William A. Lanford
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William A. Lanfordchemistry Degrees
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Physical Chemistry
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Chemistry
William A. Lanford's Degrees
- PhD Chemistry University of California, Berkeley
- Bachelors Chemistry University of California, Berkeley
Why Is William A. Lanford Influential?
(Suggest an Edit or Addition)William A. Lanford's Published Works
Number of citations in a given year to any of this author's works
Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author
Published Works
- The hydrogen content of plasma‐deposited silicon nitride (1978) (722)
- Lead diffusion in apatite and zircon using ion implantation and Rutherford Backscattering techniques (1991) (413)
- Effect of Cosmic Rays on Computer Memories (1979) (382)
- New precision technique for measuring the concentration versus depth of hydrogen in solids (1976) (338)
- Hydration of soda-lime glass (1979) (270)
- Quantitative analysis of hydrogen in glow discharge amorphous silicon (1977) (258)
- Advanced multilayer metallization schemes with copper as interconnection metal (1993) (219)
- Profiling hydrogen in materials using ion beams (1978) (186)
- 15N hydrogen profiling: Scientific applications (1978) (168)
- The effect of sea level cosmic rays on electronic devices (1981) (167)
- Oxygen diffusion in olivine: Effect of oxygen fugacity and implications for creep (1989) (157)
- Analysis for hydrogen by nuclear reaction and energy recoil detection (1992) (146)
- Effect of stress on water diffusion in silica glass at various temperatures (1984) (134)
- Effects of the addition of small amounts of Al to copper: Corrosion, resistivity, adhesion, morphology, and diffusion (1994) (121)
- Hydrogen content of a variety of plasma‐deposited silicon nitrides (1982) (116)
- Reaction of water with glass: influence of a transformed surface layer (1983) (114)
- Increased osteoblast adhesion on titanium-coated hydroxylapatite that forms CaTiO3. (2003) (108)
- Low-temperature passivation of copper by doping with Al or Mg (1995) (95)
- Field assisted transport of Na+ ions, Ca2+ ions and electrons in commercial soda-lime glass I: Experimental (1988) (92)
- Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films (2011) (90)
- Oxidation resistant high conductivity copper films (1994) (89)
- Low resistance Ti'Pt'Au ohmic contacts to p-type GaN (2000) (77)
- Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC:H thin films (2013) (70)
- Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride (2017) (69)
- Dissolution Rates of Silicate Glasses in Water at pH 7 (1991) (67)
- Plasma‐Assisted Atomic Layer Deposition of Palladium (2005) (65)
- Substrate‐Independent Palladium Atomic Layer Deposition (2003) (63)
- Investigation of surface blistering of hydrogen implanted crystals (2001) (62)
- Nuclear Reaction Techniques in Materials Analysis (1984) (62)
- Glass Hydration: A Method of Dating Glass Objects (1977) (62)
- Alloying of copper for use in microelectronic metallization (1995) (61)
- Stopping power and effective charge of heavy ions in solids (1982) (60)
- Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy (2011) (52)
- Passivation of copper by silicide formation in dilute silane (1992) (52)
- Water Entry into Silica Glass During Slow Crack Growth (1991) (51)
- Hydrogen Profiles of Anodic Aluminum Oxide Films (1980) (50)
- Growth of CN x H y films by reactive magnetron sputtering of carbon in Ar/NH 3 discharges (1996) (49)
- Hydration of soda-lime silicate glass, effect of alumina (1983) (46)
- Hydrogen analysis of soda-lime silicate glass (1988) (45)
- The measurement of 10Be in manganese nodules using a tandem Van De Graaff accelerator (1979) (43)
- Optical absorption of SiH0.16 films near the optical GAP (1980) (42)
- Hydration of obsidian (1978) (42)
- Sodium-hydrogen interdiffusion in sodium silicate glasses (1980) (41)
- Hydrogen Surface Contamination and the Storage of Ultracold Neutrons (1977) (40)
- Thermal annealing of buried Al barrier layers to passivate the surface of copper films (1994) (40)
- Weathering of glass in moist and polluted air (1998) (39)
- Interfacial Defect Vibrations Enhance Thermal Transport in Amorphous Multilayers with Ultrahigh Thermal Boundary Conductance (2018) (39)
- Computer simulation of helium-induced forward-recoil proton spectra for hydrogen concentration determinations (1986) (39)
- Nuclear Structure Theory (1973) (39)
- Infrared spectroscopy of interfaces in amorphous hydrogenated silicon/silicon nitride superlattices (1986) (39)
- Surface states in P- and B-doped amorphous hydrogenated silicon (1983) (37)
- Variation of Hydrogen Bonding, Depth Profiles, and Spin Density in Plasma‐Deposited Silicon Nitride and Oxynitride Film with Deposition Mechanism (1986) (37)
- Hydroxylapatite and titanium: interfacial reactions. (2003) (37)
- Helium-induced hydrogen recoil analysis for metallurgical applications☆ (1983) (37)
- Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces (2005) (36)
- Free‐standing single‐crystalline chemically vapor deposited diamond films (1993) (35)
- Position sensitive particle detectors used in a magnetic spectrometer (1973) (35)
- Annealing of boron‐implanted corrosion resistant copper films (1993) (35)
- Capacitance–voltage, current–voltage, and thermal stability of copper alloyed with aluminium or magnesium (1998) (34)
- Ion‐assisted deposition of bulklike ZrO2 films (1983) (34)
- Kinetics of platinum silicide formation during rapid thermal processing (1992) (34)
- Use of nuclear reaction analysis to characterize the elemental composition and density of thin film amorphous silicon (1980) (34)
- The influence of hydrogen on the chemical, mechanical, optical/electronic, and electrical transport properties of amorphous hydrogenated boron carbide (2015) (34)
- Thermal stability of on-chip copper interconnect structures (1995) (32)
- Stability of hydrogen in silicon nitride films deposited by low‐pressure and plasma enhanced chemical vapor deposition techniques (1989) (32)
- Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check (2016) (32)
- Quantification of hydrogen in a‐Si:H films by ir spectrometry, 15N nuclear reaction, and SIMS (1982) (31)
- High sensitivity hydrogen analysis using elastic recoil (1986) (28)
- Effects of hydrogen ion implantation on Al/Si Schottky diodes (1987) (28)
- Water‐related capacitance‐voltage recovery effect in low‐temperature‐annealed chemical vapor deposited phosphosilicate (P glass) films (1992) (28)
- Nuclear reaction analysis profiling as direct evidence for lithium ion mass transport in thin film ‘‘rocking‐chair’’ structures (1993) (27)
- Measurement of the off-resonance cross section of the 6.4 MeV 1H(15N, a?)12C nuclear reaction? (1988) (27)
- Waveguide formation of KTiOPO4 by multi-energy MeV He + implantation (1996) (27)
- Adsorption of hydrogen on the Pt(111) surface from low-energy recoil scattering (1997) (27)
- Interface reaction/diffusion in hydroxylapatite-coated SS316L and CoCrMo alloys (2004) (26)
- Thermal stability of copper silicide passivation layers in copper-based multilevel interconnects (1998) (26)
- Reduction of interface hydrogen content by partially ionized beam deposition technique (1988) (23)
- Tuning the properties of a complex disordered material: Full factorial investigation of PECVD-grown amorphous hydrogenated boron carbide (2016) (22)
- Observation of the bond-dependent Doppler broadening of the p(15N, αγ)12C nuclear reaction☆ (1988) (22)
- Compact broad range magnetic spectrometer for use in ion beam analysis (1998) (22)
- Optical properties of reactively sputtered a-SiHx films (1980) (22)
- Molecular Caulking: A Pore Sealing CVD Polymer for Ultralow k Dielectrics (2004) (22)
- Microstructure-mechanical properties correlation in irradiated amorphous SiOC (2018) (21)
- Discovery of the missing two-particle, two-hole 0+ states in Ca40 (1974) (21)
- Influence of hydrogen content and network connectivity on the coefficient of thermal expansion and thermal stability for a-SiC:H thin films (2014) (20)
- Rutherford Backscattering to Study the Near-Surface Region of Volatile Liquids and Solids (2002) (20)
- Techniques for measuring the composition of hydrogenated amorphous silicon–germanium alloys (1999) (19)
- Raman scattering and the π-orbitals in amorphous carbon films (1992) (19)
- Reaction of zirconium fluoride glass with water: kinetics of dissolution (1985) (18)
- Two-neutron pickup strengths on the even lead isotopes the transition from single-particle to “collective”☆ (1973) (18)
- Nonequilibrium water permeation in SiO2 thin films (1982) (17)
- Conquering the Low‐k Death Curve: Insulating Boron Carbide Dielectrics with Superior Mechanical Properties (2016) (17)
- Sensitivity of the Tc of Nb3Ge to hydrogen content (1978) (16)
- Investigation of atomic layer deposited beryllium oxide material properties for high-k dielectric applications (2014) (16)
- Stability of Sputter Deposited Al-Cu Bilayers on SiO 2 . (1992) (15)
- An investigation of methods to reduce the hydrogen concentration on surfaces useful for ultra-cold neutron storage (1981) (15)
- POLARITY EFFECT ON FAILURE OF NI AND NI2SI CONTACTS ON SI (1997) (15)
- Characteristics of Albany's compact high resolution magnetic spectrometer (2000) (15)
- Radiation damage enhancement of the penetration of water into silica glass (1983) (15)
- Systematics of two-neutron transfer cross sections near closed shells: A sum rule analysis of (p,t) strengths on the lead isotopes (1977) (15)
- Measurements of 10Be distributions using a Tandem Van De Graaff accelerator (1980) (14)
- Bromine enrichment in the near-surface region of Br-doped NaCl single crystals diagnosed by Rutherford backscattering spectrometry. (2007) (14)
- Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology (2002) (14)
- Investigation of the mechanism responsible for the corrosion resistance of B implanted copper (1994) (13)
- An investigation of hydrogen concentration profiles in as‐deposited and annealed chemical vapor deposited SiO2 films (1988) (13)
- Phosphorus Atomic Layers Promoting the Chemisorption of Highly Polarizable Transition Metallorganics (2002) (13)
- Carbon‐Enriched Amorphous Hydrogenated Boron Carbide Films for Very‐Low‐k Interlayer Dielectrics (2017) (13)
- Stability of tetrahedrally-bonded amorphous semiconductor multilayers (1989) (13)
- Interactions between silica xerogel and tantalum (2001) (12)
- Bias-temperature stability of the Cu(Mg)/SiO2/p-Si metal-oxide-semiconductor capacitors (1997) (12)
- 15N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials (1995) (12)
- Plasma deposited hydrogenated carbon on GaAs and InP (1985) (12)
- Surface Segregation of Al of the Bilayers of Pure Cu and Cu-Al Alloy Films (2001) (12)
- Suppression of background radiation in BGO and NaI detectors used in nuclear reaction analysis (1990) (12)
- Characterization of the Reaction between Water and Soda-Lime and Reactor Waste Glasses (1979) (12)
- (p, t) Reactions on odd-a nuclei and the weak-coupling core-excitation model (1974) (11)
- Physical properties of plasma‐grown GaAs oxides (1979) (11)
- Cold beam tube photodesorption and related experiments for the Superconducting Super Collider Laboratory 20 TeV proton collider (1994) (11)
- Role of Hydrogen and Nitrogen on the Surface Chemical Structure of Bioactive Amorphous Silicon Oxynitride Films. (2017) (11)
- Investigation of the silicon beading phenomena during zone‐melting recrystallization (1983) (11)
- Completely passivated high conductivity copper films made by annealing Cu/Al bilayers (1996) (11)
- Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system (2016) (11)
- Ion‐beam mixing of erbium into potassium titanyl phosphate by mega‐electron‐volt argon beams (1995) (10)
- Structure of interfaces in a-Si:H/a-Sinx:H superlattices (1985) (10)
- Ion-beam-enhanced adhesion of Au films on Si and SiO2 (1985) (10)
- Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers (2016) (10)
- Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF 4 / H 2 Plasmas (1992) (10)
- Decay of 93,93mRu and levels of 93Tc☆ (1972) (9)
- Hydrogen concentration profiles in as‐deposited and annealed phosphorus‐doped silicon dioxide films (1988) (9)
- Substrate-independent sulfur-activated dielectric and barrier-layer surfaces to promote the chemisorption of highly polarizable metallorganics (2004) (9)
- Thermal conductivity of plasma deposited amorphous hydrogenated boron and carbon rich thin films (2019) (8)
- Synthesis and optimization of low-pressure chemical vapor deposition-silicon nitride coatings deposited from SiHCl3 and NH3 (2019) (8)
- Copper Penetration into Porous Ultra‐low‐κ Methyl Silsesquioxane during Selective CVD (2003) (8)
- The use of ion beam techniques to characterize lead diffusion in minerals (1990) (8)
- Effect of low temperature baking on niobium cavities (2003) (8)
- A 2-dimensional RBS simulation program for studying the edges of multilayer integrated circuit components (1990) (8)
- ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4 (1994) (8)
- Nuclear reaction analysis for hydrogen in nonvacuum environments (1987) (7)
- Low temperature transport of Al into and through copper starting with Cu/Al/SiO2 bilayers (1999) (7)
- High-resolution study of the particle-hole multiplets in $sup 208$Bi (1973) (7)
- Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing (2017) (7)
- Interactions of Copper with Interlayer Dielectrics and Adhesion Promoters / Diffusion Barriers. (1990) (7)
- Nuclear Reaction Analysis of Glass Surfaces: The Study of the Reaction between Water and Glass (1983) (6)
- Pb207(p,d)Pb206reaction and some matrix elements of the effective interaction (1974) (6)
- Electrolysis of Soda-Lime Silicate Glass in Water (1984) (6)
- Range profiles of 600–1200 keV Xe+ implanted in KTiOPO4 (1994) (6)
- Effects of ion implantation on the reaction between water and glass (1983) (6)
- Reaction of Water with Zirconium Fluoride Glasses (1985) (6)
- Technique for the quantitative measurement of the three‐dimensional distribution of hydrogen in solids (1982) (6)
- Calculations of Allowed Beta Decay in the (0d,1s) Shell (1973) (6)
- Ion beam analysis of glass surfaces: Dating, authentication and conservation (1986) (5)
- Hydrogen Uptake by High Purity Niobium Studied by Nuclear Analytical Methods (2003) (5)
- Thermal Conductivity Enhancement in Ion-Irradiated Hydrogenated Amorphous Carbon Films. (2021) (5)
- Influence of topological constraints on ion damage resistance of amorphous hydrogenated silicon carbide (2019) (5)
- 11.4 – NRA: Nuclear Reaction Analysis (1992) (5)
- Interaction of Cu and CoSi 2 (1990) (5)
- The capacitance‐voltage characteristics and hydrogen concentration in phospho‐silicate glass films: Relation to phosphorus concentration and annealing effects (1992) (5)
- Some Comments on the Cross Section ofCl37for Solar Neutrino Absorption (1972) (5)
- Thermal conductivity-structure-processing relationships for amorphous nano-porous organo-silicate thin films (2019) (5)
- Copper Metallization Manufacturing Issues for Future ICs (1994) (5)
- SENIORITY FOR NUCLEONS IN j = 9/2 ORBITS. (1969) (5)
- Higher order Z1 effects in heavy ion stopping powers and ranges (1981) (5)
- Durable surfaces on zirconium fluoride glasses (1984) (4)
- Interaction of Copper Film with Silicides (1990) (4)
- The Effect of Grain Boundaries and Substrate Interactions with Hydrogen on the CVD Growth of Device-Quality Copper. (1991) (4)
- Dose-Dependent “Activation Energy” For Blistering Phenomenon In Hydrogen-Implanted Silicon (1998) (4)
- Narrowing of the Boolchand intermediate phase window for amorphous hydrogenated silicon carbide (2018) (4)
- Diffusion of Water in SiO2 at Low Temperature (1985) (4)
- Copper interconnection schemes: elimination of the need of diffusion barrier/adhesion promoter by the use of corrosion-resistant low-resistivity-doped copper (1994) (4)
- Surface and Interface Modification of Copper for Electronic Application (1994) (4)
- Molecular Caulk: A Pore Sealing Technology for Ultra-low k Dielectrics (2004) (4)
- Underlying role of mechanical rigidity and topological constraints in physical sputtering and reactive ion etching of amorphous materials (2018) (4)
- Ion beam mixing of AG on glass (1984) (4)
- Hydride Compressor Sorption Cooler and Surface Contamination Issues (2003) (3)
- In Situ Deep-Level Transient Spectroscopy and Dark Current Measurements of Proton-Irradiated InGaAs Photodiodes (2020) (3)
- Small-mass atomic defects enhance vibrational thermal transport at disordered interfaces with ultrahigh thermal boundary conductance (2017) (3)
- Homogenization of the Bilayers of Cu-Al Alloy and Pure Copper to Produce CU-0.3 at.% Al Alloy Films (1998) (3)
- Processing, Characterization and Reliability of Silica Xerogel Films for Interlayer Dielectric Applications (2000) (3)
- PASSIVATION OF COPPER BY LOW TEMPERATURE ANNEALING OF Cu/Mg/SiO2 BILAYERS (1996) (3)
- Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films (1993) (3)
- Use of a rastered microbeam to study lateral diffusion of interest to microelectronics (1994) (3)
- Topological Constraint Theory Analysis of Rigidity Transition in Highly Coordinate Amorphous Hydrogenated Boron Carbide (2019) (3)
- Use of superlattices to determine bulk and interface stoichiometry of very thin films (1986) (3)
- Interactions and Stability of Cu on CoSi 2 (1992) (3)
- Ion beam measurements of Sn/In ratios in indium tin oxide films prepared by pulsed-laser deposition (2001) (3)
- Effective pore sealing of ultralow-k dielectrics (2004) (3)
- Uptake of nitric acid on NaCl single crystals measured by backscattering spectrometry (2010) (3)
- He stopping power and straggle in Al, Ti, Co, Cu, Ag, Ta and Au from 1.5 to 4 MeV (2006) (3)
- Reactions of Titanium Films with thin Silicon Dioxide, Nitride, and Oxynitride Films During Rapid Thermal Annealing (1992) (3)
- Z13, Z14 Corrections to Heavy Ion Energy Loss (1981) (3)
- $sup 207$Pb(p,d)$sup 206$Pb reaction and some matrix elements of the effective interaction (1974) (2)
- RBS analysis of trace gas uptake on ice (2002) (2)
- 206 Pb(p, d) 205 Pb reaction, energy-weighted sum rule, shell model test (1975) (2)
- Use of reference samples for more accurate RBS analyses (2002) (2)
- Corrigendum to “Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy” [J. Non-Cryst. Solids 357 (2011) 3602–3615] (2013) (2)
- Ion depletion near a solution surface: is image-charge repulsion sufficient? (2013) (2)
- Summary Abstract: Ion beam deposition of hydrogenated amorphous silicon films (1982) (2)
- Characterization of methyl-doped silicon oxide film for inter-layer dielectrics application (2001) (2)
- Capacitance-Voltage, Current Voltage, and Thermal Stability of Copper Alloyed With Aluminum or Magnesium (1998) (2)
- Stability of Silicide Films Under Post-Annealing: a Dopant Effect (1993) (2)
- Ion beam analysis of edge effects in Al/M/Al stripes (1990) (2)
- Diffusion constants of Br in NaCl measured by Rutherford backscattering spectroscopy (2009) (2)
- Optical Properties of Hydrogenated Amorphous Carbon Films Grown From Methane Plasma (1985) (2)
- Annealing of Low Pressure Chemical Vapor Deposited Phosphorus Glass Films‐Effect on Electrical Properties and Concentrations of Hydrogen Containing Species (1992) (2)
- Use of alpha sources for hydrogen analysis (1985) (2)
- A full range detector for the HIRRBS high resolution RBS magnetic spectrometer (2013) (2)
- Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na (1995) (2)
- Oxidation Resistant Dilute Copper (Boron) Alloy Films Prepared by DC-Magnetron Cosputtering (1996) (2)
- Neutrons in a bottle. (1991) (2)
- Ion Jimplantation to Inhibit Corrosion of Copper (1992) (2)
- Surface cleaning of copper by thermal and plasma treatment in reducing and inert ambients (1998) (1)
- Erratum: Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-kDielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride [ECS J. Solid State Sci. Technol., 6, N189 (2017)] (2018) (1)
- The Stability of TiH 2 Used as Diffusion Barrier on SiO 2 Substrates (1994) (1)
- (p,He3) and (p, t) reactions on Si29 (1974) (1)
- Integrated testing of the SRL-165 glass waste form (1986) (1)
- Measurement of Three Dimensional Distributions of Hydrogen in Thin Samples Using the 15 N Hydrogen Profiling Method (1983) (1)
- Nuclear reaction analysis of hydrogen in SSC beam pipe materials (1993) (1)
- Grazing angle 2 MeV RBS on the surface of a liquid with atomic layer depth resolution (2010) (1)
- Profile of implanted in potassium titanyl phosphate by the , C nuclear reaction (1998) (1)
- Use of the SUNY microbeam to investigate effects of mechanical treatment on metal/metal interdiffusion kinetics (1992) (1)
- Difference of the fast proton stopping power between the superconducting and the normal states of YBa2Cu3O7 (1989) (1)
- The Surface Damage in SiO 2 Caused by Chemical Mechanical Polishing on Ic-60 Pads (1994) (1)
- Surface Passivation of Cu by Annealing Cu/Al Multilayer Films (1995) (1)
- Formation of iron hydride in iron foil exposed to a hot, dense gas mixture of argon and hydrogen (1992) (1)
- Application of Ion Beam Techniques to the Study of Glass Durability: Enhanced Dissolution in Saline and Radiation Effects (1981) (1)
- Analysis with Heavy Ions (1985) (1)
- Ion beam analysis 6 : proceedings of the Sixth International Conference on Ion Beam Analysis, Tempe, Arizona, May 23-27, 1983 (1983) (1)
- Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials (2015) (1)
- Experimental evidence for a kinetic model of hydrogen incorporation into sputtered a‐Si films (2008) (1)
- Abstract: Physical properties of plasma‐grown GaAs oxides (1979) (1)
- Use of large Ge detectors in place of BGO detectors for hydrogen profiling or other particle-gamma NRA (1996) (1)
- $beta$$sup +$ decay of $sup 20$Na (1973) (1)
- Optical properties of a‐Ge:H‐Structural disorder and H alloying (2008) (1)
- Army Science and Technology Fellowship: Physics of Materials (1990) (0)
- $sup 206$Pb(p, d)$sup 205$Pb reaction, energy-weighted sum rule, shell model test (1975) (0)
- Effects of microcontaminants in oxygen during gate oxide growth: interfacial effects and device reliability (1994) (0)
- Understanding Field-Dependent Leakage Current Mechanisms in Amorphous Hydrogenated Boron Carbide As a Function of Electronic, Dielectric, and Disorder Parameters (2015) (0)
- Effects of process variables on properties and composition of a-Si:C:H films (2003) (0)
- Dr. James F. Ziegler (1995) (0)
- Effects of Burial Powder Configuration on the Microstructure, Composition, and Ion Conductivity of Perovskite Li 3 x La 1/3‐ x TaO 3 Ion Conductors (2022) (0)
- Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing (2023) (0)
- Time Dependent Accumulation of Hydrogen on Nickel Foils (1981) (0)
- Nuclear Reaction Analysis of Corroded Glass Surfaces (1995) (0)
- The Application of RBS To Investigate The Diffusion of HCl Into The Near Surface Region Of Ice (2003) (0)
- (p,$sup 3$He) and (p,t) reactions on $sup 29$Si (1974) (0)
- Building a Framework for Understanding Amorphous Hydrogenated Boron Carbide as a Novel Semi-Insulating Electronic Material (2015) (0)
- Experimental Evidence of the Goodness of Seniority in j=9/2 Orbits (1972) (0)
- Plasma deposited diamondlike carbon on GaAs and InP (1984) (0)
- Nuclear Reaction Analysis of Hydrogen in Metals. (1986) (0)
- Structure of Au-Al2O3 Granular Metal Films (1991) (0)
- Suny/albany glass study group 1981-1982. Annual report (1982) (0)
- Comments on the Isospin Dependence of the Two-Body Effective Interaction as Deduced from Nuclear Spectra (1972) (0)
- SUNY/Albany Glass Study Group 1981-1982. (1982) (0)
- The Effects of High and Low Dose Hydrogen Ion Implantations on Al/n-Si Schottky Diodes (1987) (0)
- OPTICAL PROPERTIES OF REACTIVELY SPUTTERED a-SiH x FILMS J. P. de Neufvllle, T. D. Moustakas, A. F. Ruppert (1980) (0)
- Growth Kinetics and Materials Properties of Cu 5 Si (1994) (0)
- Beta decay of ²¹F (1952) (0)
- Discovery of the missing two-particle, two-hole 0$sup +$ states in $sup 40$Ca (1974) (0)
- One- and three-dimensional nuclear reaction analysis for hydrogen: principles and applications (1982) (0)
- TANTALUM AMIDE PRECURSORS FOR (2017) (0)
- Correction [to “The measurement of 10 Be in manganese nodules using a tandem Van de Graff accelerator”] (1979) (0)
- Z/sub 1//sup 3/, Z/sub 1//sup 4/ corrections to heavy ion energy loss (1981) (0)
- Density and atomic coordination dictate vibrational characteristics and thermal conductivity of amorphous silicon carbide (2022) (0)
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