B 229 (2005) 348–358] (2005) (10)
Quantitative AES: Calibration of spectrometers for true spectral measurements—results of a VAMAS round robin and recommendations for acquiring reference data banks (1990) (9)
Degradation of poly(vinyl chloride) and nitrocellulose in XPS (2003) (9)
Semiempirical Rules To Determine Drug Sensitivity and Ionization Efficiency in Secondary Ion Mass Spectrometry Using a Model Tissue Sample. (2016) (9)
Relationships between cluster secondary ion mass intensities generated by different cluster primary ions (2010) (9)
Plasmons: quanta for micro-region temperature measurement (1986) (9)
G-SIMS and SMILES: Simulated fragmentation pathways for identification of complex molecules, amino acids and peptides (2008) (9)
Depth resolution, angle dependence, and the sputtering yield of Irganox 1010 by coronene primary ions. (2013) (9)
Surface and Interface Characterization (2006) (9)
Systematic Temperature Effects in the Argon Cluster Ion Sputter Depth Profiling of Organic Materials Using Secondary Ion Mass Spectrometry (2016) (8)
Reference data for Auger electron spectroscopy and X-ray photoelectron spectroscopy combined (1999) (8)
Savitzky and Golay differentiation in AES (1996) (8)
VAMAS surface chemical analysis technical working party: An update for 1988 (1989) (8)
Simple Procedure for Precise Peak Maximum Estimation for Energy Calibration inAES andXPS (1996) (8)
Summary of ISO/TC 201 standard: ISO 18115‐2:2013 – surface chemical analysis – vocabulary – terms used in scanning probe microscopy (2014) (8)
Versailles project on advanced materials and standards study of intensity stability of cylindrical mirror analyser-based Auger electron spectrometers (1992) (8)
SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions (2018) (8)
Nanoscale roughness and bias in step height measurements by atomic force microscopy (2013) (7)
Summary of ISO/TC 201 Standard: ISO 18115‐1:2013 – Surface chemical analysis – Vocabulary – General terms and terms used in spectroscopy (2014) (7)
Model calculations of the electron-optical properties of compact Faraday cups (1988) (7)
Submonolayer adsorbate reference material based on a low alloy steel fracture sample for Auger electron spectroscopy Part 1 Characterisation (1992) (7)
The energy and temperature dependence of LEED intensity peak widths (1969) (7)
Consistent, combined quantitative Auger electron spectroscopy and x-ray photoelectron spectroscopy digital databases: Convergence of theory and experiment (2000) (7)
Quantitative AES IV: Accuracy of the Numerical Evaluation of Peak Areas in AES using the Universal Tongaard Background Subtraction Method (1996) (7)
The alignment of spectrometers and quantitative measurements in X-ray photoelectron spectroscopy (1997) (7)
Time and temperature dependence of surface segregation in commercial steel, studied by Auger electron spectroscopy (1984) (7)
Chemical Imaging of Buried Interfaces in Organic-Inorganic Devices Using Focused Ion Beam-Time-of-Flight-Secondary-Ion Mass Spectrometry. (2019) (6)
Summary of ISO/TC 201 standard: XXII. ISO 22048:2004—Surface chemical analysis—Information format for static secondary ion mass spectrometry (2004) (6)
A verification of the relativistic correction for electro-static electron spectrometers (1985) (6)
Depth resolution and inhomogeneity of the sputtering dose with sample rotation and ion beam rastering (2011) (6)
Instrument calibration for AES and XPS. (2003) (6)
Calibration of Auger and X-ray photoelectron spectrometers for valid analytical measurements (1998) (6)
Identification of surface plasmons excited in that flat region of a single crystal surface monitored by LEED (1971) (6)
Summary of ISO/TC 201 Standard: XXIV, ISO 24237:2005—surface chemical analysis—X‐ray photoelectron spectroscopy—repeatability and constancy of intensity scale (2007) (6)
Method for the alignment of samples and the attainment of ultra-high-resolution depth profiles in Auger electron spectroscopy† (1990) (6)
Summary of ISO/TC 201 Standard: ISO 18115‐2:2010 – Surface chemical analysis – Vocabulary—Terms used in scanning probe microscopy (2012) (6)
Erratum - Quantitative x-ray photoelectron spectroscopy: Quadrupole effects, shake-up, Shirley background and relative sensitivity factors from a database of true x-ray photoelectron spectra [Phys. Rev. B 73, 174113 (2006)] (2007) (5)
Mass accuracy- : TOF-SIMS (2006) (5)
AES and XPS measurements: reducing the uncertainty and improving the accuracy (1993) (5)
Argon Cluster Sputtering Reveals Internal Chemical Distribution in Submicron Polymeric Particles (2020) (5)
Quantitative AES and XPS: calibration of electron spectrometers for true spectral measurements—VAMAS round robins and parameters for reference spectral data banks (1990) (5)
Quantifying SIMS of Organic Mixtures and Depth Profiles—Characterizing Matrix Effects of Fragment Ions (2018) (5)
G-SIMS: relative effectiveness of different monatomic primary ion source combinations. (2009) (5)
Surface chemical analysis: Comparing and exchanging data (1997) (5)
Argon cluster cleaning of Ga+ FIB‐milled sections of organic and hybrid materials (2018) (5)
Quatitative AES: Reducing errors in measured analogue spectral intensities through control of the electron detector (1990) (5)
Comment on ‘spectral noise removal by digital filtering and its application to surface analysis’ by K. Piyakis and E. Sacher (1992) (4)
Measurement of the roughness of nano-scale surfaces, both unannealed and with limited anneal, by atomic force microscopy (2014) (4)
Analysis of thin films and molecular orientation using cluster SIMS (2011) (4)
Auger Electron Spectroscopy (1986) (4)
The coordinated development of standards for surface chemical analysis (1985) (4)
Energy dependence of the electron attenuation length in silicon dioxide (2011) (4)
Optimisation and specification of Auger electron spectrometers for signal-to-noise ratio performance (1993) (4)
Surface segregation measurements by AES and their relation to metallurgical problems (1984) (4)
Submonolayer adsorbate reference material based on a low alloy steel fracture sample for Auger electron spectroscopy Part 2 Interlaboratory tests (1992) (4)
Static SIMS: ion detection efficiencies in a channel electron multiplier (1999) (4)
Quantitative AES and XPS (2002) (4)
Summary Abstract: Calibration of Auger electron spectrometers for energy and intensity measurement (1987) (3)
Quantitative surface analysis: Agreeing initial data processing (1991) (3)
Interlaboratory tests of a composite reference sample to calibrate Auger electron spectrometers in the differential mode (1993) (3)
Comments on the Paper Titled “Fine Structure Measurements in the Energy Angular Distribution of Secondary Electrons from a (110) Face of Copper” by G. Appelt (1969) (3)
Homogenization of tantalum pentoxide reference materials and the establishment of a reference standard for sputtering fluxes and for cross section measurements in nuclear instruments (1987) (3)
Standards for surface analysis: a clash between bureaucracy and science? (1996) (3)
Ultra-thin SiO2 on Si, Part V: Results of a CCQM Pilot Study of Thickness Measurements (2003) (3)
Development of a reference material and reference method to provide a calibration of the instrument intensity scale for differential AES (1993) (3)
Recent Advances to Establish XPS as an Accurate Metrology Tool (2006) (3)
Comparison of the accuracies of two methods for the determination of the surface normal for x-ray photoelectron spectroscopy (2007) (3)
Measurement of data for and the development of an ISO standard for the energy calibration of X-ray photoelectron spectrometers (1999) (3)
A simple device for measuring the flux distribution in scanned ion and neutral beams for sputter depth profiling of solid surfaces (1987) (3)
A high resolution digital Auger database of true spectra for AES intensities. (1996) (2)
Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials (2019) (2)
SIMS of organic layers with unknown matrix parameters: Locating the interface in dual beam argon gas cluster depth profiles (2019) (2)
Accurate Thickness Measurements in Thin Films with Surface Analysis (2005) (2)
Cluster ion beam profiling of organics by secondary ion mass spectrometry--does sodium affect the molecular ion intensity at interfaces? (2008) (2)
Ultra-thin SiO2 on Si: IV, thickness linearity and intensity measurements in XPS. (2003) (2)
Temperature effects in sputter depth profile resolution (1985) (2)
Analytic function to describe interfaces and resolution consistency in sputter depth profiling (2018) (2)
Non-linearities in depth profiling nanometre layers. (2010) (2)
Comment on “on the quasi-chemical model of interface decohesion” (1981) (2)
Angular accuracy and the comparison of two methods for determining the surface normal in a Kratos Axis Ultra X‐ray photoelectron spectrometer (2009) (2)
OrbiSIMS metrology Part I: Optimisation of the target potential and collision cell pressure (2021) (2)
A VAMAS Interlaboratory Study for Desorption Electrospray Ionisation (DESI) Intensity Repeatability and Constancy: Protocol for Analysis (2013) (1)
Method for determining the signal linearity in single and multidetector counting systems in X-ray photoelectron spectroscopy (1999) (1)
Determination of the sputtering yield of cholesterol using Arn(+) and C60(+(+)) cluster ions. (2016) (1)
Summary of ISO/TC 201 Standard: XXVIII, ISO 18115:2001/Amd. 1:2006—surface chemical analysis—vocabulary—amendment 1 (2007) (1)
Quantitative x-ray photoelectron spectroscopy: quadrupole effects, shake-up, Shirley background and relative sensitivity factors. (2006) (1)
Signals, noise, reference signal‐to‐noise ratios and a standard figure‐of‐merit for auger electron spectrometers (1988) (1)
Molecular Structure and Identification Through G-SIMS and SMILES (2014) (1)
Simplified equations for correction parameters for elastic scattering effects for Q, ß and attenuation lengths in AES and XPS. (2001) (1)
Calibration of the binding energy scale of an X-ray photoelectron spectrometer. (1993) (0)
VAMAS 2002: Static ToF SIMS inter-laboratory study - protocol for analysis. (2001) (0)
VAMAS surface chemical analysis standard data transfer format (1988) (0)
VAMAS project A3(d) static SIMS interlaboratory study - Part I: linearity of the intensity scale - protocol for analysis. (2009) (0)
ON DOCUMENTATION (2022) (0)
Developing repeatable measurements for reliable ambient surface characterisation using DESI. (2009) (0)
Accurate measurement of sputtered depth for ion sputtering rates and yields: the mesh replica method (2007) (0)
'In situ' preparation and characterisation (AES, XPS) of thin thermal oxide films as materials standards for an AES data bank. (1995) (0)
Validation of software for the analysis of peak areas in XPS. (1997) (0)
pproaches to analyzing insulators with Auger electron spectroscopy : Update nd overview (2009) (0)
AUGER ELECTRON SPECTROMETRY DATA BANK (2022) (0)
Reference data for AES and XPS combined. (1999) (0)
Cluster primary ions: Spikes, sputtering yields, secondary ion yields, and interrelationships for secondary molecular ions for static secondary ion mass spectrometry (2008) (0)
Benchmark Papers in Physical Chemistry and Chemical Physics Vol 2: X-Ray Photoelectron Spectroscopy (1979) (0)
Guidelines for the expression of uncertainties in surface chemical analysis by Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS). (1993) (0)
Nano-analysis using Atomic Force Microscopy. (2004) (0)
Taking the LEED in surface science (1975) (0)
David Briggs – in Memoriam (2018) (0)
Stoichiometric MgB2 layers produced by multi-energy implantation of boron into magnesium (2009) (0)
Estimation of attenuation length for film in thickness measurement in XPS and AES. (1997) (0)
SECTION 6.2 SURFACE TOPOGRAPHY ANALYSIS (2005) (0)
SIMS of Organic Materials-Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions. (2018) (0)
Comment on “Identification of background in CMA” [J. Surf. Anal. 14, 95 (2007)] (2007) (0)
New Aspects in Quantitative Surface Analysis (2022) (0)
Anastasios Demetrios Hondros CMG FRS. 18 February 1930—13 September 2016 (2018) (0)
Surface chemical analysis and the VAM principles (1995) (0)
M. Prutton (Compiler). Electronic properties of surfaces. Adam Hilger Ltd., Bristol, 1983, pp vi + 195, £9.95 (£7.95 IOP members) isbn 0‐85274‐773‐X (1985) (0)
Advances in measurement: neutron reflectometry for highly accurate nanometer metrology. (2004) (0)
Work Functions and Electron Spectroscopy (2022) (0)
Summary Abstract: Auger electron spectroscopy: Accurate signal and noise calibration and a ‘‘figure of merit’’ for instrument sensitivity performance (1988) (0)
Depth resolution in sputter depth profiling - characterisation of a tantalum pentoxide on tantalum certified reference material. (2000) (0)
VAMAS 2006: static SIMS interlaboratory study for intensity repeatability, mass scale accuracy and relative quantification - protocol for anaylisis. (2006) (0)
Surface and interface characterisation. (2006) (0)
Featured Cover (2022) (0)
Summary Abstract: Development of a rapid imaging microscope for x‐ray photoelectron spectroscopy (1988) (0)
Correlations for predicting the surface wettability for organic light-emitting-diode patterns by x-ray photoelectron spectroscopy analysis (2010) (0)
CALIBRATION OF ELECTRON SPECTROMETER ENERGY SCALES FOR AES AND XPS (2022) (0)
Reference materials for surface analysis. (1995) (0)
Modelling of Nanoindentation of Compliant Layers on Stiffer Substrates using Finite Element Analysis (2007) (0)
Sputtering, cluster primary ions and static SIMS: invited (Proceedings of PSA-07 (International Symposium on Practical Surface Analysis) November 25-28, 2007, Kanazawa, Japan) (2008) (0)
Static SIMS - a reliable technique: results from an interlaboratory study. (1997) (0)
Procedure for measuring the repeatability of intensity scales of X-ray photoelectron spectrometers. (1998) (0)
Categorizing the embrittling residuals in engineering alloys by Auger electron spectroscopy (1980) (0)
An absolute high resolution digital Auger electron reference databases. (1996) (0)
Static SIMS of insulators: damage and the development of measurement reliability. (1995) (0)
Surface analysis of insulators - a new charge neutralisation system. (1995) (0)
XPS: energy calibration of electron spectrometers, 4 - an assessment of effects for different conditions and of the overall uncertainties. (1998) (0)
THE PROGRESS OF QUANTITATIVE ANALYSIS BY ELECTRON SPECTROSCOPY (2022) (0)
Specimen files in VAMAS standard data transfer format (EXAMPLE1.TXT to EXAMPLE4.TXT) (1993) (0)
Investigation of an additive remedy for temper brittleness (1980) (0)
Mass Spectrometry and informatics: Distribution of molecules in the PubChem database and general requirements for mass accuracy. (2011) (0)
Energy and spatial dependence of Ion detection efficiencies for single channel electron multipliers used in mass spectrometries. (1998) (0)
Sputtering, Cluster Primary Ions and Static SIMS (2022) (0)
Contamination and cleaning of a platinum alloy: models and measurements of the build up of carbonaceous and mercury contamination. (1996) (0)
Quantitative AES and XPS: Tests of Theory Using AES and XPS Databases with REELS Background Subtraction (2022) (0)
Intergranular regregation phenomena studied by AES (1983) (0)

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