Peter Trefonas
#70,315
Most Influential Person Now
American chemist
Peter Trefonas's AcademicInfluence.com Rankings
Peter Trefonaschemistry Degrees
Chemistry
#1840
World Rank
#2648
Historical Rank
#636
USA Rank
Polymer Chemistry
#162
World Rank
#165
Historical Rank
#26
USA Rank
Organic Chemistry
#1073
World Rank
#1212
Historical Rank
#137
USA Rank
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Chemistry
Peter Trefonas's Degrees
- PhD Chemistry University of California, Berkeley
Why Is Peter Trefonas Influential?
(Suggest an Edit or Addition)According to Wikipedia, Peter Trefonas is a retired DuPont Fellow at DuPont, where he had worked on the development of electronic materials. He is known for innovations in the chemistry of photolithography, particularly the development of anti-reflective coatings and polymer photoresists that are used to create circuitry for computer chips. This work has supported the patterning of smaller features during the lithographic process, increasing miniaturization and microprocessor speed.
Peter Trefonas's Published Works
Number of citations in a given year to any of this author's works
Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- Double-heterojunction nanorod light-responsive LEDs for display applications (2017) (164)
- Shot noise, LER, and quantum efficiency of EUV photoresists (2004) (136)
- The optical and electrical properties of silver nanowire mesh films (2013) (115)
- Organosilane high polymers: thermochromic behavior in solution (1985) (99)
- Polysilane high polymers: mechanism of photodegradation (1985) (98)
- Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials. (2013) (94)
- Multilayer Transfer Printing for Pixelated, Multicolor Quantum Dot Light-Emitting Diodes. (2016) (94)
- Organosilane high polymers: Electronic spectra and photodegradation (1983) (92)
- Double-heterojunction nanorods (2014) (75)
- Organosilane high polymers: synthesis of formable homopolymers (1983) (61)
- Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer. (2016) (55)
- Novel Strategy for Photopatterning Emissive Polymer Brushes for Organic Light Emitting Diode Applications (2017) (49)
- Resist effects at small pitches (2006) (46)
- Organogermane homopolymers and copolymers with organosilane (1985) (44)
- Spin-On Organic Polymer Dopants for Silicon (2013) (44)
- Soluble polysilanes: an interesting new class of radiation sensitive materials (1986) (36)
- New Principle For Image Enhancement In Single Layer Positive Photoresists (1987) (31)
- Dilute solution physical properties of organosilane polymers (1987) (30)
- Simple method for measuring acid generation quantum efficiency at 193 nm (1999) (27)
- Surface Tension Effects In Microlithography - Striations (1986) (24)
- Large‐Area, Nanometer‐Scale Discrete Doping of Semiconductors via Block Copolymer Self‐Assembly (2015) (22)
- A Millifluidic Reactor System for Multistep Continuous Synthesis of InP/ZnSeS Nanoparticles (2018) (19)
- Directing self-assembly of nanoscopic cylindrical diblock brush terpolymers into films with desired spatial orientations: expansion of chemical composition scope. (2014) (18)
- Performance of EUV photoresists on the ALS micro exposure tool (2005) (17)
- Electrical Performance of a Molecular Organic Semiconductor under Thermal Stress (2017) (16)
- Designing new materials and processes for directed self-assembly applications (2012) (16)
- Unraveling the Origin of Interfacial Oxidation of InP-Based Quantum Dots: Implications for Bioimaging and Optoelectronics (2020) (15)
- Mussel-Inspired Strategy for Stabilizing Ultrathin Polymer Films and Its Application to Spin-On Doping of Semiconductors (2018) (14)
- Computational modeling of block‐copolymer directed self‐assembly (2015) (14)
- Materials for single-etch double patterning process: surface curing agent and thermal cure resist (2009) (14)
- Advanced photoresist technologies by intricate molecular brush architectures: Diblock brush terpolymer‐based positive‐tone photoresist materials (2015) (13)
- New materials and processes for directed self-assembly (2013) (13)
- Modeling Chemoepitaxy of Block Copolymer Thin Films using Self-Consistent Field Theory (2013) (13)
- Organosilane high polymers: Oxidation of polycyclohexylmethylsilylene (1985) (12)
- Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin (2007) (12)
- Mechanistic Insights into Size-Focused Growth of Indium Phosphide Nanocrystals in the Presence of Trace Water (2020) (12)
- A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly (2014) (10)
- Advanced patterning solutions based on double exposure: double patterning and beyond (2009) (10)
- Fluoropolymer-diluted small molecule organic semiconductors with extreme thermal stability (2018) (10)
- Hydrogen bond mediated partially miscible poly(N-acryloyl piperidine)/poly(acrylic acid) blend with one glass transition temperature (2018) (9)
- Pattern roughness analysis using power spectral density: application and impact in photoresist formulation (2021) (8)
- Exposure dose optimization for a positive resist containing polyfunctional photoactive compound (1991) (8)
- A proposed formula for the energy of an atom in a molecule (1979) (8)
- Chemical amplification in submicron lithography: an information theoretic analysis (1991) (8)
- Graphoepitaxial and chemoepitaxial methods for creating line-space patterns at 33nm pitch: comparison to a HVM process (2015) (8)
- Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes (2010) (7)
- New materials for directed self-assembly for advanced patterning (2014) (7)
- Bottom-up/top-down, high-resolution, high-throughput lithography using vertically assembled block bottle brush polymers (2013) (7)
- Region specific enhancement of quantum dot emission using interleaved two-dimensional photonic crystals (2015) (7)
- What is the optimum exposure does for a positive resist containing poly-functional photoactive compound? (1991) (6)
- Molecular orientation, thermal behavior and density of electron and hole transport layers and the implication on device performance for OLEDs (2014) (6)
- Novel embedded barrier layer materials for ArF non-topcoat immersion applications (2008) (5)
- Planarizing ARs for dual-damascene processing (2001) (5)
- Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly (2015) (5)
- Nanoscale molecular analysis of photoresist films with massive cluster secondary-ion mass spectrometry (2019) (4)
- An Analysis of the Reactivities of Epoxide Rings in Some Cyclic Hydrocarbons (1980) (4)
- Examination Of The Mechanism Of The Post Exposure Bake Effect (1988) (4)
- Etch resistance: comparison and development of etch rate models (2007) (4)
- Positive Photoresist Development: A Multiple State Percolation Model (1989) (4)
- Understanding the photoacid generator distribution at nanoscale using massive cluster secondary ion mass spectrometry (2019) (4)
- Materials for double patterning strategies: Development and application (2009) (4)
- Role of host excimer formation in the degradation of organic light-emitting devices (2020) (4)
- Rational construction of self-assembly azobenzene derivative monolayers with photoswitchable surface properties (2018) (4)
- Blob defect prevention in 193nm topcoat-free immersion lithography (2012) (4)
- Topological Design of Highly Anisotropic Aligned Hole Transporting Molecular Bottlebrushes for Solution-Processed OLEDs. (2022) (4)
- Planarization approaches to via-first dual-damascene processing (2000) (3)
- Impact of materials selection on graphoepitaxial directed self-assembly for line-space patterning (2015) (3)
- Development of spin-on metal hardmask (SOMHM) for advanced node (2015) (3)
- Roughness Power Spectral Density as a Function of Aerial Image and Basic Process / Resist Parameters (2020) (3)
- Chemical trimming overcoat: an enhancing composition and process for 193nm lithography (2016) (3)
- Organic antireflective coatings for 193-nm lithography (1999) (3)
- Nanodomain analysis with cluster‐SIMS: application to the characterization of macromolecular brush architecture (2015) (3)
- Improved stability in organic light‐emitting devices by mixing ambipolar and wide energy gap hosts (2019) (3)
- Acid diffusion effects between resists in freezing processes used for contact hole patterning (2010) (3)
- Photo/Thermal Dual Responses in Aqueous-Soluble Copolymers Containing 1-Naphthyl Methacrylate (2021) (3)
- Dissolution inhibition of phenolic polymers: does a simple percolation field scaling law suffice? (1994) (3)
- Profile defects in novolac/DNQ resists: I. formation of microgrooves (1995) (2)
- Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists (2016) (2)
- Discrete, Shallow Doping of Semiconductors via Cylinder‐Forming Block Copolymer Self‐Assembly (2022) (2)
- Bottom-up/top-down high resolution, high throughput lithography using vertically assembled block bottle brush polymers (2013) (2)
- SOLUBLE POLYSILANE DERIVATIVES: INTERESTING NEW RADIATION-SENSITIVE POLYMERS. (1984) (2)
- High scan speed EBL containing contact hole resists with low defectivity (2013) (2)
- Thermal characterization of materials for double patterning (2010) (2)
- Methacrylate resists and antireflective coatings for 193-nm lithography (1999) (2)
- Opportunities and Challenges for Directed Self-Assembly for Advanced Patterning (2013) (2)
- Optimum Dye Concentration to Balance Reflective Notching Against Wall Angle in Positive Photoresist (1988) (2)
- Highly regioselective PACs for i-line resist design: synthetic reaction model, dissolution kinetics and lithographic response (1994) (2)
- Practical resists for 193-nm lithography using 2.38% TMAH: physicochemical influences on resist performance (1997) (2)
- Direct Correlation of Single-Particle Motion to Amorphous Microstructural Components of Semicrystalline Poly(ethylene oxide) Electrolytic Films. (2020) (1)
- Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process (1993) (1)
- Ultra-thin conformal coating for spin-on doping applications (2019) (1)
- Ordered polymer-based spin-on dopants (2019) (1)
- A Lithographic Study of Photoresists Containing a Base Soluble Dye (1989) (1)
- Acid diffusion, standing waves, and information theory: a molecular-scale model of chemically amplified resist (1992) (1)
- Photo-directing chemoepitaxy: the versatility of poly(aryl methacrylate) films in tuning block copolymer wetting (2021) (1)
- Roughness power spectral density as a function of aerial image and basic process/resist parameter (2019) (1)
- Mixtures of photoactive compositions containing photoresist (1996) (0)
- A process for the production of silver nanowires with high aspect ratio (2013) (0)
- Direct correlation of single particle motion to amorphous microstructural components of semicrystalline poly(ethylene oxide) electrolytic films (2020) (0)
- Understanding photoacid generator distribution at the nanoscale using massive cluster secondary ion mass spectrometry (2019) (0)
- Polymer and Material Design for Lithography From 50 nm Node to the sub-16 nm Node (2012) (0)
- Organosilane High Polymers: Poly(Methylphenylsilylene) (2007) (0)
- A Block Copolymer Self-Assembly Approach for 3D Nanoconfined Dopants in Semiconductors (2015) (0)
- Designing Block Copolymers for Nanolithography using Mesoscale Modeling: Line-Space Graphoepitaxy (2016) (0)
- Nano-scale molecular analysis of photo-resist films with massive cluster secondary ion mass spectrometry (2019) (0)
- Nano-scale molecular analysis of positive tone photo-resist films with varying dose (2020) (0)
- Galactose-Based Block Copolymers with Switchable χ Parameters for Tuning Phase Separated Morphology (2023) (0)
- Universal strategy for stabilizing ultrathin polymer films for spin-on doping applications (2018) (0)
- Embedded top-coat for reducing the effect out of band radiation in EUV lithography (2017) (0)
- A process for the preparation of silver wire Mini films (2013) (0)
- Block Copolymer Directed Self-Assembly Approaches for Doping Planar and Non-Planar Semiconductors (2016) (0)
- A method of forming a patterned transparent conductor (2013) (0)
- Light Scattering from Solutions of Organosilane Polymers. (1986) (0)
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