William A. Lanford

William A. Lanford's AcademicInfluence.com Rankings

William A. Lanford

Chemistry

#3997

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#5051

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Physical Chemistry

#591

World Rank

#643

Historical Rank

chemistry Degrees

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Chemistry

William A. Lanford's Degrees

PhD Chemistry University of California, Berkeley
Bachelors Chemistry University of California, Berkeley

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William A. Lanford's Published Works

Number of citations in a given year to any of this author's works

Total number of citations to an author for the works they published in a given year. This highlights publication of the most important work(s) by the author

Published Works

The hydrogen content of plasma‐deposited silicon nitride (1978) (722)
Lead diffusion in apatite and zircon using ion implantation and Rutherford Backscattering techniques (1991) (413)
Effect of Cosmic Rays on Computer Memories (1979) (382)
New precision technique for measuring the concentration versus depth of hydrogen in solids (1976) (338)
Hydration of soda-lime glass (1979) (270)
Quantitative analysis of hydrogen in glow discharge amorphous silicon (1977) (258)
Advanced multilayer metallization schemes with copper as interconnection metal (1993) (219)
Profiling hydrogen in materials using ion beams (1978) (186)
15N hydrogen profiling: Scientific applications (1978) (168)
The effect of sea level cosmic rays on electronic devices (1981) (167)
Oxygen diffusion in olivine: Effect of oxygen fugacity and implications for creep (1989) (157)
Analysis for hydrogen by nuclear reaction and energy recoil detection (1992) (146)
Effect of stress on water diffusion in silica glass at various temperatures (1984) (134)
Effects of the addition of small amounts of Al to copper: Corrosion, resistivity, adhesion, morphology, and diffusion (1994) (121)
Hydrogen content of a variety of plasma‐deposited silicon nitrides (1982) (116)
Reaction of water with glass: influence of a transformed surface layer (1983) (114)
Increased osteoblast adhesion on titanium-coated hydroxylapatite that forms CaTiO3. (2003) (108)
Low-temperature passivation of copper by doping with Al or Mg (1995) (95)
Field assisted transport of Na+ ions, Ca2+ ions and electrons in commercial soda-lime glass I: Experimental (1988) (92)
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films (2011) (90)
Oxidation resistant high conductivity copper films (1994) (89)
Low resistance Ti'Pt'Au ohmic contacts to p-type GaN (2000) (77)
Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC:H thin films (2013) (70)
Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride (2017) (69)
Dissolution Rates of Silicate Glasses in Water at pH 7 (1991) (67)
Plasma‐Assisted Atomic Layer Deposition of Palladium (2005) (65)
Substrate‐Independent Palladium Atomic Layer Deposition (2003) (63)
Investigation of surface blistering of hydrogen implanted crystals (2001) (62)
Nuclear Reaction Techniques in Materials Analysis (1984) (62)
Glass Hydration: A Method of Dating Glass Objects (1977) (62)
Alloying of copper for use in microelectronic metallization (1995) (61)
Stopping power and effective charge of heavy ions in solids (1982) (60)
Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy (2011) (52)
Passivation of copper by silicide formation in dilute silane (1992) (52)
Water Entry into Silica Glass During Slow Crack Growth (1991) (51)
Hydrogen Profiles of Anodic Aluminum Oxide Films (1980) (50)
Growth of CN x H y films by reactive magnetron sputtering of carbon in Ar/NH 3 discharges (1996) (49)
Hydration of soda-lime silicate glass, effect of alumina (1983) (46)
Hydrogen analysis of soda-lime silicate glass (1988) (45)
The measurement of 10Be in manganese nodules using a tandem Van De Graaff accelerator (1979) (43)
Optical absorption of SiH0.16 films near the optical GAP (1980) (42)
Hydration of obsidian (1978) (42)
Sodium-hydrogen interdiffusion in sodium silicate glasses (1980) (41)
Hydrogen Surface Contamination and the Storage of Ultracold Neutrons (1977) (40)
Thermal annealing of buried Al barrier layers to passivate the surface of copper films (1994) (40)
Weathering of glass in moist and polluted air (1998) (39)
Interfacial Defect Vibrations Enhance Thermal Transport in Amorphous Multilayers with Ultrahigh Thermal Boundary Conductance (2018) (39)
Computer simulation of helium-induced forward-recoil proton spectra for hydrogen concentration determinations (1986) (39)
Nuclear Structure Theory (1973) (39)
Infrared spectroscopy of interfaces in amorphous hydrogenated silicon/silicon nitride superlattices (1986) (39)
Surface states in P- and B-doped amorphous hydrogenated silicon (1983) (37)
Variation of Hydrogen Bonding, Depth Profiles, and Spin Density in Plasma‐Deposited Silicon Nitride and Oxynitride Film with Deposition Mechanism (1986) (37)
Hydroxylapatite and titanium: interfacial reactions. (2003) (37)
Helium-induced hydrogen recoil analysis for metallurgical applications☆ (1983) (37)
Inductively Coupled Hydrogen Plasma-Assisted Cu ALD on Metallic and Dielectric Surfaces (2005) (36)
Free‐standing single‐crystalline chemically vapor deposited diamond films (1993) (35)
Position sensitive particle detectors used in a magnetic spectrometer (1973) (35)
Annealing of boron‐implanted corrosion resistant copper films (1993) (35)
Capacitance–voltage, current–voltage, and thermal stability of copper alloyed with aluminium or magnesium (1998) (34)
Ion‐assisted deposition of bulklike ZrO2 films (1983) (34)
Kinetics of platinum silicide formation during rapid thermal processing (1992) (34)
Use of nuclear reaction analysis to characterize the elemental composition and density of thin film amorphous silicon (1980) (34)
The influence of hydrogen on the chemical, mechanical, optical/electronic, and electrical transport properties of amorphous hydrogenated boron carbide (2015) (34)
Thermal stability of on-chip copper interconnect structures (1995) (32)
Stability of hydrogen in silicon nitride films deposited by low‐pressure and plasma enhanced chemical vapor deposition techniques (1989) (32)
Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check (2016) (32)
Quantification of hydrogen in a‐Si:H films by ir spectrometry, 15N nuclear reaction, and SIMS (1982) (31)
High sensitivity hydrogen analysis using elastic recoil (1986) (28)
Effects of hydrogen ion implantation on Al/Si Schottky diodes (1987) (28)
Water‐related capacitance‐voltage recovery effect in low‐temperature‐annealed chemical vapor deposited phosphosilicate (P glass) films (1992) (28)
Nuclear reaction analysis profiling as direct evidence for lithium ion mass transport in thin film ‘‘rocking‐chair’’ structures (1993) (27)
Measurement of the off-resonance cross section of the 6.4 MeV 1H(15N, a?)12C nuclear reaction? (1988) (27)
Waveguide formation of KTiOPO4 by multi-energy MeV He + implantation (1996) (27)
Adsorption of hydrogen on the Pt(111) surface from low-energy recoil scattering (1997) (27)
Interface reaction/diffusion in hydroxylapatite-coated SS316L and CoCrMo alloys (2004) (26)
Thermal stability of copper silicide passivation layers in copper-based multilevel interconnects (1998) (26)
Reduction of interface hydrogen content by partially ionized beam deposition technique (1988) (23)
Tuning the properties of a complex disordered material: Full factorial investigation of PECVD-grown amorphous hydrogenated boron carbide (2016) (22)
Observation of the bond-dependent Doppler broadening of the p(15N, αγ)12C nuclear reaction☆ (1988) (22)
Compact broad range magnetic spectrometer for use in ion beam analysis (1998) (22)
Optical properties of reactively sputtered a-SiHx films (1980) (22)
Molecular Caulking: A Pore Sealing CVD Polymer for Ultralow k Dielectrics (2004) (22)
Microstructure-mechanical properties correlation in irradiated amorphous SiOC (2018) (21)
Discovery of the missing two-particle, two-hole 0+ states in Ca40 (1974) (21)
Influence of hydrogen content and network connectivity on the coefficient of thermal expansion and thermal stability for a-SiC:H thin films (2014) (20)
Rutherford Backscattering to Study the Near-Surface Region of Volatile Liquids and Solids (2002) (20)
Techniques for measuring the composition of hydrogenated amorphous silicon–germanium alloys (1999) (19)
Raman scattering and the π-orbitals in amorphous carbon films (1992) (19)
Reaction of zirconium fluoride glass with water: kinetics of dissolution (1985) (18)
Two-neutron pickup strengths on the even lead isotopes the transition from single-particle to “collective”☆ (1973) (18)
Nonequilibrium water permeation in SiO2 thin films (1982) (17)
Conquering the Low‐k Death Curve: Insulating Boron Carbide Dielectrics with Superior Mechanical Properties (2016) (17)
Sensitivity of the Tc of Nb3Ge to hydrogen content (1978) (16)
Investigation of atomic layer deposited beryllium oxide material properties for high-k dielectric applications (2014) (16)
Stability of Sputter Deposited Al-Cu Bilayers on SiO 2 . (1992) (15)
An investigation of methods to reduce the hydrogen concentration on surfaces useful for ultra-cold neutron storage (1981) (15)
POLARITY EFFECT ON FAILURE OF NI AND NI2SI CONTACTS ON SI (1997) (15)
Characteristics of Albany's compact high resolution magnetic spectrometer (2000) (15)
Radiation damage enhancement of the penetration of water into silica glass (1983) (15)
Systematics of two-neutron transfer cross sections near closed shells: A sum rule analysis of (p,t) strengths on the lead isotopes (1977) (15)
Measurements of 10Be distributions using a Tandem Van De Graaff accelerator (1980) (14)
Bromine enrichment in the near-surface region of Br-doped NaCl single crystals diagnosed by Rutherford backscattering spectrometry. (2007) (14)
Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology (2002) (14)
Investigation of the mechanism responsible for the corrosion resistance of B implanted copper (1994) (13)
An investigation of hydrogen concentration profiles in as‐deposited and annealed chemical vapor deposited SiO2 films (1988) (13)
Phosphorus Atomic Layers Promoting the Chemisorption of Highly Polarizable Transition Metallorganics (2002) (13)
Carbon‐Enriched Amorphous Hydrogenated Boron Carbide Films for Very‐Low‐k Interlayer Dielectrics (2017) (13)
Stability of tetrahedrally-bonded amorphous semiconductor multilayers (1989) (13)
Interactions between silica xerogel and tantalum (2001) (12)
Bias-temperature stability of the Cu(Mg)/SiO2/p-Si metal-oxide-semiconductor capacitors (1997) (12)
15N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials (1995) (12)
Plasma deposited hydrogenated carbon on GaAs and InP (1985) (12)
Surface Segregation of Al of the Bilayers of Pure Cu and Cu-Al Alloy Films (2001) (12)
Suppression of background radiation in BGO and NaI detectors used in nuclear reaction analysis (1990) (12)
Characterization of the Reaction between Water and Soda-Lime and Reactor Waste Glasses (1979) (12)
(p, t) Reactions on odd-a nuclei and the weak-coupling core-excitation model (1974) (11)
Physical properties of plasma‐grown GaAs oxides (1979) (11)
Cold beam tube photodesorption and related experiments for the Superconducting Super Collider Laboratory 20 TeV proton collider (1994) (11)
Role of Hydrogen and Nitrogen on the Surface Chemical Structure of Bioactive Amorphous Silicon Oxynitride Films. (2017) (11)
Investigation of the silicon beading phenomena during zone‐melting recrystallization (1983) (11)
Completely passivated high conductivity copper films made by annealing Cu/Al bilayers (1996) (11)
Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system (2016) (11)
Ion‐beam mixing of erbium into potassium titanyl phosphate by mega‐electron‐volt argon beams (1995) (10)
Structure of interfaces in a-Si:H/a-Sinx:H superlattices (1985) (10)
Ion-beam-enhanced adhesion of Au films on Si and SiO2 (1985) (10)
Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers (2016) (10)
Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF 4 / H 2 Plasmas (1992) (10)
Decay of 93,93mRu and levels of 93Tc☆ (1972) (9)
Hydrogen concentration profiles in as‐deposited and annealed phosphorus‐doped silicon dioxide films (1988) (9)
Substrate-independent sulfur-activated dielectric and barrier-layer surfaces to promote the chemisorption of highly polarizable metallorganics (2004) (9)
Thermal conductivity of plasma deposited amorphous hydrogenated boron and carbon rich thin films (2019) (8)
Synthesis and optimization of low-pressure chemical vapor deposition-silicon nitride coatings deposited from SiHCl3 and NH3 (2019) (8)
Copper Penetration into Porous Ultra‐low‐κ Methyl Silsesquioxane during Selective CVD (2003) (8)
The use of ion beam techniques to characterize lead diffusion in minerals (1990) (8)
Effect of low temperature baking on niobium cavities (2003) (8)
A 2-dimensional RBS simulation program for studying the edges of multilayer integrated circuit components (1990) (8)
ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4 (1994) (8)
Nuclear reaction analysis for hydrogen in nonvacuum environments (1987) (7)
Low temperature transport of Al into and through copper starting with Cu/Al/SiO2 bilayers (1999) (7)
High-resolution study of the particle-hole multiplets in $sup 208$Bi (1973) (7)
Boron and high-k dielectrics: Possible fourth etch stop colors for multipattern optical lithography processing (2017) (7)
Interactions of Copper with Interlayer Dielectrics and Adhesion Promoters / Diffusion Barriers. (1990) (7)
Nuclear Reaction Analysis of Glass Surfaces: The Study of the Reaction between Water and Glass (1983) (6)
Pb207(p,d)Pb206reaction and some matrix elements of the effective interaction (1974) (6)
Electrolysis of Soda-Lime Silicate Glass in Water (1984) (6)
Range profiles of 600–1200 keV Xe+ implanted in KTiOPO4 (1994) (6)
Effects of ion implantation on the reaction between water and glass (1983) (6)
Reaction of Water with Zirconium Fluoride Glasses (1985) (6)
Technique for the quantitative measurement of the three‐dimensional distribution of hydrogen in solids (1982) (6)
Calculations of Allowed Beta Decay in the (0d,1s) Shell (1973) (6)
Ion beam analysis of glass surfaces: Dating, authentication and conservation (1986) (5)
Hydrogen Uptake by High Purity Niobium Studied by Nuclear Analytical Methods (2003) (5)
Thermal Conductivity Enhancement in Ion-Irradiated Hydrogenated Amorphous Carbon Films. (2021) (5)
Influence of topological constraints on ion damage resistance of amorphous hydrogenated silicon carbide (2019) (5)
11.4 – NRA: Nuclear Reaction Analysis (1992) (5)
Interaction of Cu and CoSi 2 (1990) (5)
The capacitance‐voltage characteristics and hydrogen concentration in phospho‐silicate glass films: Relation to phosphorus concentration and annealing effects (1992) (5)
Some Comments on the Cross Section ofCl37for Solar Neutrino Absorption (1972) (5)
Thermal conductivity-structure-processing relationships for amorphous nano-porous organo-silicate thin films (2019) (5)
Copper Metallization Manufacturing Issues for Future ICs (1994) (5)
SENIORITY FOR NUCLEONS IN j = 9/2 ORBITS. (1969) (5)
Higher order Z1 effects in heavy ion stopping powers and ranges (1981) (5)
Durable surfaces on zirconium fluoride glasses (1984) (4)
Interaction of Copper Film with Silicides (1990) (4)
The Effect of Grain Boundaries and Substrate Interactions with Hydrogen on the CVD Growth of Device-Quality Copper. (1991) (4)
Dose-Dependent “Activation Energy” For Blistering Phenomenon In Hydrogen-Implanted Silicon (1998) (4)
Narrowing of the Boolchand intermediate phase window for amorphous hydrogenated silicon carbide (2018) (4)
Diffusion of Water in SiO2 at Low Temperature (1985) (4)
Copper interconnection schemes: elimination of the need of diffusion barrier/adhesion promoter by the use of corrosion-resistant low-resistivity-doped copper (1994) (4)
Surface and Interface Modification of Copper for Electronic Application (1994) (4)
Molecular Caulk: A Pore Sealing Technology for Ultra-low k Dielectrics (2004) (4)
Underlying role of mechanical rigidity and topological constraints in physical sputtering and reactive ion etching of amorphous materials (2018) (4)
Ion beam mixing of AG on glass (1984) (4)
Hydride Compressor Sorption Cooler and Surface Contamination Issues (2003) (3)
In Situ Deep-Level Transient Spectroscopy and Dark Current Measurements of Proton-Irradiated InGaAs Photodiodes (2020) (3)
Small-mass atomic defects enhance vibrational thermal transport at disordered interfaces with ultrahigh thermal boundary conductance (2017) (3)
Homogenization of the Bilayers of Cu-Al Alloy and Pure Copper to Produce CU-0.3 at.% Al Alloy Films (1998) (3)
Processing, Characterization and Reliability of Silica Xerogel Films for Interlayer Dielectric Applications (2000) (3)
PASSIVATION OF COPPER BY LOW TEMPERATURE ANNEALING OF Cu/Mg/SiO2 BILAYERS (1996) (3)
Observation of Reduced Oxidation Rates for Plasmaassisted CVD Copper Films (1993) (3)
Use of a rastered microbeam to study lateral diffusion of interest to microelectronics (1994) (3)
Topological Constraint Theory Analysis of Rigidity Transition in Highly Coordinate Amorphous Hydrogenated Boron Carbide (2019) (3)
Use of superlattices to determine bulk and interface stoichiometry of very thin films (1986) (3)
Interactions and Stability of Cu on CoSi 2 (1992) (3)
Ion beam measurements of Sn/In ratios in indium tin oxide films prepared by pulsed-laser deposition (2001) (3)
Effective pore sealing of ultralow-k dielectrics (2004) (3)
Uptake of nitric acid on NaCl single crystals measured by backscattering spectrometry (2010) (3)
He stopping power and straggle in Al, Ti, Co, Cu, Ag, Ta and Au from 1.5 to 4 MeV (2006) (3)
Reactions of Titanium Films with thin Silicon Dioxide, Nitride, and Oxynitride Films During Rapid Thermal Annealing (1992) (3)
Z13, Z14 Corrections to Heavy Ion Energy Loss (1981) (3)
$sup 207$Pb(p,d)$sup 206$Pb reaction and some matrix elements of the effective interaction (1974) (2)
RBS analysis of trace gas uptake on ice (2002) (2)
206 Pb(p, d) 205 Pb reaction, energy-weighted sum rule, shell model test (1975) (2)
Use of reference samples for more accurate RBS analyses (2002) (2)
Corrigendum to “Mass and bond density measurements for PECVD a-SiCx:H thin films using Fourier transform-infrared spectroscopy” [J. Non-Cryst. Solids 357 (2011) 3602–3615] (2013) (2)
Ion depletion near a solution surface: is image-charge repulsion sufficient? (2013) (2)
Summary Abstract: Ion beam deposition of hydrogenated amorphous silicon films (1982) (2)
Characterization of methyl-doped silicon oxide film for inter-layer dielectrics application (2001) (2)
Capacitance-Voltage, Current Voltage, and Thermal Stability of Copper Alloyed With Aluminum or Magnesium (1998) (2)
Stability of Silicide Films Under Post-Annealing: a Dopant Effect (1993) (2)
Ion beam analysis of edge effects in Al/M/Al stripes (1990) (2)
Diffusion constants of Br in NaCl measured by Rutherford backscattering spectroscopy (2009) (2)
Optical Properties of Hydrogenated Amorphous Carbon Films Grown From Methane Plasma (1985) (2)
Annealing of Low Pressure Chemical Vapor Deposited Phosphorus Glass Films‐Effect on Electrical Properties and Concentrations of Hydrogen Containing Species (1992) (2)
Use of alpha sources for hydrogen analysis (1985) (2)
A full range detector for the HIRRBS high resolution RBS magnetic spectrometer (2013) (2)
Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na (1995) (2)
Oxidation Resistant Dilute Copper (Boron) Alloy Films Prepared by DC-Magnetron Cosputtering (1996) (2)
Neutrons in a bottle. (1991) (2)
Ion Jimplantation to Inhibit Corrosion of Copper (1992) (2)
Surface cleaning of copper by thermal and plasma treatment in reducing and inert ambients (1998) (1)
Erratum: Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-kDielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride [ECS J. Solid State Sci. Technol., 6, N189 (2017)] (2018) (1)
The Stability of TiH 2 Used as Diffusion Barrier on SiO 2 Substrates (1994) (1)
(p,He3) and (p, t) reactions on Si29 (1974) (1)
Integrated testing of the SRL-165 glass waste form (1986) (1)
Measurement of Three Dimensional Distributions of Hydrogen in Thin Samples Using the 15 N Hydrogen Profiling Method (1983) (1)
Nuclear reaction analysis of hydrogen in SSC beam pipe materials (1993) (1)
Grazing angle 2 MeV RBS on the surface of a liquid with atomic layer depth resolution (2010) (1)
Profile of implanted in potassium titanyl phosphate by the , C nuclear reaction (1998) (1)
Use of the SUNY microbeam to investigate effects of mechanical treatment on metal/metal interdiffusion kinetics (1992) (1)
Difference of the fast proton stopping power between the superconducting and the normal states of YBa2Cu3O7 (1989) (1)
The Surface Damage in SiO 2 Caused by Chemical Mechanical Polishing on Ic-60 Pads (1994) (1)
Surface Passivation of Cu by Annealing Cu/Al Multilayer Films (1995) (1)
Formation of iron hydride in iron foil exposed to a hot, dense gas mixture of argon and hydrogen (1992) (1)
Application of Ion Beam Techniques to the Study of Glass Durability: Enhanced Dissolution in Saline and Radiation Effects (1981) (1)
Analysis with Heavy Ions (1985) (1)
Ion beam analysis 6 : proceedings of the Sixth International Conference on Ion Beam Analysis, Tempe, Arizona, May 23-27, 1983 (1983) (1)
Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials (2015) (1)
Experimental evidence for a kinetic model of hydrogen incorporation into sputtered a‐Si films (2008) (1)
Abstract: Physical properties of plasma‐grown GaAs oxides (1979) (1)
Use of large Ge detectors in place of BGO detectors for hydrogen profiling or other particle-gamma NRA (1996) (1)
$beta$$sup +$ decay of $sup 20$Na (1973) (1)
Optical properties of a‐Ge:H‐Structural disorder and H alloying (2008) (1)
Army Science and Technology Fellowship: Physics of Materials (1990) (0)
$sup 206$Pb(p, d)$sup 205$Pb reaction, energy-weighted sum rule, shell model test (1975) (0)
Effects of microcontaminants in oxygen during gate oxide growth: interfacial effects and device reliability (1994) (0)
Understanding Field-Dependent Leakage Current Mechanisms in Amorphous Hydrogenated Boron Carbide As a Function of Electronic, Dielectric, and Disorder Parameters (2015) (0)
Effects of process variables on properties and composition of a-Si:C:H films (2003) (0)
Dr. James F. Ziegler (1995) (0)
Effects of Burial Powder Configuration on the Microstructure, Composition, and Ion Conductivity of Perovskite Li 3 x La 1/3‐ x TaO 3 Ion Conductors (2022) (0)
Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing (2023) (0)
Time Dependent Accumulation of Hydrogen on Nickel Foils (1981) (0)
Nuclear Reaction Analysis of Corroded Glass Surfaces (1995) (0)
The Application of RBS To Investigate The Diffusion of HCl Into The Near Surface Region Of Ice (2003) (0)
(p,$sup 3$He) and (p,t) reactions on $sup 29$Si (1974) (0)
Building a Framework for Understanding Amorphous Hydrogenated Boron Carbide as a Novel Semi-Insulating Electronic Material (2015) (0)
Experimental Evidence of the Goodness of Seniority in j=9/2 Orbits (1972) (0)
Plasma deposited diamondlike carbon on GaAs and InP (1984) (0)
Nuclear Reaction Analysis of Hydrogen in Metals. (1986) (0)
Structure of Au-Al2O3 Granular Metal Films (1991) (0)
Suny/albany glass study group 1981-1982. Annual report (1982) (0)
Comments on the Isospin Dependence of the Two-Body Effective Interaction as Deduced from Nuclear Spectra (1972) (0)
SUNY/Albany Glass Study Group 1981-1982. (1982) (0)
The Effects of High and Low Dose Hydrogen Ion Implantations on Al/n-Si Schottky Diodes (1987) (0)
OPTICAL PROPERTIES OF REACTIVELY SPUTTERED a-SiH x FILMS J. P. de Neufvllle, T. D. Moustakas, A. F. Ruppert (1980) (0)
Growth Kinetics and Materials Properties of Cu 5 Si (1994) (0)
Beta decay of ²¹F (1952) (0)
Discovery of the missing two-particle, two-hole 0$sup +$ states in $sup 40$Ca (1974) (0)
One- and three-dimensional nuclear reaction analysis for hydrogen: principles and applications (1982) (0)
TANTALUM AMIDE PRECURSORS FOR (2017) (0)
Correction [to “The measurement of 10 Be in manganese nodules using a tandem Van de Graff accelerator”] (1979) (0)
Z/sub 1//sup 3/, Z/sub 1//sup 4/ corrections to heavy ion energy loss (1981) (0)
Density and atomic coordination dictate vibrational characteristics and thermal conductivity of amorphous silicon carbide (2022) (0)

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What Schools Are Affiliated With William A. Lanford?

William A. Lanford is affiliated with the following schools:

Rensselaer Polytechnic Institute
Brown University
Yale University
University at Albany, SUNY
ETH Zurich